Plasmon-assisted chemical vapor deposition.
We introduce a new chemical vapor deposition (CVD) process that can be used to selectively deposit materials of many different types. The technique makes use of the plasmon resonance in nanoscale metal structures to produce the local heating necessary to initiate deposition when illuminated by a focused low-power laser. We demonstrate the technique, which we refer to as plasmon-assisted CVD (PACVD), by patterning the spatial deposition of PbO and TiO(2) on glass substrates coated with a dispersion of 23 nm gold particles. The morphology of both oxide deposits is consistent with local laser-induced heating of the gold particles by more than 150 degrees C. We show that temperature changes of this magnitude are consistent with our analysis of the heat-loss mechanisms. The technique is general and can be used to spatially control the deposition of virtually any material for which a CVD process exists.
Boyd
David A
DA
Division of Engineering and Applied Science, California Institute of Technology, Pasadena, California 91125, USA. daboyd@caltech.edu
Greengard
Leslie
L
Brongersma
Mark
M
El-Naggar
Mohamed Y
MY
Goodwin
David G
DG
D006046:Gold / Q000737:chemistry*; D007854:Lead / Q000737:chemistry*; D008422:Materials Testing; D036103:Nanotechnology / Q000379:methods*; D010087:Oxides / Q000737:chemistry*; D010316:Particle Size; D020349:Surface Plasmon Resonance / Q000379:methods*; D013499:Surface Properties; D013696:Temperature; D014025:Titanium / Q000737:chemistry*
D010087:Oxides; C009495:titanium dioxide; D007854:Lead; C047365:lead oxide; D006046:Gold; D014025:Titanium