title: Less strain energy despite fewer misfit dislocations: the impact of ordering.
abstract: The average strain state of Ge films grown on Si(111) by surfactant mediated epitaxy has been compared to the ordering of the interfacial misfit dislocation network. Surprisingly, a smaller degree of average lattice relaxation was found in films grown at higher temperature. On the other hand, these films exhibit a better ordered dislocation network. This effect energetically compensates the higher strain at higher growth temperature, leading to the conclusion that, apart from the formation of misfit dislocations, their ordering represents an important channel for lattice-strain energy relaxation.
authors.affiliation: Institute of Solid State Physics, University of Bremen, Otto-Hahn-Allee 1, 28359 Bremen, Germany. tschmidt@physik.uni-bremen.de
authors.forename: Th
authors.initials: T
authors.lastname: Schmidt
authors.forename: R
authors.initials: R
authors.lastname: Kröger
authors.forename: J I
authors.initials: JI
authors.lastname: Flege
authors.forename: T
authors.initials: T
authors.lastname: Clausen
authors.forename: J
authors.initials: J
authors.lastname: Falta
authors.forename: A
authors.initials: A
authors.lastname: Janzen
authors.forename: P
authors.initials: P
authors.lastname: Zahl
authors.forename: P
authors.initials: P
authors.lastname: Kury
authors.forename: M
authors.initials: M
authors.lastname: Kammler
authors.forename: M
authors.initials: M
authors.lastname: Horn-von Hoegen