title: Fabrication of x-ray zone plates by surface-plasma chemical vapor deposition.
abstract: A new cost-efficient sputter-slice technology for hard x-ray (10-30 keV) Fresnel zone plates fabrication, imposing no limitation to aspect ratio, is proposed. By means of a plasma chemical process, SiO(2)/Si(1-x)Ge(x)O(2) glassy film multilayer structures are deposited on a lateral surface of a silica rod, outermost layers being as thin as 100 nm. It has been shown by numerical simulation that for x=0.2 germanium fraction, 100-300 microm zone plate thickness and the number of zones of about 1000, first order diffraction efficiency as high as 20%-30% at the energy of approximately 20 keV can be achieved.
authors: Fiber Optics Research Center, RAS, 38 Vavilov Street, 119333 Moscow, Russia. golant@fo.gpi.ru
authors: K M
authors: KM
authors: Golant
authors: S V
authors: SV
authors: Lavrishchev
authors: A V
authors: AV
authors: Popov
authors: I A
authors: IA
authors: Artyukov
authors: R M
authors: RM
authors: Feshchenko
authors: A N
authors: AN
authors: Mitrofanov
authors: A V
authors: AV
authors: Vinogradov