title: The initial stage of uranium oxidation: mechanism of UO(2) scale formation in the presence of a native lateral stress field.
abstract: In this work, an oxidation model for alpha-uranium is presented. It describes the internally lateral stress field built in the oxide scale during the reaction. The thickness of the elastic, stress-preserving oxide (UO(2+x)) scale is less than 0.5 microm. A lateral, 6.5 GPa stress field has been calculated from strains derived from line shifts (delta(2theta)) as measured by the X-ray diffraction of UO(2). It is shown that in the elastic growth domain, (110) is the main UO(2) growth plane for gas-solid oxidation. The diffusion-limited oxidation mechanism discussed here is based on the known "2:2:2" cluster theory which describes the mechanism of fluorite-based hyperstoichiometric oxides. In this study, it is adapted to describe oxygen-anion hopping. Anion hopping toward the oxide-metal interface proceeds at high rates in the [110] direction, hence making this pipeline route the principal growth direction in UO(2) formation. It is further argued that growth in the pure elastic domain of the oxide scale should be attributed entirely to anion hopping in 110. Anions, diffusing isotropically via grain boundaries and cracks, are shown to have a significant impact on the overall oxidation rate in relatively thick (>0.35 microm) oxide scales if followed by an avalanche break off in the postelastic regime. Stress affects oxidation in the elastic domain by controlling the hopping rate directly. In the postelastic regime, stress weakens hopping, indirectly, by enhancing isotropic diffusion. Surface roughness presents an additional hindering factor for the anion hopping. In comparison to anisotropic hopping, diffusion of isotropic hopping has a lower activation energy barrier. Therefore, a relatively stronger impact at lower temperatures due to isotropic diffusion is displayed.
authors.affiliation: Nuclear Research Center-Negev, P.O. Box 9001, Beer-Sheva 84190, Israel, and Institutes for Applied Research, BGU, P.O. Box 653, Beer-Sheva 84105, Israel. chernia1@netvision.net.il
authors.forename: Z
authors.initials: Z
authors.lastname: Chernia
authors.forename: Y
authors.initials: Y
authors.lastname: Ben-Eliyahu
authors.forename: G
authors.initials: G
authors.lastname: Kimmel
authors.forename: G
authors.initials: G
authors.lastname: Braun
authors.forename: J
authors.initials: J
authors.lastname: Sariel