Production of nanopatterns by a combination of electron beam lithography and a self-assembled monolayer for an antibody nanoarray.
We report on a flexible method of producing antibody (IgG) nanopatterns by combining electron beam (EB) lithography and a perfluorodecyltriethoxysilane (FDTES) self-assembled monolayer (SAM). Using EB lithography of the FDTES SAM, we easily fabricated IgG patterns with feature sizes on the order of 100 nm. The patterned IgG retained its ability to interact specifically with an anti-LgG. The influence of different concentrations of the IgG and anti-IgG on the resulting fluorescent IgG arrays was investigated. These IgG nanopatterns appeared to be remarkably well controlled and showed almost no detectable nonspecific binding of proteins on a hydrophobic SAM under a suitable incubation condition, characterized by atomic force microscopy, and epi-fluorescence microscopy. The technique enables the realization of high-throughput protein nanoscale arrays with high specificity.
Zhang
Guo-Jun
GJ
Institute of Biomedical Engineering and Nanotechnology Research Center, Waseda University, Waseda Tsurumaki-cho 513, Shinjuku-ku, Tokyo 162-0041, Japan.
Tanii
Takashi
T
Kanari
Yuzo
Y
Ohdomari
Iwao
I
D000906:Antibodies / Q000737:chemistry*; D004583:Electrons; D019084:Fluorescent Antibody Technique, Indirect; D007074:Immunoglobulin G / Q000737:chemistry; D018625:Microscopy, Atomic Force; D008856:Microscopy, Fluorescence; D049329:Nanostructures / Q000737:chemistry*; D017646:Organosilicon Compounds / Q000737:chemistry; D040081:Protein Array Analysis; D013499:Surface Properties
D000906:Antibodies; D007074:Immunoglobulin G; D017646:Organosilicon Compounds; C102207:n-octadecyltrimethoxysilane