Fabrication of nanostructure and formation of nanocrystal for non-volatile memory.
In this work, we have demonstrated that the nanocrystal created by combining the self-assembled block copolymer thin film with regular semiconductor processing can be applicable to non-volatile memory device with increased charge storage capacity over planar structures. Self-assembled block copolymer thin film for nanostructures with critical dimensions below photolithographic resolution limits has been used during all experiments. Nanoporous thin film from PS-b-PMMA diblock copolymer thin film with selective removal of PMMA domains was used to fabricate nanostructure and nanocrystal. We have also reported about surface morphologies and electrical properties of the nano-needle structure formed by RIE technique. The details of nanoscale pattern of the very uniform arrays using RIE are presented. We fabricated different surface structure of nanoscale using block copolymer. We also deposited Si-rich SiNx layer using ICP-CVD on the silicon surface of nanostructure. The deposited films were studied after annealing. PL studies demonstrated nanocrystal in Si-rich SiNx film on nanostructure of silicon.
Jung
Sungwook
S
School of Information and Communication Engineering, Sungkyunkwan University, Suwon, 440-746, Korea.
Parm
I O
IO
Jang
Kyung Soo
KS
Park
Dae-Ho
DH
Sohn
Byeong-Hyeok
BH
Jung
Jin Chul
JC
Zin
Wang Cheol
WC
Choi
Suk-Ho
SH
Dhungel
S K
SK
Yi
J
J
D020099:Coated Materials, Biocompatible / Q000737:chemistry; D003460:Crystallization; D008027:Light; D008422:Materials Testing; D008567:Membranes, Artificial; D008855:Microscopy, Electron, Scanning; D053758:Nanoparticles / Q000737:chemistry*; D049329:Nanostructures / Q000737:chemistry; D036103:Nanotechnology / Q000295:instrumentation* / Q000379:methods*; D010100:Oxygen / Q000737:chemistry; D011108:Polymers / Q000737:chemistry; D019904:Polymethyl Methacrylate / Q000737:chemistry; D012825:Silicon / Q000737:chemistry; D013696:Temperature; D014466:Ultraviolet Rays
D020099:Coated Materials, Biocompatible; D008567:Membranes, Artificial; D011108:Polymers; D019904:Polymethyl Methacrylate; D010100:Oxygen; D012825:Silicon