title: Cross-linked and chemically functionalized polymer supports by reactive reversal nanoimprint lithography.
abstract: A new format of polymer support having cross-linked polymeric micro- and nanoarrays has been fabricated via reactive reversal nanoimprint lithography. Reactive reversal nanoimprint lithography is a relatively simple method to imprint highly cross-linked and chemically tunable polymers. An array of chloromethyl-functionalized cross-linked polystyrene has been imprinted on hard (silicon) and soft (polymer) substrates, and a model esterification reaction is demonstrated. The imprints have been found to be relatively stable under both static and dynamic stability tests carried out in various organic solvents. The chemical functionality is evenly distributed over the imprinted array. This method of fabricating polymer supports offers a high degree of freedom in terms of the choice of chemical functionality, the types of polymer matrix, and the size of the polymer support. The functional polymer support has potential applications for chemical and biological assays.
authors.affiliation: Institute of Materials Research and Engineering, 3, Research Link, Singapore 117602.
authors.forename: Wei
authors.initials: W
authors.lastname: Zhao
authors.forename: Hong Yee
authors.initials: HY
authors.lastname: Low
authors.forename: P S
authors.initials: PS
authors.lastname: Suresh