Polarization phase in aberration compensation.
A phase/amplitude mask on the aperture of an imaging system results in a pupil function that is multiplicative with the lens function, resulting in a morphological transformation of the imaging wavefront. It was shown that such amplitude and phase functions can be implemented using polarization masks, with the advantage that the phase and amplitude can be controlled in real time and in some cases, independently of each other. The phase and amplitude variation over the mask can be controlled either by changing the polarization of the mask or by changing the input beam parameters. Wavefront tailoring using polarization-masked apertures is therefore feasible and may be utilized for focal shift and partial aberration compensation. For complete compensation of aberration, the phase distribution over the mask should be conjugate to that of the phase error of the aberrant wavefront, which necessitates the use of a continuously variable polarization mask. Since such a mask is difficult to implement, we have considered polarizing masks consisting of discrete polarized zones on the lens aperture, leading to polarization phase steps on the exit pupil of the imaging system. The simulation results presented in this paper show that effects of focal shift, partial compensation of primary spherical aberration and astigmatism can indeed be achieved by the proper use of polarization masked apertures.
Roychowdhury
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D
Department of Applied Optics and Photonics, University of Calcutta, 92, A.P.C. Road, Kolkata 700 009, India.
Bhattacharya
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K
Chakraborty
A K
AK