title: Atomic layer deposition on suspended single-walled carbon nanotubes via gas-phase noncovalent functionalization.
abstract: Alternating exposures of nitrogen dioxide gas and trimethylaluminum vapor are shown to functionalize the surfaces of single-walled carbon nanotubes with a self-limited monolayer. Functionalized nanotube surfaces are susceptible to atomic layer deposition of continuous, radially isotropic material. This allows for the creation of coaxial nanotube structures of multiple materials with precisely controlled diameters. Functionalization involves only weak physical bonding, avoiding covalent modification, which should preserve the unique optical, electrical, and mechanical properties of the nanotubes.
authors.affiliation: Division of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138, USA.
authors.forename: Damon B
authors.initials: DB
authors.lastname: Farmer
authors.forename: Roy G
authors.initials: RG
authors.lastname: Gordon
mesh_terms: D000535:Aluminum / Q000737:chemistry*; D003460:Crystallization / Q000379:methods*; D004553:Electric Conductivity; D005740:Gases / Q000737:chemistry; D008422:Materials Testing; D008968:Molecular Conformation; D037742:Nanotubes, Carbon / Q000737:chemistry* / Q000648:ultrastructure*; D009585:Nitrogen Dioxide / Q000737:chemistry*; D010316:Particle Size; D044367:Phase Transition; D013499:Surface Properties
chemical_list: D005740:Gases; D037742:Nanotubes, Carbon; D000535:Aluminum; D009585:Nitrogen Dioxide