title: Enabling gate dielectric design for all solution-processed, high-performance, flexible organic thin-film transistors.
abstract: A novel solution-processed, compositionally and structurally stable dual-layer gate dielectric composed of a UV-cured poly(4-vinyl phenol)-co-poly(methyl methacrylate) bottom layer and a thermally cross-linked poly(methyl silsesquioxane) top layer for organic thin-film transistors is described. This gate dielectric design, coupled with compatible solution-processable semiconductor and conductor materials, has enabled fabrication of all solution-processed, high-performance organic thin-film transistors on flexible substrates. High field-effect mobility and current on/off ratio, together with other desirable transistor properties, are demonstrated.
authors.affiliation: Materials Design & Integration Laboratory, Xerox Research Centre of Canada, Mississauga, Ontario, Canada.
authors.forename: Ping
authors.initials: P
authors.lastname: Liu
authors.forename: Yiliang
authors.initials: Y
authors.lastname: Wu
authors.forename: Yuning
authors.initials: Y
authors.lastname: Li
authors.forename: Beng S
authors.initials: BS
authors.lastname: Ong
authors.forename: Shiping
authors.initials: S
authors.lastname: Zhu