title: Heavy phosphate adsorption on amorphous ITO film electrodes: nano-barrier effect for highly selective exclusion of anionic species.
abstract: We prepared an amorphous indium tin oxide (ITO) film and studied it with respect to its surface characterization and the effect of phosphate adsorption on its electrochemical properties. The film was deposited using RF sputtering under ambient low-oxygen conditions at room temperature. The XPS results revealed that the amount of phosphate adsorbed on the amorphous ITO film was more than 4.6 times greater than that adsorbed on commercially available polycrystalline ITO film in spite of the smaller microscopic surface area of the former. Electrochemical responses for anionic species such as L-ascorbic acid (AA) and 3,4-dihydroxyphenylacetic acid (DOPAC) on the phosphate-adsorbed ITO film electrodes were more effectively suppressed at the amorphous ITO film electrode than at the polycrystalline ITO film electrode when a phosphate-containing electrolyte was used. Such suppression could be attributed to the electrostatic repulsion between the anionic species and more heavily adsorbed phosphate on our amorphous ITO film electrode surface. This effect is made more pronounced by increasing the phosphate concentration to 1 mM. With 1 mM phosphate, the amorphous ITO film electrode showed the highest selectivity for dopamine (DA) against the anionic species, namely, 880 for DA/AA and 330 for DA/DOPAC, respectively. In contrast, the selectivity was 120 for DA/AA and 20 for DA/DOPAC with the polycrystalline ITO film electrode.
authors.affiliation: National Institute of Advanced Industrial Science and Technology, 1-1-1, Higashi, Tsukuba, Ibaraki 305-8566, Japan.
authors.forename: Dai
authors.initials: D
authors.lastname: Kato
authors.forename: Guobao
authors.initials: G
authors.lastname: Xu
authors.forename: Yuzuru
authors.initials: Y
authors.lastname: Iwasaki
authors.forename: Yoshiki
authors.initials: Y
authors.lastname: Hirata
authors.forename: Ryoji
authors.initials: R
authors.lastname: Kurita
authors.forename: Osamu
authors.initials: O
authors.lastname: Niwa