Universal behavior of photochemical deposition in liquid solutions driven by a one-photon transition.
Even if photochemical deposition of nearly all types of materials has been used for decades to pattern almost any kind of substrate for various applications (catalysis, chemical sensing, magnetic data storage, optoelectronics, spin-dependent electron transport, and solar cells), a rationalized description is still missing. This paper aims at fulfilling this lack by presenting a unified approach of the photodeposit growth initiated by a one-photon photochemical reaction. We experimentally investigate the robustness of growth scalings predicted for photochemical deposition driven by a continuous laser wave. Three types of one-photon photochemical reactions (photoexcitation of chromates, photodissociation of permanganates, and photocondensation of colloidal selenium) and three parameters (solvent p H variations, concentration in photoactive reagent, and influence of the exciting optical wavelength) were cross analyzed. In all the cases, including data taken from the literature, the same dynamic master behavior emerges from the data rescaling of measured deposit growth laws. The nice agreement observed between system-independent predictions and the whole data set strongly supports a universal description of the photodeposit growth whatever the photosensitive medium and the involved one-photon chemical reaction. Such an approach also points out the quantitative sorting of photochemical reactions in terms of deposition efficiency. This rationalization of the kinetics of photodeposition anticipates new methodologies to predict, design, and control substrate micropatterning for chemical, lithographic, and optoelectronic applications.
Université Bordeaux I, Centre de Physique Moléculaire Optique et Hertzienne, UMR CNRS 5798, 351 Cours de la Libération, F-33405 Talence Cedex, France.
Emmanuel
E
Hugonnot
Marie-Hélène
MH
Delville
Jean-Pierre
JP
Delville