Smallest lithographic marks generated by optical focusing systems.
We show that the combination of Bessel beams and photosensitive materials exhibiting polarization filtering properties allows one to reach the smallest mark that can be lithographically generated by focusing systems. This property is of interest in current optical data storage techniques.
Grosjean
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Département d'Optique P.M. Duffieux, Institut FEMTO-ST, UMR CNRS 6174, Université de Franche-Comté, Besançon Cedex, France. thierry.grosjean@uni-fcomte.fr
Courjon
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Bainier
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