title: Metallic polycrystalline thin films of the single-component neutral molecular solid Ni(tmdt)2.
abstract: Metallic thin films of the single-component, neutral, molecular solid Ni(tmdt)2 have been prepared by electrocrystallization on passivated silicon substrates. Metallicity is achieved down to 6 K despite the polycrystalline morphology.
authors.affiliation: Laboratoire de Chimie de Coordination (CNRS), 205, route de Narbonne, 31077 Toulouse, France. malfant@lcc-toulouse.fr
authors.forename: Isabelle
authors.initials: I
authors.lastname: Malfant
authors.forename: Klauss
authors.initials: K
authors.lastname: Rivasseau
authors.forename: Jordi
authors.initials: J
authors.lastname: Fraxedas
authors.forename: Christophe
authors.initials: C
authors.lastname: Faulmann
authors.forename: Dominique
authors.initials: D
authors.lastname: de Caro
authors.forename: Lydie
authors.initials: L
authors.lastname: Valade
authors.forename: Lakhemici
authors.initials: L
authors.lastname: Kaboub
authors.forename: Jean Marc
authors.initials: JM
authors.lastname: Fabre
authors.forename: François
authors.initials: F
authors.lastname: Senocq