title: Fabrication of nanoporous templates from diblock copolymer thin films on alkylchlorosilane-neutralized surfaces.
abstract: The fabrication of nanoporous templates from poly(styrene)-b-poly(methyl methacrylate) diblock copolymer thin films (PS-b-PMMA, volume ratio 70:30) on silicon requires precise control of interfacial energies to achieve a perpendicular orientation of the PMMA cylindrical microdomains relative to the substrate. To provide a simple, rapid, yet tunable approach for surface neutralization, we investigated the self-assembled ordering of PS-b-PMMA diblock copolymer thin films on silicon substrates modified with a partial monolayer of octadecyldimethyl chlorosilane (ODMS), i.e., a layer of ODMS with a grafting density less than the maximum possible monolayer surface coverage. We demonstrate herein the fabrication of nanoporous PS templates from annealed PS-b-PMMA diblock copolymer thin films on these partial ODMS SAMs.
authors.affiliation: Keck Graduate Institute, 535 Watson Drive, Claremont, CA 91711, USA. aniemz@kgi.edu
authors.forename: Angelika
authors.initials: A
authors.lastname: Niemz
authors.forename: Krisanu
authors.initials: K
authors.lastname: Bandyopadhyay
authors.forename: Eric
authors.initials: E
authors.lastname: Tan
authors.forename: Kitty
authors.initials: K
authors.lastname: Cha
authors.forename: Shenda M
authors.initials: SM
authors.lastname: Baker