title: Optical properties of fluoride thin films deposited by RF magnetron sputtering.
abstract: Fluoride thin films for 193-nm lithography were deposited by three different types of RF magnetron sputtering. Systematic analysis of the relation between optical properties and deposition conditions of these thin films is discussed.
authors.affiliation: Department of Lens Engineering Development, Production Technology Headquarters, Core Technology Center, Nikon Corporation, Japan. iwahori.k@nikon.co.jp
authors.forename: Koichiro
authors.initials: K
authors.lastname: Iwahori
authors.forename: Masahiro
authors.initials: M
authors.lastname: Furuta
authors.forename: Yusuke
authors.initials: Y
authors.lastname: Taki
authors.forename: Tomoyuki
authors.initials: T
authors.lastname: Yamamura
authors.forename: Akira
authors.initials: A
authors.lastname: Tanaka