title: Patterning colloidal films via evaporative lithography.
abstract: We investigate evaporative lithography as a route for patterning colloidal films. Films are dried beneath a mask that induces periodic variations between regions of free and hindered evaporation. Direct imaging reveals that particles segregate laterally within the film, as fluid and entrained particles migrate towards regions of higher evaporative flux. The films exhibit remarkable pattern formation that can be regulated by tuning the initial suspension composition, separation distance between the mask and underlying film, and mask geometry.
authors.affiliation: Department of Materials Science and Engineering and Frederick Seitz Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801, USA.
authors.forename: Daniel J
authors.initials: DJ
authors.lastname: Harris
authors.forename: Hua
authors.initials: H
authors.lastname: Hu
authors.forename: Jacinta C
authors.initials: JC
authors.lastname: Conrad
authors.forename: Jennifer A
authors.initials: JA
authors.lastname: Lewis