title: Bacterial inactivation using a low-temperature atmospheric plasma brush sustained with argon gas.
abstract: This study investigated the bacterial inactivation/sterilization effects of a new atmospheric plasma source, which is a brush-shaped argon glow discharge created under 1 atm pressure. Such an atmospheric plasma brush requires extremely low power of less than 20 W to operate; and therefore is essentially a low-temperature discharge as confirmed by gas-phase temperature measurements. Two bacteria, Escherichia coli (E. coli) and Micrococcus luteus (M. luteus), seeded in various media were subjected to plasma treatment and their survivability was examined. It was found that such argon atmospheric plasma brush is very effective in destruction of the bacteria cells. With nutrient broth and standard methods agar as supporting media, a cell reduction in a level of 6 orders of magnitude was observed for E. coli within 3-4 min plasma treatment. A similar level of cell reduction was also observed for M. luteus in the two media with 2 or 3 min plasma treatment. The plasma treatment effects on the bacteria cell structures were also examined using scanning electron microscopy and the cell structure damages due to the plasma exposure were observed on both bacteria. The possible sterilization mechanism of the argon plasmas is also discussed in this article.
authors.affiliation: Center for Surface Science and Plasma Technology and Department of Chemical Engineering, University of Missouri-Columbia, Columbia, Missouri 65211, USA. yuq@missouri.edu
authors.forename: Q S
authors.initials: QS
authors.lastname: Yu
authors.forename: C
authors.initials: C
authors.lastname: Huang
authors.forename: F-H
authors.initials: FH
authors.lastname: Hsieh
authors.forename: H
authors.initials: H
authors.lastname: Huff
authors.forename: Yixiang
authors.initials: Y
authors.lastname: Duan
mesh_terms: D001128:Argon / Q000737:chemistry*; D004866:Equipment Contamination / Q000517:prevention & control*; D004926:Escherichia coli / Q000254:growth & development* / Q000648:ultrastructure; D004927:Escherichia coli Infections / Q000517:prevention & control; D006358:Hot Temperature; D050296:Microbial Viability; D016982:Micrococcus luteus / Q000254:growth & development* / Q000648:ultrastructure; D008855:Microscopy, Electron, Scanning; D013242:Sterilization / Q000295:instrumentation / Q000379:methods; D013997:Time Factors
chemical_list: D001128:Argon