title: Force-controlled inorganic crystallization lithography.
abstract: Lithography plays a key role in integrated circuits, optics, information technology, biomedical applications, catalysis, and separation technologies. However, inorganic lithography techniques remain of limited utility for applications outside of the typical foci of integrated circuit manufacturing. In this communication, we have developed a novel stamping method that applies pressure on the upper surface of the stamp to regulate the dewetting process of the inorganic buffer and the evaporation rate of the solvent in this buffer between the substrate and the surface of the stamp. We focused on generating inorganic microstructures with specific locations and also on enabling the ability to pattern gradients during the crystallization of the inorganic salts. This approach utilized a combination of lithography with bottom-up growth and assembly of inorganic crystals. This work has potential applications in a variety of fields, including studying inorganic material patterning and small-scale fabrication technology.
authors.affiliation: Department of Mechanical, Carnegie Mellon University, Pittsburgh, Pennsylvania 15213, USA.
authors.forename: Chao-Min
authors.initials: CM
authors.lastname: Cheng
authors.forename: Philip R
authors.initials: PR
authors.lastname: LeDuc
mesh_terms: D002021:Buffers; D003460:Crystallization; D004129:Dimethylpolysiloxanes / Q000737:chemistry*; D008832:Microchemistry / Q000379:methods*; D008855:Microscopy, Electron, Scanning; D010781:Photography; D012825:Silicon / Q000737:chemistry*
chemical_list: D002021:Buffers; D004129:Dimethylpolysiloxanes; D012825:Silicon