title: Nanomachining by colloidal lithography.
abstract: Colloidal lithography is a recently emerging field; the evolution of this simple technique is still in progress. Recent advances in this area have developed a variety of practical routes of colloidal lithography, which have great potential to replace, at least partially, complex and high-cost advanced lithographic techniques. This Review presents the state of the art of colloidal lithography and consists of three main parts, beginning with synthetic routes to monodisperse colloids and their self-assembly with low defect concentrations, which are used as lithographic masks. Then, we will introduce the modification of the colloidal masks using reactive ion etching (RIE), which produces a variety of nanoscopic features and multifaceted particles. Finally, a few prospective applications of colloidal lithography will be discussed.
authors.affiliation: Department of Chemical and Biomolecular Engineering, Korea Advanced Institute of Science and Technology, 373-1 Guseong-dong, Yuseong-gu, Daejeon 305-701, Korea. smyang@kaist.ac.kr
authors.forename: Seung-Man
authors.initials: SM
authors.lastname: Yang
authors.forename: Se Gyu
authors.initials: SG
authors.lastname: Jang
authors.forename: Dae-Geun
authors.initials: DG
authors.lastname: Choi
authors.forename: Sarah
authors.initials: S
authors.lastname: Kim
authors.forename: Hyung Kyun
authors.initials: HK
authors.lastname: Yu
mesh_terms: D003102:Colloids / Q000737:chemistry*; D003460:Crystallization / Q000379:methods*; D046911:Macromolecular Substances / Q000737:chemistry; D008422:Materials Testing; D008968:Molecular Conformation; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D036103:Nanotechnology / Q000379:methods*; D010316:Particle Size; D010781:Photography / Q000379:methods*; D013499:Surface Properties
chemical_list: D003102:Colloids; D046911:Macromolecular Substances