Multistep synthesis on SU-8: combining microfabrication and solid-phase chemistry on a single material.
SU-8 is an epoxy-novolac resin and a well-established negative photoresist for microfabrication and microengineering. The photopolymerized resist is an extremely highly crosslinked polymer showing outstanding chemical and physical robustness with residual surface epoxy groups amenable for chemical functionalization. In this paper we describe, for the first time, the preparation and surface modification of SU-8 particles shaped as microbars, the attachment of appropriate linkers, and the successful application of these particles to multistep solid-phase synthesis leading to oligonucleotides and peptides attached in an unambiguous manner to the support surface.
Cavalli
Gabriel
G
School of Chemistry, Highfield Campus, University of Southampton, Southampton SO17 1BJ, UK.
Banu
Shahanara
S
Ranasinghe
Rohan T
RT
Broder
Graham R
GR
Martins
Hugo F P
HF
Neylon
Cameron
C
Morgan
Hywel
H
Bradley
Mark
M
Roach
Peter L
PL
D002851:Chromatography, High Pressure Liquid / Q000379:methods; D020650:Combinatorial Chemistry Techniques / Q000379:methods*; D004852:Epoxy Compounds / Q000138:chemical synthesis* / Q000737:chemistry; D004853:Epoxy Resins / Q000138:chemical synthesis* / Q000737:chemistry; D013058:Mass Spectrometry / Q000379:methods; D008855:Microscopy, Electron, Scanning / Q000379:methods; D015394:Molecular Structure; D009841:Oligonucleotides / Q000032:analysis / Q000138:chemical synthesis / Q000737:chemistry; D010316:Particle Size; D011108:Polymers / Q000138:chemical synthesis* / Q000737:chemistry; D012680:Sensitivity and Specificity; D013237:Stereoisomerism; D013997:Time Factors
D004852:Epoxy Compounds; D004853:Epoxy Resins; D009841:Oligonucleotides; D011108:Polymers; C520895:SU-8 compound