Photoreversibly switchable superhydrophobic surface with erasable and rewritable pattern.
We report the facile fabrication of a functional nanoporous multilayer film with wettability that is reversibly tunable between superhydrophobicity and superhydrophilicity with UV/visible irradiation. Our approach controls surface roughness with an electrostatic self-assembly process and makes use of the photoresponsive molecular switching of fluorinated azobenzene molecules. Selective UV irradiation onto the nanostructured substrate was used to realize substrates with erasable and rewritable patterns of extreme wetting properties. Our findings will open up new avenues for external stimuli-responsive smart surfaces.
Lim
Ho Sun
HS
Department of Chemical Engineering, Pohang University of Science and Technology, Pohang 790-784, Korea.
Han
Joong Tark
JT
Kwak
Donghoon
D
Jin
Meihua
M
Cho
Kilwon
K