Oxidized gold as an ultrathin etch resist applied in microcontact printing.
In this report it is described how a gold surface can be treated with an oxygen plasma to become an effective etch mask, with its etch resistive properties based upon electrostatic repulsion. Such a treated gold layer is only temporarily stable and may therefore be employed as a temporary etch barrier that introduces no contaminating species. Deterioration of the barrier properties can be locally expedited in a scheme that is compatible with microcontact printing. This has been achieved by the microcontact printing of a reductant on a fully oxidized gold substrate.
Sharpe
Ruben B A
RB
MESA+ Institute for Nanotechnology, Molecular Nanofabrication, and Solid State Physics, University of Twente, 7500 AE Enschede, The Netherlands.
Burdinski
Dirk
D
Huskens
Jurriaan
J
Zandvliet
Harold J W
HJ
Reinhoudt
David N
DN
Poelsema
Bene
B