The low energy X-ray spectrometry technique as applied to semiconductors.
We describe the recent introduction of low energy X-ray emission spectrometry as a metrology technique to control the fabrication process in the integrated circuit industry. The benefits of this particular analytical method and the wide field of potential applications are addressed.
Staub
Pierre-François
PF
Cameca, 103, Bd. St.-Denis, 92403, Courbevoie cedex, France. staub@cameca.fr