title: Polybenzoxazine as a mold-release agent for nanoimprint lithography.
abstract: One of the most important tasks remaining to be resolved in nanoimprint lithography is the elimination of the resist sticking to the mold during demolding. Previously, the main approach was to apply a thin layer of fluorinated alkyl silane mold-release agent on the surface on the mold; however, this involves complicated steps and high costs. The low surface free energy material polybenzoxazine provides an efficient mold-release agent for silicon molds that is easier to process, costs less, and has no side reactions.
authors: Department of Materials Science and Engineering, I-Shou University, 84008 Kaohsiung, Taiwan.
authors: Chih-Feng
authors: CF
authors: Wang
authors: Shih-Feng
authors: SF
authors: Chiou
authors: Fu-Hsiang
authors: FH
authors: Ko
authors: Jem-Kun
authors: JK
authors: Chen
authors: Cheng-Tung
authors: CT
authors: Chou
authors: Chih-Feng
authors: CF
authors: Huang
authors: Shiao-Wei
authors: SW
authors: Kuo
authors: Feng-Chih
authors: FC
authors: Chang