title: Local lattice parameter determination of a silicon (001) layer grown on a sapphire (1102) substrate using convergent-beam electron diffraction.
abstract: All the six lattice parameters (a, b, c, alpha, beta and gamma) of a Si (001) layer grown on a sapphire (1102) substrate were determined by convergent-beam electron diffraction with no assumption of crystal lattice symmetry. A lattice compression in the Si (001) plane and an elongation in the [001] direction were revealed. An anisotropic lattice compression in the (001) plane was clearly detected for the first time. That is, the lattice compression in the Si [100] direction, which is parallel to the sapphire [1101] direction, was larger than that of the Si [010] direction, which is parallel to the sapphire [1120] direction. It was also revealed that the lattice parameters of the Si-layer depend on the distance from the interface. Anisotropy of carrier mobility was reasonably explained in terms of the anisotropy of the lattice parameters determined.
authors.affiliation: Asahi-Kasei Co. Ltd, 2-1 Samejima Fuji 416-8501, Japan. akaogi.tb@om.asahi-kasei.co.jp <tb@om.asahi-kasei.co.jp>
authors.forename: Takayuki
authors.initials: T
authors.lastname: Akaogi
authors.forename: Kenji
authors.initials: K
authors.lastname: Tsuda
authors.forename: Masami
authors.initials: M
authors.lastname: Terauchi
authors.forename: Michiyoshi
authors.initials: M
authors.lastname: Tanaka