title: Electrochemical characterization of cast Ti-Hf binary alloys.
abstract: This study characterized the electrochemical behavior of Ti-Hf binary alloys in a simulated oral environment. Ti-Hf alloys (10, 20, 25, 30, 35 and 40 mass% Hf) were prepared by arc-melting titanium sponge and hafnium sponge. Specimens of each alloy (n = 4) were prepared using a dental titanium casting system with a MgO-based investment. Specimens were inspected with X-ray radiography to ensure minimal internal porosity. Castings (n = 4) made from pure titanium and commercially pure titanium were used as controls. The ground flat surface (10 mm x 10 mm) on each specimen where approximately 30 microm was removed was used for the characterization. Sixteen-hour open-circuit potential (OCP) measurement, linear polarization and potentiodynamic cathodic polarization were performed sequentially in aerated (air + 10% CO2) MTZ synthetic saliva at 37 degrees C. Potentiodynamic anodic polarization was conducted in the same medium but deaerated (N2 + 10% CO2) 2 h before and during testing. Polarization resistance (R(P)) and Tafel slopes were determined, as were corrosion current density (I(CORR)) and passive current density (I(PASS)). Results were subjected to nonparametric statistical analysis (alpha = 0.05). The OCP stabilized (mean values -229 mV to -470 mV vs. SCE) for all specimens after the 16-h immersion. Similar passivation was observed for all the metals on their anodic polarization diagrams. The Kruskal-Wallis test showed significant differences in OCP among the test groups (p = 0.006). No significant differences were found in R(P), I(CORR) or I(PASS) among all the metals (p>0.3). Results indicate that the electrochemical behavior of the Ti-Hf alloys examined resembles that of pure titanium.
authors.affiliation: Department of Biomaterials Science, Baylor College of Dentistry, Texas A&M University System Health Science Center, 3302 Gaston Avenue, Dallas, TX 75246, USA. zcai@bcd.tamhsc.edu
authors.forename: Z
authors.initials: Z
authors.lastname: Cai
authors.forename: M
authors.initials: M
authors.lastname: Koike
authors.forename: H
authors.initials: H
authors.lastname: Sato
authors.forename: M
authors.initials: M
authors.lastname: Brezner
authors.forename: Q
authors.initials: Q
authors.lastname: Guo
authors.forename: M
authors.initials: M
authors.lastname: Komatsu
authors.forename: O
authors.initials: O
authors.lastname: Okuno
authors.forename: T
authors.initials: T
authors.lastname: Okabe
mesh_terms: D000497:Alloys; D004563:Electrochemistry; D006195:Hafnium / Q000737:chemistry*; D014025:Titanium / Q000737:chemistry*
chemical_list: D000497:Alloys; D014025:Titanium; D006195:Hafnium