title: Correction of random surface roughness on colloidal probes in measuring adhesion.
abstract: Atomic force microscopes (AFM) are commonly used to measure adhesion at nanoscale between two surfaces. To avoid uncertainties in the contact areas between the tip and the surface, colloidal probes have been used for adhesion measurements. We measured adhesion between glass spheres and silicon (100) surface using colloidal probes of different radii under controlled conditions (relative humidity of < 3%, temperature of 25 +/- 1 degrees C). Results showed that the adhesion forces did not correlate with the radii of the spheres as suggested by elastic contact mechanics theories. Surface roughness and random surface features were found on the surfaces of the colloidal probes. We evaluated various roughness parameters, Rumpf and Rabinovich models, and a load-bearing area correction model in an attempt to correct for the roughness effects on adhesion, but the results were unsatisfactory. We developed a new multiscale contact model taking into account elastic as well as plastic deformation in a successive contacting mode. The new model was able to correct for most of the surface roughness features except for surface ridges with sharp angular features, limited by the spherical asperity assumption made in the model.
authors.affiliation: Materials Science and Engineering Laboratory, National Institute of Standards and Technology, Gaithersburg, MD 20899, USA.
authors.forename: Seungho
authors.initials: S
authors.lastname: Yang
authors.forename: Huan
authors.initials: H
authors.lastname: Zhang
authors.forename: Stephen M
authors.initials: SM
authors.lastname: Hsu