title: Comparison between gradient-doping GaAs photocathode and uniform-doping GaAs photocathode.
abstract: We compared two reflection-mode negative electron affinity (NEA) GaAs photocathode samples that are grown by molecular beam epitaxy with p-type beryllium doping. One sample is uniform doping, and another is gradient doping. Experimental curves of spectral response sensitivity and quantum efficiency are obtained. The thicknesses of the two cathodes are both 2.6 microm. The integrated sensitivity of the uniform doping one is 1966 microA/lm, and that of the gradient-doping one is 2421 microA/lm. The escape probability and diffusion length are fitted from the spectral response curves. For the uniform-doping sample, the escape probability is 0.45 and the diffusion length is 5 microm. For the gradient-doping sample, the escape probability is 0.55 and the diffusion length is 5.5 microm.
authors: Department of Electronic Engineering, East China Institute of Technology, Jiangxi, China.
authors: Zhi
authors: Z
authors: Yang
authors: Benkang
authors: B
authors: Chang
authors: Jijun
authors: J
authors: Zou
authors: Jianliang
authors: J
authors: Qiao
authors: Pin
authors: P
authors: Gao
authors: Yiping
authors: Y
authors: Zeng
authors: Hui
authors: H
authors: Li