title: Small plasma source for materials application.
abstract: We describe a small hollow-cathode plasma source suitable for small-scale materials synthesis and modification application. The supporting electrical system is minimal. The gaseous plasma source delivers a plasma ion current of up to about 1 mA. Here we outline the source construction and operation, and present some of its basic performance characteristics.
authors.affiliation: High Current Electronics Institute, Russian Academy of Sciences, Tomsk 634055, Russia.
authors.forename: A
authors.initials: A
authors.lastname: Vizir
authors.forename: E M
authors.initials: EM
authors.lastname: Oks
authors.forename: M C
authors.initials: MC
authors.lastname: Salvadori
authors.forename: F S
authors.initials: FS
authors.lastname: Teixeira
authors.forename: I G
authors.initials: IG
authors.lastname: Brown
mesh_terms: D004867:Equipment Design; D019544:Equipment Failure Analysis; D005740:Gases / Q000737:chemistry*; D006361:Heating / Q000295:instrumentation* / Q000379:methods; D008422:Materials Testing / Q000295:instrumentation* / Q000379:methods; D044085:Microfluidics / Q000295:instrumentation* / Q000379:methods; D008904:Miniaturization; D015203:Reproducibility of Results; D012680:Sensitivity and Specificity
chemical_list: D005740:Gases