Effects of temperature on columnar microstructure and recrystallization of TiO2 film produced by ion-assisted deposition.
Titanium oxide thin films were deposited by electron-beam evaporation with ion-beam-assisted deposition. The effect of the substrate temperature and annealing temperature on the columnar microstructure and recrystallization of titanium oxide was studied. The values of the refractive index varied from 2.26 to 2.4, indicating that the different substrate temperatures affected the film density. X-ray diffraction revealed that all films were amorphous as deposited. At annealing temperatures from 100 degrees C to 300 degrees C, only the anatase phase was formed. As the substrate temperature increased from 150 degrees C to 200 degrees C to 250 degrees C, the recrystallization temperature fell from 300 degrees C through 250 degrees C to 200 degrees C. Changing the substrate temperature resulted in the formation of various types of columnar microstructure, as determined by scanning-electron microscopy. Different columnar structures resulted in different surface morphologies, as measured by atomic-force microscopy.
Thin Film Technology Center and Institute of Optical Sciences, National Central University, Chung-Li 32001, Taiwan, China. cclee@ios.ncu.edu.tw
Hsi-Chao
HC
Chen
Cheng-Chung
CC
Lee
Cheng-Chung
CC
Jaing
Ming-Hua
MH
Shiao
Chih-Jung
CJ
Lu
Fuh-Sheng
FS
Shieu