title: Localized etching of an insulator film coated on a copper wire using an atmospheric-pressure microplasma jet.
abstract: Atmospheric-pressure microplasma jets (APmicroPJs) of Ar and ArO(2) gases were generated from the tip of a stainless steel surgical needle having outer and inner diameters of 0.4 and 0.2 mm, respectively, with a rf excitation of 13.56 MHz. The steel needle functions both as a powered electrode and a gas nozzle. The operating power is 1.2-6 W and the corresponding peak-to-peak voltage Vp.p. is about 1.5 kV. The APmicroPJ was applied to the localized etching of a polyamide-imide insulator film (thickness of 10 microm) of a copper winding wire of 90 microm diameter. The insulator film around the copper wire was completely removed by the irradiated plasma from a certain direction without fusing the wire. The removal time under the Ar APmicroPJ irradiation was only 3 s at a rf power of 4 W. Fluorescence microscopy and scanning electron microscope images reveal that good selectivity of the insulator film to the copper wire was achieved. In the case of ArO(2) APmicroPJ irradiation with an O(2) concentration of 10% or more, the removed copper surface was converted to copper monoxide CuO.
authors.affiliation: Tsuruoka National College of Technology, Inooka-Sawada 104, Tsuruoka, Yamagata, Japan. yoshiki@tsuruoka-nct.ac.jp
authors.forename: Hiroyuki
authors.initials: H
authors.lastname: Yoshiki
mesh_terms: D001128:Argon / Q000737:chemistry*; D003300:Copper / Q000737:chemistry*; D008855:Microscopy, Electron, Scanning; D008856:Microscopy, Fluorescence; D010100:Oxygen / Q000737:chemistry*; D011312:Pressure; D013499:Surface Properties
chemical_list: D001128:Argon; D003300:Copper; D010100:Oxygen