Optical properties of fluoride thin films deposited by RF magnetron sputtering.
Fluoride thin films for 193-nm lithography were deposited by three different types of RF magnetron sputtering. Systematic analysis of the relation between optical properties and deposition conditions of these thin films is discussed.
Iwahori
Koichiro
K
Department of Lens Engineering Development, Production Technology Headquarters, Core Technology Center, Nikon Corporation, Japan. iwahori.k@nikon.co.jp
Furuta
Masahiro
M
Taki
Yusuke
Y
Yamamura
Tomoyuki
T
Tanaka
Akira
A