title: Dewetting of thin polystyrene films under confinement.
abstract: The dewetting behavior of thin polystyrene (PS) film has been investigated by placing an upper plate with a ca. 140 nm gap from the underlying substrate with the spin-coated thin polymer films. Three different kinds of dewetting behaviors of thin PS film have been observed after annealing according to the relative position of the PS film to the upper plate. Since the upper plate is smaller than the underlying substrate, a part of the polymer film is not covered by the plate. In this region (I), thin PS film dewetting occurs in a conventional manner, as previously reported. While in the region covered by the upper plate (III), the PS film exhibits unusual dewetted patterns. Meanwhile, in the area right under the edge of the plate (II) (i.e., the area between region I and region III), highly ordered arrays of PS droplets are formed. Formation mechanisms of different dewetted patterns are discussed in detail. This study may offer an effective way to improve the understanding of various dewetting behaviors and facilitate the ongoing exploration of utilizing dewetting as a patterning technique.
authors.affiliation: State Key Laboratory of Polymer Physics and Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Graduate School of Chinese Academy of Sciences, Changchun 130022, P. R. China.
authors.forename: Juan
authors.initials: J
authors.lastname: Peng
authors.forename: Rubo
authors.initials: R
authors.lastname: Xing
authors.forename: Yang
authors.initials: Y
authors.lastname: Wu
authors.forename: Binyao
authors.initials: B
authors.lastname: Li
authors.forename: Yanchun
authors.initials: Y
authors.lastname: Han
authors.forename: Wolfgang
authors.initials: W
authors.lastname: Knoll
authors.forename: Dong Ha
authors.initials: DH
authors.lastname: Kim