title: Photothermally enabled lithography for refractive-index modulation in SU-8 photoresist.
abstract: We present a new lithographic technique based on a hybrid photothermal process to modulate the refractive index in commercial SU-8 photoresist. Owing to a difference in cross-linking, the refractive index of unexposed SU-8 cross-linked by thermally induced polymerization is 0.0072 higher than that of SU-8 cross-linked by UV exposure and postbaking. Making use of this property, we fabricated two thick, flat-topped index-modulated diffractive optical elements (DOEs) that contain different phase distributions and measured their wavefront reconstruction. The good experimental reconstructions of the index DOEs demonstrate the potential to extend the refractive-index modulation technique for the fabrication of three-dimensional optical elements without needing a development step.
authors.affiliation: Photonics Research Centre, School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore.
authors.forename: Biow Hiem
authors.initials: BH
authors.lastname: Ong
authors.forename: Xiaocong
authors.initials: X
authors.lastname: Yuan
authors.forename: Shaohua
authors.initials: S
authors.lastname: Tao
authors.forename: Swee Chuan
authors.initials: SC
authors.lastname: Tjin