Removal of arsenic from groundwater by micellar-enhanced ultrafiltration (MEUF).
The removal characteristics of arsenate using micellar-enhanced ultrafiltration (MEUF) were investigated. Among four different cationic surfactants used, hexadecylpyridinium chloride (CPC) showed the highest removal efficiency of arsenic (96%), and the removal efficiency with hexadecyltrimethylammonium bromide (CTAB) was 94%. But the removal efficiency with benzalkonium chloride (BC) was the lowest (57%) due to higher critical micelle concentration (CMC) of BC than those of other surfactants. Over 80% of arsenic was removed with octadecylamine acetate (ODA). On the effect of solution pH on the arsenic removal, since the valance of arsenate decreases from trivalent to monovalent as pH decreases, the removal was reduced at lower pH. The presence of 0.45mM of nitrate and 0.01mM of phosphate reduced the removal efficiency by 5-8%. This decrease was because of the competition between the arsenate, nitrate and phosphate for the binding sites of the surfactant micelle. Similar decrease in the removal of arsenate was observed with CPC, CTAB and ODA in the presence of these anions. In cross-flow filtration, the removal efficiency of arsenic was similar to that in the dead-end system. However, the decline in flux was less than that in dead-end filtration. In order to lower the concentration of the surfactant in the effluent, the effluent was treated with powdered activated carbon (PAC) before discharging to the environment. Over 98% surfactant was removed with 1gl(-1) of PAC. In conclusions, the MEUF is considered as a feasible process using CPC or CTAB to remove the arsenate from groundwater compared with the other solid based adsorbent processes.
Iqbal
Javed
J
National Research Laboratory for Environmental Remediation, Department of Chemical and Biomolecular Engineering, Korea Advanced Institute of Science and Technology, 373-1, Guseong-dong, Yuseong-gu, Daejeon 305-701, Republic of Korea.
Kim
Ho-Jeong
HJ
Yang
Jung-Seok
JS
Baek
Kitae
K
Yang
Ji-Won
JW
D001151:Arsenic / Q000737:chemistry / Q000302:isolation & purification*; D001548:Benzalkonium Compounds / Q000737:chemistry; D000077286:Cetrimonium; D002593:Cetrimonium Compounds / Q000737:chemistry; D002594:Cetylpyridinium / Q000737:chemistry; D008823:Micelles; D013501:Surface-Active Agents / Q000737:chemistry*; D014462:Ultrafiltration; D014874:Water Pollutants, Chemical / Q000737:chemistry / Q000302:isolation & purification*; D018508:Water Purification / Q000379:methods*; D014881:Water Supply
D001548:Benzalkonium Compounds; D002593:Cetrimonium Compounds; D008823:Micelles; D013501:Surface-Active Agents; D014874:Water Pollutants, Chemical; D002594:Cetylpyridinium; D001151:Arsenic; D000077286:Cetrimonium