Grid pattern of nanothick microgel network.
A novel grid pattern of two kinds of nanothick microgels was developed by alternate patterning using photolithography. At first, 100-microm-wide nanothick PAAm microgel stripes were grafted on a polystyrene surface by UV irradiation of the photoreactive azidobenzoyl-derivatized polyallylamine-coated surface through a photomask with 100-microm-wide stripes. Then, a second set of 100-microm-wide nanothick PAAc microgel stripes were grafted across the PAAm-grated polystyrene surface by UV irradiation of the photoreactive azidophenyl-derivatized poly(acrylic acid)-coated surface through a photomask placed perpendicularly to the first set of PAAm microgel stripes. The PAAc microgel stripe pattern was formed over the PAAm microgel stripe pattern. The cross angle of the two microgel stripes could be controlled by adjusting the position of the photomask when the second microgel pattern was prepared. Swelling and shrinking of the microgels were investigated by scanning probe microscopy (SPM) in an aqueous solution. SPM observation indicated that the thickness of the gel network was 100 to 500 nm. The regions containing PAAm, PAAc, and the PAAc-PAAm overlapping microgels showed different swelling and shrinking properties when the pH was changed. The PAAm microgel swelled at low pH and shrank at high pH whereas the PAAc microgel swelled at high pH and shrank at low pH. However, the PAAc-PAAm overlapping microgel did not change as significantly as did the two microgels, indicating that the swelling and shrinking of the two gels was partially offset. The pH-induced structural change was repeatedly reversible. The novel grid pattern of nanothick microgels will find applications in various fields such as smart actuators, artificial muscles, sensors, and drug delivery systems as well as in tissue engineering and so forth.
Chen
Guoping
G
Biomaterials Center, National Institute for Materials Science, 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan. guoping.chen@nims.go.jp
Kawazoe
Naoki
N
Fan
Yujiang
Y
Ito
Yoshihiro
Y
Tateishi
Tetsuya
T