title: Block copolymer film with sponge-like nanoporous strucutre for antireflection coating.
abstract: We prepared nanoporous films by spin-coating of polystyrene-block-poly(methyl methacrylate) copolymers (PS-b-PMMA) to a glass and irradiating by ultra-violet source followed by selective removal of PMMA blocks with acetic acid. When spin-coated PS-b-PMMA was no longer annealed at high temperatures, microphase separation between two blocks occurred only in the short-range scale. The porous films prepared from PS-b-PMMA with the volume fraction of PMMA block of 0.69 exhibited a spongelike nanoporous structure over the entire film thickness and showed excellent antireflection with a minimum reflection less than 0.1% at visible and near-infrared wavelengths. The observed reflectances were in good agreement with the predictions based on the characteristic matrix theory.
authors.affiliation: National Creative Research Initiative Center for Block Copolymer Self-Assembly, Department of Chemical Engineering and Polymer Research Institute, Pohang University of Science and Technology, Pohang, Kyungbuk 790-784, Korea.
authors.forename: Wonchul
authors.initials: W
authors.lastname: Joo
authors.forename: Min Soo
authors.initials: MS
authors.lastname: Park
authors.forename: Jin Kon
authors.initials: JK
authors.lastname: Kim
mesh_terms: D008027:Light; D008567:Membranes, Artificial; D008689:Methacrylates / Q000737:chemistry*; D018625:Microscopy, Atomic Force; D049329:Nanostructures / Q000737:chemistry*; D019904:Polymethyl Methacrylate / Q000737:chemistry; D011137:Polystyrenes / Q000737:chemistry*; D016062:Porosity; D013499:Surface Properties
chemical_list: D008567:Membranes, Artificial; D008689:Methacrylates; D011137:Polystyrenes; C522509:polystyrene-block-poly(methyl methacrylate); D019904:Polymethyl Methacrylate