title: Effects of modulus and surface chemistry of thiol-ene photopolymers in nanoimprinting.
abstract: Thiol-ene photopolymers were studied as patternable resins for nanocontact molding imprint lithography. Photopolymerizable thiol and ene monomer mixtures were used, and after molding, patterned thiol-ene polymer features the size and shape of the original molds were replicated. Adhesion and release were examined and controlled by manipulating the surface chemistry of the substrate and mold. A direct correlation between cured thiol-ene polymer modulus and pattern fidelity was observed.
authors.affiliation: IBM Almaden Research Center, 650 Harry Road, San Jose, California 95120-6099, USA.
authors.forename: Erik C
authors.initials: EC
authors.lastname: Hagberg
authors.forename: Michael
authors.initials: M
authors.lastname: Malkoch
authors.forename: Yibo
authors.initials: Y
authors.lastname: Ling
authors.forename: Craig J
authors.initials: CJ
authors.lastname: Hawker
authors.forename: Kenneth R
authors.initials: KR
authors.lastname: Carter