title: Sub-5-nm gaps prepared by on-wire lithography: correlating gap size with electrical transport.
authors.affiliation: Department of Chemistry and International Institute for Nanotechnology, Northwestern University, Evanston, IL 60208-3113, USA.
authors.forename: Lidong
authors.initials: L
authors.lastname: Qin
authors.forename: Jae-Won
authors.initials: JW
authors.lastname: Jang
authors.forename: Ling
authors.initials: L
authors.lastname: Huang
authors.forename: Chad A
authors.initials: CA
authors.lastname: Mirkin
mesh_terms: D003460:Crystallization / Q000379:methods*; D004559:Electric Wiring; D004563:Electrochemistry / Q000295:instrumentation / Q000379:methods*; D004579:Electron Transport; D046911:Macromolecular Substances / Q000737:chemistry; D008422:Materials Testing; D008670:Metals / Q000737:chemistry*; D008839:Microelectrodes; D008968:Molecular Conformation; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D036103:Nanotechnology / Q000295:instrumentation / Q000379:methods*; D010316:Particle Size; D010781:Photography / Q000379:methods; D013499:Surface Properties
chemical_list: D046911:Macromolecular Substances; D008670:Metals