title: Suppression of rupture in thin, nonwetting liquid films.
abstract: Stabilization against the rupture and breakup of thin, nonwetting liquid films spread on surfaces is generally sought by modification of equilibrium interfacial properties. A mechanism for suppressing rupture in such films that uses surface-attached polymers togetherwithfree chains in the bulk of the film is reported. Films of an oligostyrene liquid, which rupture within several minutes when spread on a silicon wafer, may be stabilized for many months by a polystyrene brush attached to the substrate, together with some free polystyrene in the liquid. The effect may arise from entanglements of the free chains with the immobilized brush.
authors.forename: R
authors.initials: R
authors.lastname: Yerushalmi-Rozen
authors.forename: J
authors.initials: J
authors.lastname: Klein
authors.forename: L J
authors.initials: LJ
authors.lastname: Fetters