Oxidation of tertiary silanes by osmium tetroxide.
In the presence of an excess of pyridine ligand L, osmium tetroxide oxidizes tertiary silanes (Et(3)SiH, (i)Pr(3)SiH, Ph(3)SiH, or PhMe(2)SiH) to the corresponding silanols. With L = 4-tert-butylpyridine ((t)Bupy), OsO(4)((t)Bupy) oxidizes Et(3)SiH and PhMe(2)SiH to yield 100 +/- 2% of silanol and the structurally characterized osmium(VI) mu-oxo dimer [OsO(2)((t)Bupy)(2)](2)(mu-O)(2) (1a). With L = pyridine (py), only 40-60% yields of R(3)SiOH are obtained, apparently because of coprecipitation of osmium(VIII) with [Os(O)(2)py(2)](2)(mu-O)(2) (1b). Excess silane in these reactions causes further reduction of the OsVI products, and similar osmium "over-reduction" is observed with PhSiH(3), Bu(3)SnH, and boranes. The pathway for OsO(4)(L) + R(3)SiH involves an intermediate, which forms rapidly at 200 K and decays more slowly to products. NMR and IR spectra indicate that the intermediate is a monomeric Os(VI)-hydroxo-siloxo complex, trans-cis-cis-Os(O)(2)L(2)(OH)(OSiR(3)). Mechanistic studies and density functional theory calculations indicate that the intermediate is formed by the [3 + 2] addition of an Si-H bond across an O=Os=O fragment. This is the first direct observation of a [3 + 2] intermediate in a sigma-bond oxidation, though such species have previously been implicated in reactions of H-H and C-H bonds with OsO(4)(L) and RuO(4).
Valliant-Saunders
Karine
K
University of Washington, Department of Chemistry, P.O. Box 351700, Seattle, Washington 98195-1700, USA.
Gunn
Erica
E
Shelton
G Robert
GR
Hrovat
David A
DA
Borden
Weston Thatcher
WT
Mayer
James M
JM