title: Sectioning of multilayers to make a multilayer Laue lens.
abstract: We report a process to fabricate multilayer Laue lenses (MLL's) by sectioning and thinning multilayer films. This method can produce a linear zone plate structure with a very large ratio of zone depth to width (e.g., >1000), orders of magnitude larger than can be attained with photolithography. Consequently, MLL's are advantageous for efficient nanofocusing of hard x rays. MLL structures prepared by the technique reported here have been tested at an x-ray energy of 19.5 keV, and a diffraction-limited performance was observed. The present article reports the fabrication techniques that were used to make the MLL's.
authors.affiliation: Center for Nanoscale Materials and Materials Science Division, Argonne National Laboratory, Argonne, IL 60439, USA. kanghc@gist.ac.kr
authors.forename: Hyon Chol
authors.initials: HC
authors.lastname: Kang
authors.forename: G Brian
authors.initials: GB
authors.lastname: Stephenson
authors.forename: Chian
authors.initials: C
authors.lastname: Liu
authors.forename: Ray
authors.initials: R
authors.lastname: Conley
authors.forename: Ruben
authors.initials: R
authors.lastname: Khachatryan
authors.forename: Michael
authors.initials: M
authors.lastname: Wieczorek
authors.forename: Albert T
authors.initials: AT
authors.lastname: Macrander
authors.forename: Hanfei
authors.initials: H
authors.lastname: Yan
authors.forename: Jörg
authors.initials: J
authors.lastname: Maser
authors.forename: Jon
authors.initials: J
authors.lastname: Hiller
authors.forename: Rachel
authors.initials: R
authors.lastname: Koritala