Small plasma source for materials application.
We describe a small hollow-cathode plasma source suitable for small-scale materials synthesis and modification application. The supporting electrical system is minimal. The gaseous plasma source delivers a plasma ion current of up to about 1 mA. Here we outline the source construction and operation, and present some of its basic performance characteristics.
Vizir
A
A
High Current Electronics Institute, Russian Academy of Sciences, Tomsk 634055, Russia.
Oks
E M
EM
Salvadori
M C
MC
Teixeira
F S
FS
Brown
I G
IG
D004867:Equipment Design; D019544:Equipment Failure Analysis; D005740:Gases / Q000737:chemistry*; D006361:Heating / Q000295:instrumentation* / Q000379:methods; D008422:Materials Testing / Q000295:instrumentation* / Q000379:methods; D044085:Microfluidics / Q000295:instrumentation* / Q000379:methods; D008904:Miniaturization; D015203:Reproducibility of Results; D012680:Sensitivity and Specificity
D005740:Gases