title: Tunable instability mechanisms of polymer thin films by molecular self-assembly.
abstract: Incorporation of a block copolymer into a thin polymer film is observed to alter both the rate and mechanism by which the film dewets from an immiscible polymer substrate. Films with little or no copolymer dewet by classical nucleation and growth of circular holes, and the dewetting rate decreases with increasing copolymer concentration. Increasing the copolymer content at constant film thickness generates copolymer micelles that adsorb/aggregate along the polymer/polymer interface and promote nonclassical dewetting fluctuations similar in appearance to spinodal dewetting. At higher copolymer concentrations, dewetting proceeds after a lengthy induction period by the nucleation and growth of flower-shaped holes suggestive of film pinning or viscous fingering. Atomic force microscopy of the polymer/polymer interface after removal of the top film by selective dissolution reveals substantial structural development due to copolymer self-assembly.
authors.affiliation: Department of Chemical & Biomolecular Engineering, North Carolina State University, Raleigh, North Carolina 27695, USA.
authors.forename: Bin
authors.initials: B
authors.lastname: Wei
authors.forename: Peter G
authors.initials: PG
authors.lastname: Lam
authors.forename: Michael B
authors.initials: MB
authors.lastname: Braunfeld
authors.forename: David A
authors.initials: DA
authors.lastname: Agard
authors.forename: Jan
authors.initials: J
authors.lastname: Genzer
authors.forename: Richard J
authors.initials: RJ
authors.lastname: Spontak
mesh_terms: D018625:Microscopy, Atomic Force; D019904:Polymethyl Methacrylate / Q000737:chemistry*; D011137:Polystyrenes / Q000737:chemistry*
chemical_list: D011137:Polystyrenes; D019904:Polymethyl Methacrylate