Edge transfer lithography using alkanethiol inks.
Edge lithographic patterning techniques are based on the utilization of the edges of micrometer-sized template features for the reproduction of submicrometer structures. Edge transfer lithography (ETL) permits local surface modification in a single step by depositing self-assembled monolayers onto a metal substrate selectively along the feature edges of an elastomeric stamp. In this report two stamp designs are described that now allow for the use of alkanethiol inks in ETL and their use as etch resists to reproduce submicrometer structures in gold. Anisotropically modified stamps are shown to combine the potential for very high-resolution patterning with the versatility and simplicity of microcontact printing.
Sharpe
Ruben B A
RB
MESA+ Institute for Nanotechnology, University of Twente, P. O. Box 217, 7500 AE Enschede, The Netherlands.
Titulaer
Bram J F
BJ
Peeters
Emiel
E
Burdinski
Dirk
D
Huskens
Jurriaan
J
Zandvliet
Harold J W
HJ
Reinhoudt
David N
DN
Poelsema
Bene
B
D000473:Alkanes / Q000737:chemistry*; D006046:Gold / Q000737:chemistry*; D007281:Ink; D008422:Materials Testing; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D036103:Nanotechnology / Q000379:methods*; D010316:Particle Size; D011327:Printing / Q000379:methods*; D013438:Sulfhydryl Compounds / Q000737:chemistry*; D013499:Surface Properties
D000473:Alkanes; D013438:Sulfhydryl Compounds; D006046:Gold