Atmospheric chemistry of CF3CH=CH2 and C4F9CH=CH2: products of the gas-phase reactions with Cl atoms and OH radicals.
FTIR-smog chamber techniques were used to study the products of the Cl atom and OH radical initiated oxidation of CF3CH=CH2 in 700 Torr of N2/O2, diluent at 296 K. The Cl atom initiated oxidation of CF3CH=CH2 in 700 Torr of air in the absence of NOx gives CF3C(O)CH2Cl and CF3CHO in yields of 70+/-5% and 6.2+/-0.5%, respectively. Reaction with Cl atoms proceeds via addition to the >C=C< double bond (74+/-4% to the terminal and 26+/-4% to the central carbon atom) and leads to the formation of CF3CH(O)CH2Cl and CF3CHClCH2O radicals. Reaction with O2 and decomposition via C-C bond scission are competing loss mechanisms for CF3CH(O)CH2Cl radicals, kO2/kdiss=(3.8+/-1.8)x10(-18) cm3 molecule-1. The atmospheric fate of CF3CHClCH2O radicals is reaction with O2 to give CF3CHClCHO. The OH radical initiated oxidation of CxF2x+1CH=CH2 (x=1 and 4) in 700 Torr of air in the presence of NOx gives CxF2x+1CHO in a yield of 88+/-9%. Reaction with OH radicals proceeds via addition to the >C=C< double bond leading to the formation of CxF2x+1C(O)HCH2OH and CxF2x+1CHOHCH2O radicals. Decomposition via C-C bond scission is the sole fate of CxF2x+1CH(O)CH2OH and CxF2x+1CH(OH)CH2O radicals. As part of this work a rate constant of k(Cl+CF3C(O)CH2Cl)=(5.63+/-0.66)x10(-14) cm3 molecule-1 s-1 was determined. The results are discussed with respect to previous literature data and the possibility that the atmospheric oxidation of CxF2x+1CH=CH2 contributes to the observed burden of perfluorocarboxylic acids, CxF2x+1COOH, in remote locations.
Nakayama
T
T
Solar-Terrestrial Environment Laboratory and Graduate School of Science, Nagoya University, Honohara 3-13, Toyokawa, Aichi, 442-8507 Japan.
Takahashi
K
K
Matsumi
Y
Y
Toft
A
A
Andersen
M P Sulbaek
MP
Nielsen
O J
OJ
Waterland
R L
RL
Buck
R C
RC
Hurley
M D
MD
Wallington
T J
TJ
D001272:Atmosphere / Q000737:chemistry*; D002713:Chlorine / Q000737:chemistry*; D005466:Fluorocarbons / Q000737:chemistry*; D005740:Gases / Q000737:chemistry; D006845:Hydrocarbons, Fluorinated / Q000737:chemistry*; D017665:Hydroxyl Radical / Q000737:chemistry*; D009584:Nitrogen / Q000737:chemistry; D010084:Oxidation-Reduction; D010100:Oxygen / Q000737:chemistry; D011312:Pressure; D013696:Temperature
D005466:Fluorocarbons; D005740:Gases; D006845:Hydrocarbons, Fluorinated; C068177:3,3,4,4,5,5,6,6,6-nonafluoro-1-hexene; D017665:Hydroxyl Radical; D002713:Chlorine; C519087:3,3,3-trifluoro-1-propene; D009584:Nitrogen; D010100:Oxygen