title: Effects of the nonionic surfactant tween 80 on microbial reductive dechlorination of chlorinated ethenes.
abstract: Recent field studies have indicated synergistic effects of coupling microbial reductive dechlorination with physicochemical remediation (e.g., surfactant flushing) of dense nonaqueous phase liquid (DNAPL) source zones. This study explored chlorinated ethene (e.g., tetrachloroethene [PCE]) dechlorination in the presence of 50-5000 mg/L Tween 80, a nonionic surfactant employed in source zone remediation. Tween 80 did not inhibit dechlorination by four pure PCE-to-cis-1,2-dichloroethene (cis-DCE) or PCE-to-trichloroethene (TCE) dechlorinating cultures. In contrast, cis-DCE-dechlorinating Dehalococcoides isolates (strain BAV1 and strain FL2) failed to dechlorinate in the presence of Tween 80. Bio-Dechlor INOCULUM (BDI), a PCE-to-ethene dechlorinating consortium, produced cis-DCE in the presence of Tween 80, further suggesting that Tween 80 inhibits dechlorination by Dehalococcoides organisms. Quantitative real-time PCR analysis applied to BDI revealed that the number of Dehalococcoides cells decayed exponentially (R(2) = 0.85) according to the Chick-Watson disinfection model (pseudo first-order decay rate of 0.13+/-0.02 day(-1)) from an initial value of 6.6 +/-1.5 x 10(8) to 1.3+/-0.8 x 10(5) per mL of culture after 58 days of exposure to 250 mg/L Tween 80. Although Tween 80 exposure prevented ethene formation and reduced Dehalococcoides cell numbers, Dehalococcoides organisms remained viable, and dechlorination activity pist cis-DCE was recovered following the removal of Tween 80. These findings suggest that sequential Tween 80 flushing followed by microbial reductive dechlorination is a promising strategy for remediation of chlorinated ethene-impacted source zones.
authors.affiliation: School of Civil and Environmental Engineering, School of Material Science and Engineering, and School of Biology, Georgia Institute of Technology, 311 Ferst Drive, Atlanta, Georgia 30332-0512, USA.
authors.forename: Benjamin K
authors.initials: BK
authors.lastname: Amos
authors.forename: Rebecca C
authors.initials: RC
authors.lastname: Daprato
authors.forename: Joseph B
authors.initials: JB
authors.lastname: Hughes
authors.forename: Kurt D
authors.initials: KD
authors.lastname: Pennell
authors.forename: Frank E
authors.initials: FE
authors.lastname: Löffler
mesh_terms: D002713:Chlorine / Q000737:chemistry*; D005030:Ethylenes / Q000737:chemistry*; D010084:Oxidation-Reduction; D011136:Polysorbates / Q000737:chemistry*; D013501:Surface-Active Agents / Q000737:chemistry*
chemical_list: D005030:Ethylenes; D011136:Polysorbates; D013501:Surface-Active Agents; D002713:Chlorine; C036216:ethylene