title: Porogen approach for the fabrication of plasma-polymerized nanoporous polysiloxane films.
abstract: Nanoporous polysiloxane films were fabricated by plasma polymerization of hexamethyldisiloxane mixed with cyclohexane under different conditions. The pores were generated through the elimination of carbonaceous aggregates (porogen) by annealing at 600 degrees C. Results of spectroscopic ellipsometry, Fourier transform infrared spectroscopy, and positron annihilation lifetime spectroscopy suggest that not only film porosity but also average pore size depends on the amount of the decomposable porogen. The pore size was controllable in a range between 0.6 and 1.0 nm in radius by proper selection of the substrate temperature and precursor composition.
authors.affiliation: National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8565 and 305-8568, Japan. t-oka@aist.go.jp
authors.forename: Toshitaka
authors.initials: T
authors.lastname: Oka
authors.forename: Kenji
authors.initials: K
authors.lastname: Ito
authors.forename: Makoto
authors.initials: M
authors.lastname: Muramatsu
authors.forename: Toshiyuki
authors.initials: T
authors.lastname: Ohdaira
authors.forename: Ryoichi
authors.initials: R
authors.lastname: Suzuki
authors.forename: Yoshinori
authors.initials: Y
authors.lastname: Kobayashi