Structural characterization of nanocrystalline lanthanum oxyfluoride films obtained by chemical vapor deposition.
This study is devoted to a thorough structural and microstructural characterization of nanophasic LaOF-based thin films. The coatings were synthesized by Chemical Vapor Deposition (CVD) onto Si(100) substrates at growth temperatures between 250 and 500 degrees C, using La(hfa)3.diglyme (Hhfa = 1,1,1,5,5,5-hexafluoro-2,4-pentanedione; diglyme = bis(2-methoxyethyl)ether) as both La and F molecular source under nitrogen + wet oxygen atmospheres. The system structure and microstructure were investigated by Glancing Incidence X-ray Diffraction (GIXRD) and X-ray microdiffraction. The most relevant sample features, with particular attention to the phase composition as a function of the synthesis conditions, are critically discussed.
ISTM-CNR and INSTM, Department of Chemistry, University of Padova, Via Marzolo, 1-35131 Padova, Italy.
Davide
D
Barreca
Elza
E
Bontempi
Laura E
LE
Depero
Cinzia
C
Maragno
Eugenio
E
Tondello
Paolo
P
Zanola
D003460:Crystallization; D005459:Fluorides / Q000737:chemistry*; D005461:Fluorine / Q000737:chemistry; D005740:Gases; D007811:Lanthanum / Q000737:chemistry*; D053758:Nanoparticles / Q000737:chemistry*; D049329:Nanostructures / Q000737:chemistry; D036103:Nanotechnology / Q000379:methods*; D010100:Oxygen / Q000737:chemistry; D012825:Silicon / Q000737:chemistry; D013499:Surface Properties; D013696:Temperature; D014961:X-Ray Diffraction; D014965:X-Rays
D005740:Gases; D005461:Fluorine; D007811:Lanthanum; D005459:Fluorides; D010100:Oxygen; D012825:Silicon