title: Sculpting semiconductor heteroepitaxial islands: from dots to rods.
abstract: In the Ge on Si model heteroepitaxial system, metal patterns on the silicon surface provide unprecedented control over the morphology of highly ordered Ge islands. Island shape including nanorods and truncated pyramids is set by the metal species and substrate orientation. Analysis of island faceting elucidates the prominent role of the metal in promoting growth of preferred facet orientations while investigations of island composition and structure reveal the importance of Si-Ge intermixing in island evolution. These effects reflect a remarkable combination of metal-mediated growth phenomena that may be exploited to tailor the functionality of island arrays in heteroepitaxial systems.
authors.affiliation: Department of Materials Science and Engineering, University of California, Berkeley, California 94720, USA.
authors.forename: J T
authors.initials: JT
authors.lastname: Robinson
authors.forename: D A
authors.initials: DA
authors.lastname: Walko
authors.forename: D A
authors.initials: DA
authors.lastname: Arms
authors.forename: D S
authors.initials: DS
authors.lastname: Tinberg
authors.forename: P G
authors.initials: PG
authors.lastname: Evans
authors.forename: Y
authors.initials: Y
authors.lastname: Cao
authors.forename: J A
authors.initials: JA
authors.lastname: Liddle
authors.forename: A
authors.initials: A
authors.lastname: Rastelli
authors.forename: O G
authors.initials: OG
authors.lastname: Schmidt
authors.forename: O D
authors.initials: OD
authors.lastname: Dubon