Sectioning of multilayers to make a multilayer Laue lens.
We report a process to fabricate multilayer Laue lenses (MLL's) by sectioning and thinning multilayer films. This method can produce a linear zone plate structure with a very large ratio of zone depth to width (e.g., >1000), orders of magnitude larger than can be attained with photolithography. Consequently, MLL's are advantageous for efficient nanofocusing of hard x rays. MLL structures prepared by the technique reported here have been tested at an x-ray energy of 19.5 keV, and a diffraction-limited performance was observed. The present article reports the fabrication techniques that were used to make the MLL's.
Kang
Hyon Chol
HC
Center for Nanoscale Materials and Materials Science Division, Argonne National Laboratory, Argonne, IL 60439, USA. kanghc@gist.ac.kr
Stephenson
G Brian
GB
Liu
Chian
C
Conley
Ray
R
Khachatryan
Ruben
R
Wieczorek
Michael
M
Macrander
Albert T
AT
Yan
Hanfei
H
Maser
Jörg
J
Hiller
Jon
J
Koritala
Rachel
R