Surface chemistry of n-octane modified silicon nanoparticles analyzed by IR, 13C CPMAS NMR, EELS, and TGA.
The functionalization of silicon nanoparticles by thermally induced hydrosilylation in a one-pot process is reported. In contrast to the commonly applied thermally induced hydrosilylation, the process described here is carried out in the presence of hydrofluoric acid as a second phase and therefore proceeds at a lower conversion temperature. The surface functionalization of silicon nanoparticles was analyzed by IR, 13C CPMAS NMR, EELS, and TGA techniques. The applied procedure resulted in functionalized silicon nanoparticles with good chemical and thermal stability.
Institute of Inorganic Chemistry, RWTH Aachen University, Landoltweg 1, 52074 Aachen, Germany.
Jürgen
J
Nelles
Dorota
D
Sendor
Marko
M
Bertmer
André
A
Ebbers
Frank-Martin
FM
Petrat
Ulrich
U
Simon
D006358:Hot Temperature; D006858:Hydrofluoric Acid / Q000737:chemistry; D009682:Magnetic Resonance Spectroscopy / Q000379:methods*; D053768:Metal Nanoparticles / Q000737:chemistry; D008956:Models, Chemical; D053758:Nanoparticles / Q000737:chemistry; D049329:Nanostructures / Q000737:chemistry; D036103:Nanotechnology / Q000379:methods*; D009795:Octanes / Q000737:chemistry*; D012825:Silicon / Q000737:chemistry; D013055:Spectrophotometry, Infrared / Q000379:methods*; D013499:Surface Properties; D013696:Temperature; D013818:Thermogravimetry / Q000379:methods*
D009795:Octanes; D006858:Hydrofluoric Acid; D012825:Silicon