Getter sputtering system for high-throughput fabrication of composition spreads.
We describe a sputtering system that can deposit composition spreads in an effectively UHV environment but which does not require the high-throughput paradigm to be compromised by a long pump down each time a target is changed. The system deploys four magnetron sputter guns in a cryoshroud (getter sputtering) which allows elements such as Ti and Zr to be deposited with minimal contamination by oxygen or other reactive background gases. The system also relies on custom substrate heaters to give rapid heating and cool down. The effectiveness of the gettering technique is evaluated, and example results obtained for catalytic activity of a pseudoternary composition spread are presented.
Department of Physics, Cornell University, Ithaca, New York 14853, USA.
John M
JM
Gregoire
R B
RB
van Dover
Jing
J
Jin
Francis J
FJ
Disalvo
Héctor D
HD
Abruña
D020650:Combinatorial Chemistry Techniques / Q000295:instrumentation* / Q000379:methods; D004867:Equipment Design; D019544:Equipment Failure Analysis; D006361:Heating / Q000295:instrumentation*; D007477:Ions; D008420:Manufactured Materials / Q000528:radiation effects*; D008422:Materials Testing / Q000295:instrumentation* / Q000379:methods
D007477:Ions