title: X-ray absorption spectromicroscopy studies for the development of lithography with a monomolecular resist.
abstract: Soft X-ray absorption microscopy was applied to image and characterize molecular patterns produced by electron irradiation of aliphatic and aromatic thiol-derived self-assembled monolayers (SAMs) on Au substrates. The measurements were performed at all relevant absorption edges. The fabricated patterns could be clearly imaged with a lateral resolution better than 150 nm, which, for example, allowed us to distinguish a fine structure of 1 microm features. The X-ray absorption microspot spectra derived from different areas of the SAM patterns provided specific chemical information on pristine and irradiated areas and unexpected features in these patterns. The quality of the microspot spectra is comparable with that of the analogous X-ray absorption spectra acquired with standard equipment from homogeneous SAMs. In particular, a chemical transformation of the functional tail groups within the irradiated areas of the patterned aromatic SAMs could be directly monitored.
authors.affiliation: Angewandte Physikalische Chemie, Universität Heidelberg, Im Neuenheimer Feld 253, 69120 Heidelberg, Germany. Michael.Zharnikov@urz.uni-heidelberg.de
authors.forename: M
authors.initials: M
authors.lastname: Zharnikov
authors.forename: A
authors.initials: A
authors.lastname: Shaporenko
authors.forename: A
authors.initials: A
authors.lastname: Paul
authors.forename: A
authors.initials: A
authors.lastname: Gölzhäuser
authors.forename: A
authors.initials: A
authors.lastname: Scholl
mesh_terms: D013057:Spectrum Analysis / Q000379:methods*; D014965:X-Rays