title: Fabrication of nanopores in a 100-nm thick Si3N4 membrane.
abstract: Textured alumina films have been used to fabricate nanoscale pores in Si3N4 membranes. A few nanometer-thick alumina layer was used as a masking material for nanopore fabrication, and the pattern was transferred into a 100-nm thick, 200 microm x 200 microm Si3N4 membrane by reactive ion etching (RIE). The nanopores were found to be concentrated in a approximately 150-microm diameter region at the center of the membrane.
authors.affiliation: Department of Mechanical Engineering, Northwestern University, Evanston, IL 60208, USA.
authors.forename: Jae-Hyun
authors.initials: JH
authors.lastname: Chungt
authors.forename: Xinqi
authors.initials: X
authors.lastname: Chen
authors.forename: Eric J
authors.initials: EJ
authors.lastname: Zimney
authors.forename: Rodney S
authors.initials: RS
authors.lastname: Ruoff
mesh_terms: D003460:Crystallization / Q000379:methods*; D046911:Macromolecular Substances / Q000737:chemistry; D008422:Materials Testing; D008567:Membranes, Artificial; D008968:Molecular Conformation; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D036103:Nanotechnology / Q000295:instrumentation / Q000379:methods*; D010316:Particle Size; D016062:Porosity; D017655:Silicon Compounds / Q000737:chemistry*; D013499:Surface Properties; D014462:Ultrafiltration / Q000295:instrumentation / Q000379:methods*
chemical_list: D046911:Macromolecular Substances; D008567:Membranes, Artificial; D017655:Silicon Compounds; C032734:silicon nitride