title: Ultrathin chromium oxide films on the W(100) surface.
abstract: Ultrathin chromium oxide films were prepared on a W(100) surface under ultrahigh-vacuum conditions and investigated in situ by X-ray photoelectron spectroscopy, ultraviolet photoelectron spectroscopy, and low-energy electron diffraction. The results show that, at Cr coverage of less than 1 monolayer, CrO2 is formed by oxidizing pre-deposited Cr at 300-320 K in approximately 10(-7) mbar oxygen. However, an increase of temperature causes formation of Cr2O3. At Cr coverage above 1 monolayer, only Cr2O3 is detected.
authors.affiliation: State Key Laboratory for Surface Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100080, China.
authors.forename: Donghui
authors.initials: D
authors.lastname: Guo
authors.forename: Qinlin
authors.initials: Q
authors.lastname: Guo
authors.forename: M S
authors.initials: MS
authors.lastname: Altman
authors.forename: E G
authors.initials: EG
authors.lastname: Wang