title: High-throughput dip-pen-nanolithography-based fabrication of Si nanostructures.
authors.affiliation: NanoInk Inc. 8025 Lamon Avenue, Skokie, IL 60077, USA. hzhang@ntu.edu.sg
authors.forename: Hua
authors.initials: H
authors.lastname: Zhang
authors.forename: Nabil A
authors.initials: NA
authors.lastname: Amro
authors.forename: Sandeep
authors.initials: S
authors.lastname: Disawal
authors.forename: Robert
authors.initials: R
authors.lastname: Elghanian
authors.forename: Roger
authors.initials: R
authors.lastname: Shile
authors.forename: Joseph
authors.initials: J
authors.lastname: Fragala
mesh_terms: D003460:Crystallization / Q000379:methods*; D007281:Ink; D046911:Macromolecular Substances / Q000737:chemistry; D008422:Materials Testing; D018625:Microscopy, Atomic Force / Q000379:methods*; D008968:Molecular Conformation; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D036103:Nanotechnology / Q000379:methods*; D010316:Particle Size; D012825:Silicon / Q000737:chemistry*; D013499:Surface Properties
chemical_list: D046911:Macromolecular Substances; D012825:Silicon