title: A Double Multilayer Monochromator at an ESRF Undulator for Microbeam Experiments.
abstract: A water-cooled double W/Si-multilayer monochromator has been operated at an ESRF low-beta undulator beam. For a fixed distance of the two multilayers the first-order Bragg reflection was at ~8 keV. The peak power density of the beam at the exit of the multilayers was ~1 W mm(-2) and the flux density of the first order after a 10 mum collimator was 4 x 10(5) photons s(-1) mum(-2) mA(-1.) The performance of the beam in microbeam diffraction has been tested on a 20 mum W wire. The observed pseudo-Laue pattern is discussed with respect to the multilayer spectrum.
authors.forename: P
authors.initials: P
authors.lastname: Deschamps
authors.forename: P
authors.initials: P
authors.lastname: Engström
authors.forename: S
authors.initials: S
authors.lastname: Fiedler
authors.forename: C
authors.initials: C
authors.lastname: Riekel
authors.forename: S
authors.initials: S
authors.lastname: Wakatsuki
authors.forename: P
authors.initials: P
authors.lastname: Høghøj
authors.forename: E
authors.initials: E
authors.lastname: Ziegler