title: Molecular beam deposition of DNA nanometer films.
abstract: The development of novel photonic devices which incorporate biological materials is strongly tied to the development of thin film forming processes. Solution-based ("wet") processes when used with biomaterials in device fabrication suffer from dissolution of underlying layers, incompatibility with clean environment, inconsistent film properties, etc. We have investigated ultra-high-vacuum molecular beam deposition of surfactant-modified deoxyribonucleic acid (DNA). We have obtained effective deposition rates of approximately 0.1-1 A/s, enabling reproducible and controllable deposition of nanometer-scale films.
authors.affiliation: Nanoelectronics Laboratory, University of Cincinnati, Cincinnati, Ohio 45221-0030, USA.
authors.forename: Joshua A
authors.initials: JA
authors.lastname: Hagen
authors.forename: Wei-Xin
authors.initials: WX
authors.lastname: Li
authors.forename: Hans
authors.initials: H
authors.lastname: Spaeth
authors.forename: James G
authors.initials: JG
authors.lastname: Grote
authors.forename: Andrew J
authors.initials: AJ
authors.lastname: Steckl
mesh_terms: D004247:DNA / Q000737:chemistry*; D049329:Nanostructures; D013501:Surface-Active Agents / Q000737:chemistry
chemical_list: D013501:Surface-Active Agents; D004247:DNA