title: Large-area surface-plasmon polariton interference lithography.
abstract: Large-area surface-plasmon polariton (SPP) interference lithography is presented, which uses an attenuated total reflection-coupling mode to excite the interference of the SPPs. The interference of the SPPs causes a highly directional intensity range in a finite depth of the electric field, which is good for noncontact. Finite-difference time-domain simulations of the interference on a thin resist layer show that broad-beam illumination with a p-polarized light at a wavelength of 441 nm can produce features as small as 60 nm with high contrast, smaller than lambda/7. Our results illustrate the potential for patterning periodic structures over large areas at low cost.
authors.affiliation: Department of Physics, Sichuan University, Chengdu, China. guoxiaoweihao@163.com
authors.forename: Xiaowei
authors.initials: X
authors.lastname: Guo
authors.forename: Jinglei
authors.initials: J
authors.lastname: Du
authors.forename: Yongkang
authors.initials: Y
authors.lastname: Guo
authors.forename: Jun
authors.initials: J
authors.lastname: Yao