title: Patterning of single-wall carbon nanotubes via a combined technique (chemical anchoring and photolithography) on patterned substrates.
abstract: Single-walled carbon nanotubes (SWNTs) have been chemically attached with high density onto a patterned substrate. To form the SWNT pattern, the substrate was treated with acid-labile group protected amine, and an amine prepattern was formed using a photolithographic process with a novel polymeric photoacid generator (PAG). The polymeric PAG contains a triphenylsulfonium salt on its backbone and was synthesized to obtain a PAG with enhanced efficiency and ease of spin-coating onto the amine-modified glass substrate. The SWNT monolayer pattern was then formed through the amidation reaction between the carboxylic acid groups of carboxylated SWNTs (ca-SWNTs) and the prepatterned amino groups. A high-density multilayer was fabricated via further repeated reaction between the carboxylic acid groups of the ca-SWNTs and the amino groups of the linker with the aid of a condensation agent. The formation of covalent amide bonding was confirmed by X-ray photoelectron spectroscopy (XPS) analysis. Scanning electron microscopy and UV-vis-near-IR results show that the patterned SWNT films have uniform coverage with high surface density. Unlike previously reported patterned SWNT arrays, this ca-SWNT patterned layer has high surface density and excellent surface adhesion due to its direct chemical bonding to the substrate.
authors.affiliation: Department of Chemical and Biomolecular Engineering, Korea Advanced Institute of Science and Technology, 373-1 Guseong-dong, Yuseong-gu, Daejeon 305-701, Korea.
authors.forename: Myung-Sup
authors.initials: MS
authors.lastname: Jung
authors.forename: Sung-Ouk
authors.initials: SO
authors.lastname: Jung
authors.forename: Dae-Hwan
authors.initials: DH
authors.lastname: Jung
authors.forename: Young Koan
authors.initials: YK
authors.lastname: Ko
authors.forename: Yong Wan
authors.initials: YW
authors.lastname: Jin
authors.forename: Jongmin
authors.initials: J
authors.lastname: Kim
authors.forename: Hee-Tae
authors.initials: HT
authors.lastname: Jung
mesh_terms: D000577:Amides / Q000737:chemistry; D002264:Carboxylic Acids / Q000737:chemistry; D008027:Light; D008855:Microscopy, Electron, Scanning; D008856:Microscopy, Fluorescence; D008956:Models, Chemical; D037742:Nanotubes, Carbon / Q000737:chemistry*; D010777:Photochemistry / Q000379:methods; D011108:Polymers / Q000737:chemistry; D013055:Spectrophotometry, Infrared / Q000379:methods; D013056:Spectrophotometry, Ultraviolet; D013379:Substrate Specificity; D013452:Sulfonium Compounds / Q000737:chemistry; D013499:Surface Properties; D014466:Ultraviolet Rays
chemical_list: D000577:Amides; D002264:Carboxylic Acids; D037742:Nanotubes, Carbon; D011108:Polymers; D013452:Sulfonium Compounds; C013319:triphenylsulfonium ion