title: Pattern formation in dewetting poly(tert-butyl acrylate)/polyhedral oligomeric silsesquioxane (POSS) bilayer films.
abstract: The surface morphology of dewetting poly(tert-butyl acrylate) (PtBA) and trisilanolphenyl-POSS (TPP) bilayers has been studied as a function of time at 95 degrees C. For short annealing times, only the upper nanoparticle (TPP) layer dewets from the underlying PtBA layer. The number and lateral dimensions of the holes in the upper TPP layer increase with increasing annealing times, forming interconnected rim structures. At later annealing times, scattered holes that reach down into the PtBA layer are observed among the interconnected rim structures. Fractal nanofiller (TPP)-rich aggregates are found at the bottom of the scattered holes.
authors.affiliation: Macromolecules and Interfaces Institute and Department of Chemistry (0212), Virginia Polytechnic Institute and State University, Blacksburg, VA 24061, USA.
authors.forename: Rituparna
authors.initials: R
authors.lastname: Paul
authors.forename: Alan R
authors.initials: AR
authors.lastname: Esker
mesh_terms: D000179:Acrylates; D008567:Membranes, Artificial; D017646:Organosilicon Compounds / Q000737:chemistry*; D011137:Polystyrenes; D000644:Quaternary Ammonium Compounds / Q000737:chemistry*; D013499:Surface Properties
chemical_list: D000179:Acrylates; D008567:Membranes, Artificial; D017646:Organosilicon Compounds; D011137:Polystyrenes; D000644:Quaternary Ammonium Compounds; C509854:poly(styrene-b-tert-butylacrylate); C018408:3-(trimethoxysilyl)propyldimethyloctadecylammonium