Micropore x-ray optics using anisotropic wet etching of (110) silicon wafers.
To develop x-ray mirrors for micropore optics, smooth silicon (111) sidewalls obtained after anisotropic wet etching of a silicon (110) wafer were studied. A sample device with 19 microm wide (111) sidewalls was fabricated using a 220 microm thick silicon (110) wafer and potassium hydroxide solution. For what we believe to be the first time, x-ray reflection on the (111) sidewalls was detected in the angular response measurement. Compared to ray-tracing simulations, the surface roughness of the sidewalls was estimated to be 3-5 nm, which is consistent with the atomic force microscope and the surface profiler measurements.
Ezoe
Yuichiro
Y
Department of High Energy Astrophysics, Institute of Space and Astronautical Science, Japan Aerospace Exploration Agency, 3-1-1 Yoshinodai, Sagamihara, Kanagawa 229-8510, Japan. ezoe@astro.isas.jaxa.jp
Koshiishi
Masaki
M
Mita
Makoto
M
Mitsuda
Kazuhisa
K
Hoshino
Akio
A
Ishisaki
Yoshitaka
Y
Yang
Zhen
Z
Takano
Takayuki
T
Maeda
Ryutaro
R
D016880:Anisotropy; D006878:Hydroxides / Q000737:chemistry*; D018625:Microscopy, Atomic Force; D055095:Optics and Photonics; D010825:Physics / Q000379:methods; D017680:Potassium Compounds / Q000737:chemistry*; D012542:Scattering, Radiation; D012666:Semiconductors; D012825:Silicon / Q000737:chemistry*; D013499:Surface Properties; D014965:X-Rays
D006878:Hydroxides; D017680:Potassium Compounds; C029943:potassium hydroxide; D012825:Silicon