High-aspect-ratio nanogap electrodes for averaging molecular conductance measurements.
Luber
Sebastian M
SM
Walter Schottky Institut, Technische Universität München, Am Coulombwall, Garching, Germany.
Zhang
Fan
F
Lingitz
Simone
S
Hansen
Allan G
AG
Scheliga
Felix
F
Thorn-Csányi
Emma
E
Bichler
Max
M
Tornow
Marc
M
D000535:Aluminum / Q000737:chemistry*; D001152:Arsenicals / Q000737:chemistry*; D003460:Crystallization / Q000379:methods*; D004553:Electric Conductivity; D004563:Electrochemistry / Q000295:instrumentation*; D004867:Equipment Design; D019544:Equipment Failure Analysis; D005708:Gallium / Q000737:chemistry*; D046911:Macromolecular Substances / Q000737:chemistry; D008422:Materials Testing; D008839:Microelectrodes; D008968:Molecular Conformation; D049329:Nanostructures / Q000737:chemistry / Q000648:ultrastructure; D036103:Nanotechnology / Q000295:instrumentation*; D010316:Particle Size; D013499:Surface Properties; D014025:Titanium / Q000737:chemistry*
D001152:Arsenicals; D046911:Macromolecular Substances; C009495:titanium dioxide; C043055:gallium arsenide; D005708:Gallium; D000535:Aluminum; D014025:Titanium