title: Photoreversibly switchable superhydrophobic surface with erasable and rewritable pattern.
abstract: We report the facile fabrication of a functional nanoporous multilayer film with wettability that is reversibly tunable between superhydrophobicity and superhydrophilicity with UV/visible irradiation. Our approach controls surface roughness with an electrostatic self-assembly process and makes use of the photoresponsive molecular switching of fluorinated azobenzene molecules. Selective UV irradiation onto the nanostructured substrate was used to realize substrates with erasable and rewritable patterns of extreme wetting properties. Our findings will open up new avenues for external stimuli-responsive smart surfaces.
authors.affiliation: Department of Chemical Engineering, Pohang University of Science and Technology, Pohang 790-784, Korea.
authors.forename: Ho Sun
authors.initials: HS
authors.lastname: Lim
authors.forename: Joong Tark
authors.initials: JT
authors.lastname: Han
authors.forename: Donghoon
authors.initials: D
authors.lastname: Kwak
authors.forename: Meihua
authors.initials: M
authors.lastname: Jin
authors.forename: Kilwon
authors.initials: K
authors.lastname: Cho