Soft lithography using acryloxy perfluoropolyether composite stamps.
This paper describes composite patterning elements that use a commercially available acryloxy perfluoropolyether (a-PFPE) in various soft lithographic techniques, including microcontact printing, nanotransfer printing, phase-shift optical lithography, proximity field nanopatterning, molecular scale soft nanoimprinting, and solvent assisted micromolding. The a-PFPE material, which is similar to a methacryloxy PFPE (PFPE-DMA) reported recently, offers a combination of high modulus (10.5 MPa), low surface energy (18.5 mNm(-1)), chemical inertness, and resistance to solvent induced swelling that make it useful for producing high fidelity patterns with these soft lithographic methods. The results are comparable to, and in some cases even better than, those obtained with the more widely explored material, high modulus poly(dimethylsiloxane) (h-PDMS).
Truong
Tu T
TT
Department of Chemistry, Beckman Institute and Frederick Seitz Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, IL 61801, USA.
Lin
Rongsheng
R
Jeon
Seokwoo
S
Lee
Hee Hyun
HH
Maria
Joana
J
Gaur
Anshu
A
Hua
Feng
F
Meinel
Ines
I
Rogers
John A
JA