title: Chemical alteration of poly(tetrafluoroethylene) TFE teflon induced by exposure to electrons and inert-gas ions.
abstract: In this study the chemical alterations of poly(tetrafluoroethylene) (TFE Teflon) by approximately 1.0-keV electrons and 1.0-keV He and Ar ions have been examined using X-ray photoelectron spectroscopy (XPS). The initial F/C atom ratio of 1.99 decreases to a steady-state value of 1.48 after 48 h of electron exposure. Exposure to either He+ or Ar+ decreases the initial F/C atom ratio from approximately 2 to a steady-state value of 1.12. The high-resolution XPS C 1s data indicate that new chemical states of carbon form as the F is removed and that the relative amounts of these states depend on the F content of the near-surface region. These states are most likely due to C bonded only to one F atom, C bonded only to other C atoms and C that have lost a pair of electrons through emission of F-. Exposures of the electron-damaged and He+- or Ar+-damaged surfaces to research-grade O2 result in chemisorption of very small amounts of O indicating that large quantities of reactive sites are not formed during the chemical erosion. Further exposure to the electron or ion fluxes quickly removes this chemisorbed oxygen. Exposure of the He+-damaged surface to air at room temperature results in the chemisorption of a larger amount of O than the O2 exposure but no N is adsorbed. The chemical alterations due to electrons and ions are compared with those caused by hyperthermal (approximately 5 eV) atomic oxygen (AO) and vacuum ultraviolet (VUV) radiation. The largest amount of damage is caused by AO followed by VUV, inert-gas ions, and then electrons.
authors.affiliation: Department of Chemical Engineering, University of Florida, Gainesville, Florida 32611, USA.
authors.forename: Michael L
authors.initials: ML
authors.lastname: Everett
authors.forename: Gar B
authors.initials: GB
authors.lastname: Hoflund