title: Characterization of spectroscopic photoemission and low energy electron microscope using multipolarized soft x rays at BL17SU/SPring-8.
abstract: Spectroscopic photoemission and low energy electron microscope (SPELEEM) improved its performance after installation at BL17SU/SPring-8, where a multipolarization-mode undulator is employed to produce circularly and linearly polarized soft x rays. This undulator enables us to study the domain structures of ferromagnetic and antiferromagnetic materials by x-ray magnetic circular dichroism and x-ray magnetic linear dichroism. SPELEEM is used to study light elements (C, N, and O), 3d transition-metal elements and 4f rare earth elements, utilizing a wide range of photon energies. The two cylindrical mirrors adopted in front of SPELEEM ensure an illumination area of 14 x 14 microm(2) on the samples. The lateral resolution of a secondary electron photoemission electron microscope image is estimated to be better than 85 nm, whereas the energy resolution of the instrument is better than 0.4 eV.
authors.affiliation: JASRI/SPring-8, Kouto 1-1-1, Sayo-cho, Sayo-gun, Hyogo 679-5198, Japan. fz-guo@spring8.or.jp
authors.forename: F Z
authors.initials: FZ
authors.lastname: Guo
authors.forename: T
authors.initials: T
authors.lastname: Muro
authors.forename: T
authors.initials: T
authors.lastname: Matsushita
authors.forename: T
authors.initials: T
authors.lastname: Wakita
authors.forename: H
authors.initials: H
authors.lastname: Ohashi
authors.forename: Y
authors.initials: Y
authors.lastname: Senba
authors.forename: T
authors.initials: T
authors.lastname: Kinoshita
authors.forename: K
authors.initials: K
authors.lastname: Kobayashi
authors.forename: Y
authors.initials: Y
authors.lastname: Saitoh
authors.forename: T
authors.initials: T
authors.lastname: Koshikawa
authors.forename: T
authors.initials: T
authors.lastname: Yasue
authors.forename: M
authors.initials: M
authors.lastname: Oura
authors.forename: T
authors.initials: T
authors.lastname: Takeuchi
authors.forename: S
authors.initials: S
authors.lastname: Shin
mesh_terms: D004867:Equipment Design; D019544:Equipment Failure Analysis; D008854:Microscopy, Electron / Q000295:instrumentation* / Q000379:methods; D012031:Refractometry / Q000295:instrumentation* / Q000379:methods; D015203:Reproducibility of Results; D012680:Sensitivity and Specificity; D013052:Spectrometry, X-Ray Emission / Q000295:instrumentation* / Q000379:methods