Very low-refractive-index optical thin films consisting of an array of SiO2 nanorods.
The refractive-index contrast in dielectric multilayer structures, optical resonators, and photonic crystals is an important figure of merit that creates a strong demand for high-quality thin films with a low refractive index. A SiO2 nanorod layer with low refractive index of n = 1.08, to our knowledge the lowest ever reported in thin-film materials, is grown by oblique-angle electron-beam deposition of SiO2. A single-pair distributed Bragg reflector employing a SiO2 nanorod layer is demonstrated to have enhanced reflectivity, showing the great potential of low-refractive-index films for applications in photonic structures and devices.
Department of Electrical, Computer, and Systems Engineering, Rensselaer Polytechnic Institute, Troy, NY 12180, USA.
J Q
JQ
Xi
Jong Kyu
JK
Kim
E E
EE
Schubert
Dexian
D
Ye
T M
TM
Lu
Shawn-Yu
SY
Lin
Jasbir S
JS
Juneja