title: Ordered arrays of <100>-oriented silicon nanorods by CMOS-compatible block copolymer lithography.
abstract: Dense, ordered arrays of <100>-oriented Si nanorods with uniform aspect ratios up to 5:1 and a uniform diameter of 15 nm were fabricated by block copolymer lithography based on the inverse of the traditional cylindrical hole strategy and reactive ion etching. The reported approach combines control over diameter, orientation, and position of the nanorods and compatibility with complementary metal oxide semiconductor (CMOS) technology because no nonvolatile metals generating deep levels in silicon, such as gold or iron, are involved. The Si nanorod arrays exhibit the same degree of order as the block copolymer templates.
authors.affiliation: Max Planck Institute of Microstructure Physics, Weinberg 2, D-06120 Halle, Germany.
authors.forename: Danilo
authors.initials: D
authors.lastname: Zschech
authors.forename: Dong Ha
authors.initials: DH
authors.lastname: Kim
authors.forename: Alexey P
authors.initials: AP
authors.lastname: Milenin
authors.forename: Roland
authors.initials: R
authors.lastname: Scholz
authors.forename: Reinald
authors.initials: R
authors.lastname: Hillebrand
authors.forename: Craig J
authors.initials: CJ
authors.lastname: Hawker
authors.forename: Thomas P
authors.initials: TP
authors.lastname: Russell
authors.forename: Martin
authors.initials: M
authors.lastname: Steinhart
authors.forename: Ulrich
authors.initials: U
authors.lastname: Gösele
mesh_terms: D003460:Crystallization / Q000379:methods*; D004553:Electric Conductivity; D046911:Macromolecular Substances / Q000737:chemistry; D008422:Materials Testing; D008968:Molecular Conformation; D036103:Nanotechnology / Q000379:methods*; D043942:Nanotubes / Q000737:chemistry* / Q000648:ultrastructure*; D010316:Particle Size; D019904:Polymethyl Methacrylate / Q000737:chemistry*; D011137:Polystyrenes / Q000737:chemistry*; D012666:Semiconductors; D012825:Silicon / Q000737:chemistry*; D013499:Surface Properties
chemical_list: D046911:Macromolecular Substances; D011137:Polystyrenes; D019904:Polymethyl Methacrylate; D012825:Silicon