Effects of modulus and surface chemistry of thiol-ene photopolymers in nanoimprinting.
Thiol-ene photopolymers were studied as patternable resins for nanocontact molding imprint lithography. Photopolymerizable thiol and ene monomer mixtures were used, and after molding, patterned thiol-ene polymer features the size and shape of the original molds were replicated. Adhesion and release were examined and controlled by manipulating the surface chemistry of the substrate and mold. A direct correlation between cured thiol-ene polymer modulus and pattern fidelity was observed.
Hagberg
Erik C
EC
IBM Almaden Research Center, 650 Harry Road, San Jose, California 95120-6099, USA.
Malkoch
Michael
M
Ling
Yibo
Y
Hawker
Craig J
CJ
Carter
Kenneth R
KR