Large area, 38 nm half-pitch grating fabrication by using atomic spacer lithography from aluminum wire grids.
We wrapped 150 nm period aluminum wire grid polarizer (WGP) with AlSiOx by using atomic layer deposition at 250 degrees C. The nanometer precision coating defined the spacer to double the spatial frequency of the 100 mm diameter grating fabricated by using a legacy immersion holography setup at 351 nm wavelength. Half-pitch grating of approximately 38 nm was demonstrated with good pattern uniformity, excellent repeatability, and a wide processing window. We believe 10 nm half-pitch grating over even larger areas are viable, overcoming one major hurdle to commercialize nanoimprint.
Liu
Xiaoming
X
Nanoopto Corporation, 1600 Cottontail Lane, Somerset, New Jersey 08873, USA. mliu@nanoopto.com
Deng
Xuegong
X
Sciortino
Paul
P
Buonanno
Mike
M
Walters
Frank
F
Varghese
Ron
R
Bacon
Joel
J
Chen
Lei
L
O'Brien
Nada
N
Wang
Jian Jim
JJ