Electromagnetic and thermal characterization of an UHF-applicator for concurrent irradiation and high resolution non-perturbing optical microscopy of cells.
To permit trans-illuminated, high-resolution optical microscopy during unperturbed ultrahigh frequency (UHF) irradiation, a novel new class of applicator has been designed based upon a shielded-pair transmission line. As constructed and tested with water-immersion optics and air cooling, the applicator works most robustly over 700-1100 MHz and permits SARs at the cell layer as high as 50 W/kg before the steady state temperature rise at the cell-layer exceeds 0.5 K.
Pickard
William F
WF
Department of Electrical and Systems Engineering, Washington University, Saint Louis, Missouri 63130, USA. wfp@ese.wustl.edu
Moros
Eduardo G
EG
Cha
Bibianna A
BA
Novak
Petr
P
D000042:Absorption / Q000528:radiation effects; D001703:Biophysics / Q000295:instrumentation*; D002478:Cells, Cultured; D004574:Electromagnetic Fields; D004867:Equipment Design; D008853:Microscopy / Q000379:methods*; D008872:Microwaves; D055095:Optics and Photonics; D011874:Radiometry / Q000379:methods*