title: Programmable nanolithography with plasmon nanoparticle arrays.
abstract: We describe how optical contact lithography based on plasmon particle array masks allows generation of a large number of different subwavelength exposure patterns using a single mask. Within an exact point dipole model, we study the local response of silver particles in small two-dimensional arrays with 50-200 nm spacing. We show how illumination with unfocused light allows optically addressing particles either individually or in controlled configurations; which pattern will be exposed by the mask is programmed by varying the wavelength, incidence angle, and polarization of the incident wave.
authors.affiliation: FOM Institute AMOLF, Center for Nanophotonics, Kruislaan 407, NL-1098SJ Amsterdam, The Netherlands. f.koenderink@amolf.nl
authors.forename: A Femius
authors.initials: AF
authors.lastname: Koenderink
authors.forename: Jesus V
authors.initials: JV
authors.lastname: Hernández
authors.forename: Francis
authors.initials: F
authors.lastname: Robicheaux
authors.forename: L D
authors.initials: LD
authors.lastname: Noordam
authors.forename: Albert
authors.initials: A
authors.lastname: Polman