Fabrication of stable, highly flat gold film electrodes with an effective thickness on the order of 10 nm.
Stable gold film electrodes were fabricated by a combination of sputtered gold and an epoxy adhesion layer on a glass substrate using the template-stripped technique. An XRR scan analysis indicated the thickness and roughness of the gold layer to be on the order of 10 nm and subnanometer, respectively. In spite of their small thickness, the electrode had sufficient conductivity and stuck to the subject during the electrochemical measurements as did the usual gold working electrodes.
Department of Chemistry, Faculty of Engineering, Nagaoka University of Technology, Kamitomioka, Nagaoka, Niigata, Japan. syk@nagaokaut.ac.jp
Shin-Ya
SY
Kishioka
Junichi
J
Nishino
Hiroshi
H
Sakaguchi