Fabrication of nanostructure on a polymer film using atomic force microscope.
SPM based lithographic techniques have been developed to pattern various substrates such as metals, semiconductors, and organic/polymer films due to its simplicity and high spatial precision nanostructure. Fabrication of nanostructure using polymeric materials is a key technique for the development of nanodevices. Here, we report the fabrication of nanostructures from polyacrylicacid (PAA) and polymethacrylicacid (PMAA) film on a silicon substrate using atomic force microscope (AFM). The formation of the nanopattern from the polymer film was studied using electrostatic nanolithography and the optimization of the conditions for nanopatterning of the polymer film was investigated with respect to the applied potential and translational speed of the AFM tip. The nanostructure of size 28 nm was created using the biased AFM tip on the PMAA film coated on Si(100) substrate and found that this method is a direct and reliable method to produce uniform nanostructures on a polymer film.
Jegadesan
Subbiah
S
Department of Chemistry, 3 Science Drive 3, National University of Singapore, Singapore.
Sindhu
Swaminathan
S
Valiyaveettil
Suresh
S
D000180:Acrylic Resins / Q000737:chemistry*; D003460:Crystallization / Q000379:methods*; D046911:Macromolecular Substances / Q000737:chemistry; D008422:Materials Testing; D008567:Membranes, Artificial; D018625:Microscopy, Atomic Force / Q000379:methods*; D008968:Molecular Conformation; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D036103:Nanotechnology / Q000379:methods; D010316:Particle Size; D011108:Polymers / Q000737:chemistry; D019904:Polymethyl Methacrylate / Q000737:chemistry*; D013499:Surface Properties
D000180:Acrylic Resins; D046911:Macromolecular Substances; D008567:Membranes, Artificial; D011108:Polymers; C006903:carbopol 940; D019904:Polymethyl Methacrylate