title: Electrostatic funneling for precise nanoparticle placement: a route to wafer-scale integration.
abstract: We demonstrate a large-scale placement of nanoparticles through a scheme named "electrostatic funneling", in which charged nanoparticles are guided by an electrostatic potential energy gradient and placed on targeted locations with nanoscale precision. The guiding electrostatic structures are defined using current CMOS fabrication technology. The effectiveness of this scheme is demonstrated for a variety of geometries including one-dimensional and zero-dimensional patterns as well as three-dimensional step structures. Placement precision of 6 nm has been demonstrated using a one-dimensional guiding structure comprising alternatively charged lines with line width of approximately 100 nm. Detailed calculations using DLVO theory agree well with the observed long-range interactions and also estimate lateral forces as strong as (1-3) x 10(-7) dyn, which well explains the observed guided placement of Au nanoparticles.
authors.affiliation: Department of Materials Science and Engineering, The University of Texas at Arlington, Arlington, Texas 76019, USA.
authors.forename: Liang-Chieh
authors.initials: LC
authors.lastname: Ma
authors.forename: Ramkumar
authors.initials: R
authors.lastname: Subramanian
authors.forename: Hong-Wen
authors.initials: HW
authors.lastname: Huang
authors.forename: Vishva
authors.initials: V
authors.lastname: Ray
authors.forename: Choong-Un
authors.initials: CU
authors.lastname: Kim
authors.forename: Seong Jin
authors.initials: SJ
authors.lastname: Koh