Replica molding of high-aspect-ratio polymeric nanopillar arrays with high fidelity.
Polymeric nanostructures with high aspect ratios, so-called nanopillars, are of interest for a wide range of applications. However, it remains a challenge to fabricate high-density, polymeric nanopillars using soft lithography when the feature size is decreased to hundreds of nanometers and the structures are close to each other. Here, we investigate the fidelity of replica molding technique to fabricate polymer nanopillar arrays with diameters ranging from 300 nm to 1 mum, and we compare the experimental results to the theoretical prediction to understand the nature of the instability of nanopillars. Nanopillars molded from soft materials, poly(dimethylsiloxane) (PDMS), mainly ground collapse due to the adhesive force when the aspect ratio is above 6, whereas those from stiffer materials, polyurethane and epoxy, collapse laterally at a much higher aspect ratio (>/=12), of which the critical value is dependent on the nanopillar's feature size, spacing, height, and shape. Further, we attempt to restore the collapsed high-aspect-ratio nanopillars using supercritical CO(2) drying.
Zhang
Ying
Y
Department of Materials Science and Engineering, University of Pennsylvania, Philadelphia, Pennsylvania 19104, USA.
Lo
Chi-Wei
CW
Taylor
J Ashley
JA
Yang
Shu
S
D004129:Dimethylpolysiloxanes / Q000737:chemistry*; D004852:Epoxy Compounds / Q000737:chemistry*; D008422:Materials Testing; D008855:Microscopy, Electron, Scanning; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure; D011140:Polyurethanes / Q000737:chemistry*; D013499:Surface Properties
D004129:Dimethylpolysiloxanes; D004852:Epoxy Compounds; D011140:Polyurethanes