Programmable nanolithography with plasmon nanoparticle arrays.
We describe how optical contact lithography based on plasmon particle array masks allows generation of a large number of different subwavelength exposure patterns using a single mask. Within an exact point dipole model, we study the local response of silver particles in small two-dimensional arrays with 50-200 nm spacing. We show how illumination with unfocused light allows optically addressing particles either individually or in controlled configurations; which pattern will be exposed by the mask is programmed by varying the wavelength, incidence angle, and polarization of the incident wave.
Koenderink
A Femius
AF
FOM Institute AMOLF, Center for Nanophotonics, Kruislaan 407, NL-1098SJ Amsterdam, The Netherlands. f.koenderink@amolf.nl
Hernández
Jesus V
JV
Robicheaux
Francis
F
Noordam
L D
LD
Polman
Albert
A