Focused ion beam nanofabrication: a comparison with conventional processing techniques.
Focused ion beam and dual platform systems are versatile tools for nanoengineering and nanoscience applications. These systems complement conventional processing methods and can be used to prototype and modify a diverse range of nano-devices and sensors. This article discusses FIB nanofabrication and compares it with other fabrication techniques such as electron beam lithography and reactive ion etching. Aspects such as the minimum feature size and side wall profiles are discussed and compared. In addition, the limitations and detrimental effects of FIB processes are discussed.
SFI Nanoscience Centre, Physics Department, Trinity College, Dublin, Ireland.
R M
RM
Langford
D007477:Ions; D008422:Materials Testing; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D036103:Nanotechnology / Q000379:methods*; D010315:Particle Accelerators; D013499:Surface Properties; D013673:Technology Assessment, Biomedical
D007477:Ions