title: Nonequilibrium interlayer transport in pulsed laser deposition.
abstract: We use time-resolved surface x-ray diffraction measurements with microsecond range resolution to study the growth kinetics of pulsed laser deposited . Time-dependent surface coverages corresponding to single laser shots were determined directly from crystal truncation rod intensity transients. Analysis of surface coverage evolution shows that extremely fast nonequilibrium interlayer transport, which occurs concurrently with the arrival of the laser plume, dominates the deposition process. A much smaller fraction of material, which is governed by the dwell time between successive laser shots, is transferred by slow, thermally driven interlayer transport processes.
authors.affiliation: Condensed Matter Sciences Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, USA.
authors.forename: J Z
authors.initials: JZ
authors.lastname: Tischler
authors.forename: Gyula
authors.initials: G
authors.lastname: Eres
authors.forename: B C
authors.initials: BC
authors.lastname: Larson
authors.forename: Christopher M
authors.initials: CM
authors.lastname: Rouleau
authors.forename: P
authors.initials: P
authors.lastname: Zschack
authors.forename: Douglas H
authors.initials: DH
authors.lastname: Lowndes