title: A hybrid approach for microscopic properties and self-assembly of dendrimers between two hard walls.
abstract: Dendrimers are of interest in a number of applications and theoretical studies due to their interesting and complex architectures. We use a hybrid approach to investigate the microstructure of hard dendrimers and self-assembly of diblock dendrimers confined between two hard walls. In the hybrid approach, a single-chain Monte Carlo simulation is used to evaluate the ideal-gas contribution of the Helmholtz energy and a density functional theory is employed to calculate the excess Helmholtz energy. In our calculations, a coarse-grained model is used to represent the dendrimers of generations 1-4. The effects of generation and bulk packing fraction on the microscopic properties of the hard dendrimers are explored. With the increase of generations, the complexity of the dendritic architecture increases. Accordingly, the depletion effect becomes stronger with the generation at etabulk = 0.1. Furthermore, it is found that the more complex the molecular architecture and the higher the molecular stiffness, the smaller is the partitioning coefficient of confined dendrimers. In addition, we also investigate the effects of the width of the slit and the interaction (epsilon*AA) between hydrophilic segments on the self-assembly of diblock dendrimers in the slit. With the increase of epsilon*AA, we observe that the curves of average packing fraction of the dendrimers in the slit exist an abrupt jump, which corresponds to the first-order phase transition from a disordered state to a lamellar ordered structure. In the slit of H = 11sigma, it is at epsilon*AA = 8 rather than epsilon*AA = 10 or epsilon*AA = 12 that the minimum critical bulk packing fraction appears. This observation is distinctively different from the case of self-assembly of rod-like molecules in the slit, where the critical bulk concentration increases with the decrease of the head-head interaction linearly.
authors: Division of Molecular and Materials Simulation, Key Lab of Nanomaterials, Ministry of Education Beijing University of Chemical Technology, Beijing 100029, People's Republic of China.
authors: Lisheng
authors: L
authors: Cheng
authors: Dapeng
authors: D
authors: Cao