Wafer-scale Ni imprint stamps for porous alumina membranes based on interference lithography.
Lee
Woo
W
Max Planck Institute of Microstructure Physics, Weinberg 2, 06120 Halle, Germany. woolee@mpi-halle.de
Ji
Ran
R
Ross
Caroline A
CA
Gösele
Ulrich
U
Nielsch
Kornelius
K
D000537:Aluminum Oxide / Q000737:chemistry*; D004595:Electroplating; D008567:Membranes, Artificial; D036103:Nanotechnology; D009532:Nickel / Q000737:chemistry*
D008567:Membranes, Artificial; D009532:Nickel; D000537:Aluminum Oxide