title: Electron-stimulated production of molecular oxygen in amorphous solid water on Pt111: precursor transport through the hydrogen bonding network.
abstract: The low-energy, electron-stimulated production of molecular oxygen from thin amorphous solid water (ASW) films adsorbed on Pt(111) is investigated. For ASW coverages less than approximately 60 ML, the O(2) electron-stimulated desorption (ESD) yield depends on coverage in a manner that is very similar to the H(2) ESD yield. In particular, both the O(2) and H(2) ESD yields have a pronounced maximum at approximately 20 ML due to reactions at the Pt/water interface. The O(2) yield is dose dependent and several precursors (OH, H(2)O(2), and HO(2)) are involved in the O(2) production. Layered films of H(2) (16)O and H(2) (18)O are used to profile the spatial distribution of the electron-stimulated reactions leading to oxygen within the water films. Independent of the ASW film thickness, the final reactions leading to O(2) occur at or near the ASW/vacuum interface. However, for ASW coverages less than approximately 40 ML, the results indicate that dissociation of water molecules at the ASW/Pt interface contributes to the O(2) production at the ASW/vacuum interface presumably via the generation of OH radicals near the Pt substrate. The OH (or possibly OH(-)) segregates to the vacuum interface where it contributes to the reactions at that interface. The electron-stimulated migration of precursors to the vacuum interface occurs via transport through the hydrogen bond network of the ASW without motion of the oxygen atoms. A simple kinetic model of the nonthermal reactions leading to O(2), which was previously used to account for reactions in thick ASW films, is modified to account for the electron-stimulated migration of precursors.
authors.affiliation: Fundamental Sciences Directorate, Pacific Northwest National Laboratory, Mail Stop K8-88, Richland, WA 99352, USA.
authors.forename: Nikolay G
authors.initials: NG
authors.lastname: Petrik
authors.forename: Alexander G
authors.initials: AG
authors.lastname: Kavetsky
authors.forename: Greg A
authors.initials: GA
authors.lastname: Kimmel