Surface chemistry of n-octane modified silicon nanoparticles analyzed by IR, 13C CPMAS NMR, EELS, and TGA.
The functionalization of silicon nanoparticles by thermally induced hydrosilylation in a one-pot process is reported. In contrast to the commonly applied thermally induced hydrosilylation, the process described here is carried out in the presence of hydrofluoric acid as a second phase and therefore proceeds at a lower conversion temperature. The surface functionalization of silicon nanoparticles was analyzed by IR, 13C CPMAS NMR, EELS, and TGA techniques. The applied procedure resulted in functionalized silicon nanoparticles with good chemical and thermal stability.
Nelles
Jürgen
J
Institute of Inorganic Chemistry, RWTH Aachen University, Landoltweg 1, 52074 Aachen, Germany.
Sendor
Dorota
D
Bertmer
Marko
M
Ebbers
André
A
Petrat
Frank-Martin
FM
Simon
Ulrich
U
D006358:Hot Temperature; D006858:Hydrofluoric Acid / Q000737:chemistry; D009682:Magnetic Resonance Spectroscopy / Q000379:methods*; D053768:Metal Nanoparticles / Q000737:chemistry; D008956:Models, Chemical; D053758:Nanoparticles / Q000737:chemistry; D049329:Nanostructures / Q000737:chemistry; D036103:Nanotechnology / Q000379:methods*; D009795:Octanes / Q000737:chemistry*; D012825:Silicon / Q000737:chemistry; D013055:Spectrophotometry, Infrared / Q000379:methods*; D013499:Surface Properties; D013696:Temperature; D013818:Thermogravimetry / Q000379:methods*
D009795:Octanes; D006858:Hydrofluoric Acid; D012825:Silicon