Atomic force microscope nanolithography of polymethylmethacrylate polymer.
We describe a nanolithography process for a polymethylmethacrylate (PMMA) surface using scanning contact atomic force microscopy. Parallel furrows were scribed with a pyramidal silicon tip using the same scan mechanism as used to image samples. The PMMA was first electron beam irradiated using a scanning electron microscope and developed. The topography formed is reproducible and predictable. Material from the region where the tip scribes is moved to nearby regions, and aligned, elongated PMMA fragments are seen to decorate the valleys between furrows.
Teixeira
F S
FS
Laboratory of Integrated Systems, Polytechnic School, University of São Paulo, Avenida Professor Luciano Gualberto, Travessa R-158, CEP 05508-900 São Paulo, Brazil.
Mansano
R D
RD
Salvadori
M C
MC
Cattani
M
M
Brown
I G
IG
D008422:Materials Testing; D018625:Microscopy, Atomic Force / Q000379:methods*; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D036103:Nanotechnology / Q000379:methods*; D019904:Polymethyl Methacrylate / Q000737:chemistry*; D013499:Surface Properties
D019904:Polymethyl Methacrylate