title: Bond-detach lithography: a method for micro/nanolithography by precision PDMS patterning.
abstract: We have discovered a micro/nanopatterning technique based on the patterning of a PDMS membrane/film, which involves bonding a PDMS structure/stamp (that has the desired patterns) to a PDMS film. The technique, which we call "bond-detach lithography", was demonstrated (in conjunction with other microfabrication techniques) by transferring several micro- and nanoscale patterns onto a variety of substrates. Bond-detach lithography is a parallel process technique in which a master mold can be used many times, and is particularly simple and inexpensive.
authors.affiliation: Mechanical Engineering Department, Northwestern University, Evanston, IL, USA.
authors.forename: Abel L
authors.initials: AL
authors.lastname: Thangawng
authors.forename: Melody A
authors.initials: MA
authors.lastname: Swartz
authors.forename: Matthew R
authors.initials: MR
authors.lastname: Glucksberg
authors.forename: Rodney S
authors.initials: RS
authors.lastname: Ruoff
mesh_terms: D055598:Chemical Phenomena; D002621:Chemistry; D003460:Crystallization / Q000379:methods*; D004129:Dimethylpolysiloxanes / Q000737:chemistry*; D005740:Gases; D006358:Hot Temperature; D046911:Macromolecular Substances / Q000737:chemistry; D008422:Materials Testing; D008832:Microchemistry / Q000379:methods*; D008968:Molecular Conformation; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D036103:Nanotechnology / Q000379:methods*; D009757:Nylons / Q000737:chemistry*; D010316:Particle Size; D013499:Surface Properties
chemical_list: D004129:Dimethylpolysiloxanes; D005740:Gases; D046911:Macromolecular Substances; D009757:Nylons; C085707:poly(dimethylsiloxane)-polyamide copolymer