Laser-interference lithography tailored for highly symmetrically arranged ZnO nanowire arrays.
Kim
Dong Sik
DS
Max Planck Institute of Microstructure Physics, Weinberg 2, 06120 Halle, Germany. dskim@mpi-halle.de
Ji
Ran
R
Fan
Hong Jin
HJ
Bertram
Frank
F
Scholz
Roland
R
Dadgar
Armin
A
Nielsch
Kornelius
K
Krost
Alois
A
Christen
Jürgen
J
Gösele
Ulrich
U
Zacharias
Margit
M
D003460:Crystallization / Q000379:methods*; D007834:Lasers; D046911:Macromolecular Substances / Q000737:chemistry; D008422:Materials Testing; D008968:Molecular Conformation; D036103:Nanotechnology / Q000379:methods*; D043942:Nanotubes / Q000737:chemistry* / Q000648:ultrastructure*; D010316:Particle Size; D012666:Semiconductors; D013499:Surface Properties; D015034:Zinc Oxide / Q000737:chemistry*
D046911:Macromolecular Substances; D015034:Zinc Oxide