title: Fabrication of high-aspect-ratio metallic nanostructures using nanoskiving.
abstract: This communication describes the fabrication of gold structures (for example, rings) with wall thickness of 40 nm, and with high aspect ratios up to 25. This technique combines thin-film deposition of metal on a topographically patterned epoxy substrate, with nanometer-scale sectioning using a microtome in a plane parallel to the patterned substrate. The dimensions of the metal structures are determined by the thickness of the metal film and the thickness of the epoxy sections. The shape of the resulting nanostructure is defined by the cross section of the original template.
authors.affiliation: Department of Chemistry and Chemical Biology, Harvard University, 12 Oxford Street, Cambridge, Massachusetts 02138, USA.
authors.forename: Qiaobing
authors.initials: Q
authors.lastname: Xu
authors.forename: Raquel
authors.initials: R
authors.lastname: Perez-Castillejos
authors.forename: Zhefeng
authors.initials: Z
authors.lastname: Li
authors.forename: George M
authors.initials: GM
authors.lastname: Whitesides
mesh_terms: D003460:Crystallization / Q000379:methods*; D006046:Gold / Q000737:chemistry*; D008422:Materials Testing; D008968:Molecular Conformation; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D036103:Nanotechnology / Q000379:methods*; D010316:Particle Size; D013499:Surface Properties
chemical_list: D006046:Gold