Fabrication of thermosensitive polymer nanopatterns through chemical lithography and atom transfer radical polymerization.
Micro- and nanopatterns of thermosensitive poly(N-isopropylacrylamide) brush on gold substrate were prepared by using chemical lithography combined with surface-initiated atom transfer radical polymerization. Self-assembled monolayers of 4'-nitro-1, 1'-biphenyl-4-thiol were structured by chemical lithography which produced cross-linked 4'-amino-1,1'-biphenyl-4-thiol monolayer within a nitro-terminated matrix. The terminal amino groups in monolayers were bounded with the surface initiator bromoisobutyryl bromide. After polymerization, the smallest size can reach to 70-nm line width and dots. The thermosensitivity of poly(N-isopropylacrylamide) brushes is demonstrated by contact angle measurement and fluid atomic force microscopy. This fabrication approach allows creating spatially defined polymer patterns and provides a simple and versatile method to construct complex micro- and nanopatterned polymer brushes with spatial and topographic control in a single step.
He
Qiang
Q
Beijing National Laboratory for Molecular Sciences (BNLMS), CAS Key Lab of Colloid and Interface Science, Institute of Chemistry, Chinese Academy of Sciences, Beijing 100080, China.
Küller
Alexander
A
Grunze
Michael
M
Li
Junbai
J
D000180:Acrylic Resins / Q000737:chemistry*; D020099:Coated Materials, Biocompatible / Q000737:chemistry*; D006046:Gold / Q000737:chemistry*; D018625:Microscopy, Atomic Force; D013438:Sulfhydryl Compounds / Q000737:chemistry; D013499:Surface Properties
D000180:Acrylic Resins; D020099:Coated Materials, Biocompatible; D013438:Sulfhydryl Compounds; C052970:poly-N-isopropylacrylamide; D006046:Gold