title: Large area, 38 nm half-pitch grating fabrication by using atomic spacer lithography from aluminum wire grids.
abstract: We wrapped 150 nm period aluminum wire grid polarizer (WGP) with AlSiOx by using atomic layer deposition at 250 degrees C. The nanometer precision coating defined the spacer to double the spatial frequency of the 100 mm diameter grating fabricated by using a legacy immersion holography setup at 351 nm wavelength. Half-pitch grating of approximately 38 nm was demonstrated with good pattern uniformity, excellent repeatability, and a wide processing window. We believe 10 nm half-pitch grating over even larger areas are viable, overcoming one major hurdle to commercialize nanoimprint.
authors.affiliation: Nanoopto Corporation, 1600 Cottontail Lane, Somerset, New Jersey 08873, USA. mliu@nanoopto.com
authors.forename: Xiaoming
authors.initials: X
authors.lastname: Liu
authors.forename: Xuegong
authors.initials: X
authors.lastname: Deng
authors.forename: Paul
authors.initials: P
authors.lastname: Sciortino
authors.forename: Mike
authors.initials: M
authors.lastname: Buonanno
authors.forename: Frank
authors.initials: F
authors.lastname: Walters
authors.forename: Ron
authors.initials: R
authors.lastname: Varghese
authors.forename: Joel
authors.initials: J
authors.lastname: Bacon
authors.forename: Lei
authors.initials: L
authors.lastname: Chen
authors.forename: Nada
authors.initials: N
authors.lastname: O'Brien
authors.forename: Jian Jim
authors.initials: JJ
authors.lastname: Wang