Molecular beam deposition of DNA nanometer films.
The development of novel photonic devices which incorporate biological materials is strongly tied to the development of thin film forming processes. Solution-based ("wet") processes when used with biomaterials in device fabrication suffer from dissolution of underlying layers, incompatibility with clean environment, inconsistent film properties, etc. We have investigated ultra-high-vacuum molecular beam deposition of surfactant-modified deoxyribonucleic acid (DNA). We have obtained effective deposition rates of approximately 0.1-1 A/s, enabling reproducible and controllable deposition of nanometer-scale films.
Hagen
Joshua A
JA
Nanoelectronics Laboratory, University of Cincinnati, Cincinnati, Ohio 45221-0030, USA.
Li
Wei-Xin
WX
Spaeth
Hans
H
Grote
James G
JG
Steckl
Andrew J
AJ
D004247:DNA / Q000737:chemistry*; D049329:Nanostructures; D013501:Surface-Active Agents / Q000737:chemistry
D013501:Surface-Active Agents; D004247:DNA