Photolithographically patterned surface modification of poly(dimethylsiloxane) via UV-initiated graft polymerization of acrylates.
Patterned surface modification of poly(dimethylsiloxane) (PDMS) is achieved by combining ultraviolet-initiated graft polymerization (UV-GP) and photolithography. Poly(acrylic acid) (PAA) and poly(methacrylic acid) (PMAA) patterns were grafted onto PDMS with micrometer-scale feature edge resolution. The morphology and chemical composition of the grafted layers were assessed by optical and atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), and XPS imaging. AFM section analyses demonstrated the deposition of 33 +/- 1 and 62 +/- 8 nm thick patterned films of PAA and PMAA, respectively. Spatially resolved C 1s XPS provided images of carboxylic acid functionalities, verifying the patterned deposition of acrylate films on PDMS. These observations demonstrate the general usefulness of UV-GP and photolithography for micropatterning.
Department of Chemistry, University of Western Ontario, London, Ontario, Canada.
Natasha
N
Patrito
Claire
C
McCague
Swanda
S
Chiang
Peter R
PR
Norton
Nils O
NO
Petersen