title: Electromagnetic and thermal characterization of an UHF-applicator for concurrent irradiation and high resolution non-perturbing optical microscopy of cells.
abstract: To permit trans-illuminated, high-resolution optical microscopy during unperturbed ultrahigh frequency (UHF) irradiation, a novel new class of applicator has been designed based upon a shielded-pair transmission line. As constructed and tested with water-immersion optics and air cooling, the applicator works most robustly over 700-1100 MHz and permits SARs at the cell layer as high as 50 W/kg before the steady state temperature rise at the cell-layer exceeds 0.5 K.
authors.affiliation: Department of Electrical and Systems Engineering, Washington University, Saint Louis, Missouri 63130, USA. wfp@ese.wustl.edu
authors.forename: William F
authors.initials: WF
authors.lastname: Pickard
authors.forename: Eduardo G
authors.initials: EG
authors.lastname: Moros
authors.forename: Bibianna A
authors.initials: BA
authors.lastname: Cha
authors.forename: Petr
authors.initials: P
authors.lastname: Novak
mesh_terms: D000042:Absorption / Q000528:radiation effects; D001703:Biophysics / Q000295:instrumentation*; D002478:Cells, Cultured; D004574:Electromagnetic Fields; D004867:Equipment Design; D008853:Microscopy / Q000379:methods*; D008872:Microwaves; D055095:Optics and Photonics; D011874:Radiometry / Q000379:methods*