Formation of lambda-DNA's in parallel- and crossed-line arrays by molecular combing and scanning-probe lithography.
With the combination of a molecular combing technique and scanning-probe lithographic patterning, lambda-DNA's were stretched and aligned to form line array structures on patterned organic monolayer surfaces. The pattern was generated by anodizing a silicon surface using scanning-probe lithography to implant a polar organic layer in the middle of a nonpolar layer. The molecule in the polar layer, (aminopropyl)triethoxysilane (APS), has a -NH(3)(+) terminal group, which interacts strongly with phosphate backbone of DNA and provides a site for selective attachment of DNA. When parallel lines of APS were patterned, followed by combing along the lines, a single DNA was attached from the very top of each line and stretched along the line all the way to the bottom. The DNA-APS interaction was strong enough to withstand the second combing applied perpendicular to the first one. Thereby, the crossed-line array of DNA's was formed on the crossed-line array pattern of APS on a silicon substrate.
Shin
Minjung
M
Department of Chemistry, Sungkyunkwan University, Suwon, Korea.
Kwon
Chilwoo
C
Kim
Seong Kyu
SK
Kim
Hyung Jin
HJ
Roh
Yonghan
Y
Hong
Byungyou
B
Park
Jong Bae
JB
Lee
Haeseong
H
D004247:DNA / Q000737:chemistry*; D018625:Microscopy, Atomic Force; D008859:Microscopy, Polarization; D036103:Nanotechnology; D009690:Nucleic Acid Conformation; D011437:Propylamines; D012821:Silanes / Q000737:chemistry; D012825:Silicon / Q000737:chemistry*; D013499:Surface Properties
D011437:Propylamines; D012821:Silanes; D004247:DNA; C477625:amino-propyl-triethoxysilane; D012825:Silicon