Sub-diffraction-limited multilayer coatings for the 0.3 numerical aperture micro-exposure tool for extreme ultraviolet lithography.
Multilayer coating results are discussed for the primary and secondary mirrors of the micro-exposure tool (MET): a 0.30 NA lithographic imaging system with a 200 microm x 600 microm field of view at the wafer plane, operating in the extreme ultraviolet (EUV) region at an illumination wavelength around 13.4 nm. Mo/Si multilayers were deposited by DC-magnetron sputtering on large-area, curved MET camera substrates. A velocity modulation technique was implemented to consistently achieve multilayer thickness profiles with added figure errors below 0.1 nm rms demonstrating sub-diffraction-limited performance, as defined by the classical diffraction limit of Rayleigh (0.25 waves peak to valley) or Marechal (0.07 waves rms). This work is an experimental demonstration of sub-diffraction- limited multilayer coatings for high-NA EUV imaging systems, which resulted in the highest resolution microfield EUV images to date.
Soufli
Regina
R
Lawrence Livermore National Laboratory, Livermore, California 94550, USA. regina.soufli@llnl.gov
Hudyma
Russell M
RM
Spiller
Eberhard
E
Gullikson
Eric M
EM
Schmidt
Mark A
MA
Robinson
Jeff C
JC
Baker
Sherry L
SL
Walton
Christopher C
CC
Taylor
John S
JS
D000465:Algorithms; D004867:Equipment Design; D008280:Magnetics; D015233:Models, Statistical; D008962:Models, Theoretical; D055095:Optics and Photonics; D012542:Scattering, Radiation; D013056:Spectrophotometry, Ultraviolet; D013499:Surface Properties; D014466:Ultraviolet Rays