DPN-generated nanostructures as positive resists for preparing lithographic masters or hole arrays.
Experiments that utilize structures generated by dip-pen nanolithography (DPN) as positive resists for fabricating nanohole arrays and lithographic masters are described. The technique takes advantage of the difference in desorption potentials for patterned structures made from 16-mercaptohexadecanoic acid (MHA) and 1-octadecanethiol (ODT), respectively. In this approach, patterns of MHA on gold are generated by DPN, and surrounding areas are passivated by ODT. Electrochemistry is used to selectively remove the MHA nanofeatures made by DPN. The exposed gold can be used as an electrode to plate silver from solution, generating raised features and structures that can be transferred to PDMS to make a lithographic master, or alternatively, they can be etched to make arrays of nanoholes.
Salaita
Khalid S
KS
Department of Chemistry, Department of Materials Science and Engineering, Department of Medicine, Northwestern University, Evanston, Illinois 60208, USA.
Lee
Seung Woo
SW
Ginger
David S
DS
Mirkin
Chad A
CA
D004553:Electric Conductivity; D004563:Electrochemistry; D006046:Gold / Q000737:chemistry; D008422:Materials Testing; D049329:Nanostructures / Q000737:chemistry*; D036103:Nanotechnology; D010169:Palmitic Acids / Q000737:chemistry; D010316:Particle Size; D012834:Silver / Q000737:chemistry; D013438:Sulfhydryl Compounds / Q000737:chemistry; D013499:Surface Properties
C450319:16-mercaptohexadecanoic acid; D010169:Palmitic Acids; D013438:Sulfhydryl Compounds; C055360:n-octadecyl mercaptan; D012834:Silver; D006046:Gold