A pyrazolate-based metalorganic tantalum precursor that exhibits high thermal stability and its use in the atomic layer deposition of ta(2)o(5).
Dezelah
Charles L
CL
Laboratory of Inorganic and Analytical Chemistry, Department of Chemical Technology, Helsinki University of Technology, P.O. Box 6100, FI-02015 Espoo, Finland.
Wiedmann
Monika K
MK
Mizohata
Kenichiro
K
Baird
Ronald J
RJ
Niinistö
Lauri
L
Winter
Charles H
CH