title: RF sputter deposited nanocrystalline (110) magnetite thin film from alpha-Fe2O3 target.
abstract: Nanocrystalline magnetite thin film was prepared on to fused quartz substrate by sputtering at an rf power of 50 W. X-ray diffraction study showed that the sputtered film was (110) oriented. The stoichiometry in the thin film has been confirmed through a variety of characterization techniques. The room temperature spontaneous magnetization value (4piMs) of the film was 5100 G. This is about 85% of the bulk value. The resistivity of the film showed a sharp change around 120 K, indicative of the Verwey transition.
authors.affiliation: Department of Physics, Indian Institute of Technology Bombay, Mumbai 400076, India.
authors.forename: Murtaza
authors.initials: M
authors.lastname: Bohra
authors.forename: N
authors.initials: N
authors.lastname: Venkataramani
authors.forename: Shiva
authors.initials: S
authors.lastname: Prasad
authors.forename: Naresh
authors.initials: N
authors.lastname: Kumar
authors.forename: D S
authors.initials: DS
authors.lastname: Misra
authors.forename: S C
authors.initials: SC
authors.lastname: Sahoo
authors.forename: R
authors.initials: R
authors.lastname: Krishnan