Metallic polycrystalline thin films of the single-component neutral molecular solid Ni(tmdt)2.
Metallic thin films of the single-component, neutral, molecular solid Ni(tmdt)2 have been prepared by electrocrystallization on passivated silicon substrates. Metallicity is achieved down to 6 K despite the polycrystalline morphology.
Malfant
Isabelle
I
Laboratoire de Chimie de Coordination (CNRS), 205, route de Narbonne, 31077 Toulouse, France. malfant@lcc-toulouse.fr
Rivasseau
Klauss
K
Fraxedas
Jordi
J
Faulmann
Christophe
C
de Caro
Dominique
D
Valade
Lydie
L
Kaboub
Lakhemici
L
Fabre
Jean Marc
JM
Senocq
François
F