title: Combinatorial approach for ferroelectric material libraries prepared by liquid source misted chemical deposition method.
abstract: Combinatorial approach for discovering novel functional materials in the huge diversity of chemical composition and processing conditions has become more important for breakthrough in thin film electronic and energy-conversion devices. The efficiency of combinatorial method depends on the preparation of a reliable high-density composition thin-film library. The physico-chemical properties of each sample on the library should be similar to those of the corresponding samples prepared by one-by-one conventional methods. We successfully developed the combinatorial liquid source misted chemical deposition (LSMCD) method and demonstrated its validity in screening the chemical composition of Bi3.75LaxCe0.25-xTi3O12 (BLCT) for high remanent polarization (Pr). LSMCD is a cheap promising combinatorial screening tool. It can control the composition up to ppm level and produce homogeneous multicomponent library. LSMCD method allows us to prepare BLCT thin-film library at the variation of 0.4 mol% of La. Maximum 2Pr is 35 microC/cm-2 at x=0.21. The intensity of (117) XRD peak is quantitatively related to 2Pr. Newly developed scanning piezoelectric deformation measurement for nano-sized samples using scanning probe microscope (SPM) is also found out to be reliable for determining the relative ranking of Pr value rapidly.
authors.affiliation: Department of Chemical and Biomolecular Engineering and Center for Ultramicrochemical Process Systems, Korea Advanced Institute of Science and Technology, 373-1 Guseong-dong, Yuseong-gu, Daejeon 305-701, Republic of Korea.
authors.forename: Ki Woong
authors.initials: KW
authors.lastname: Kim
authors.forename: Min Ku
authors.initials: MK
authors.lastname: Jeon
authors.forename: Kwang Seok
authors.initials: KS
authors.lastname: Oh
authors.forename: Tai Suk
authors.initials: TS
authors.lastname: Kim
authors.forename: Yun Seok
authors.initials: YS
authors.lastname: Kim
authors.forename: Seong Ihl
authors.initials: SI
authors.lastname: Woo