title: High-aspect-ratio nanogap electrodes for averaging molecular conductance measurements.
authors.affiliation: Walter Schottky Institut, Technische Universität München, Am Coulombwall, Garching, Germany.
authors.forename: Sebastian M
authors.initials: SM
authors.lastname: Luber
authors.forename: Fan
authors.initials: F
authors.lastname: Zhang
authors.forename: Simone
authors.initials: S
authors.lastname: Lingitz
authors.forename: Allan G
authors.initials: AG
authors.lastname: Hansen
authors.forename: Felix
authors.initials: F
authors.lastname: Scheliga
authors.forename: Emma
authors.initials: E
authors.lastname: Thorn-Csányi
authors.forename: Max
authors.initials: M
authors.lastname: Bichler
authors.forename: Marc
authors.initials: M
authors.lastname: Tornow
mesh_terms: D000535:Aluminum / Q000737:chemistry*; D001152:Arsenicals / Q000737:chemistry*; D003460:Crystallization / Q000379:methods*; D004553:Electric Conductivity; D004563:Electrochemistry / Q000295:instrumentation*; D004867:Equipment Design; D019544:Equipment Failure Analysis; D005708:Gallium / Q000737:chemistry*; D046911:Macromolecular Substances / Q000737:chemistry; D008422:Materials Testing; D008839:Microelectrodes; D008968:Molecular Conformation; D049329:Nanostructures / Q000737:chemistry / Q000648:ultrastructure; D036103:Nanotechnology / Q000295:instrumentation*; D010316:Particle Size; D013499:Surface Properties; D014025:Titanium / Q000737:chemistry*
chemical_list: D001152:Arsenicals; D046911:Macromolecular Substances; C009495:titanium dioxide; C043055:gallium arsenide; D005708:Gallium; D000535:Aluminum; D014025:Titanium