Polybenzoxazine as a mold-release agent for nanoimprint lithography.
One of the most important tasks remaining to be resolved in nanoimprint lithography is the elimination of the resist sticking to the mold during demolding. Previously, the main approach was to apply a thin layer of fluorinated alkyl silane mold-release agent on the surface on the mold; however, this involves complicated steps and high costs. The low surface free energy material polybenzoxazine provides an efficient mold-release agent for silicon molds that is easier to process, costs less, and has no side reactions.
Wang
Chih-Feng
CF
Department of Materials Science and Engineering, I-Shou University, 84008 Kaohsiung, Taiwan.
Chiou
Shih-Feng
SF
Ko
Fu-Hsiang
FH
Chen
Jem-Kun
JK
Chou
Cheng-Tung
CT
Huang
Chih-Feng
CF
Kuo
Shiao-Wei
SW
Chang
Feng-Chih
FC