Patterning biomolecules with a water-soluble release and protection interlayer.
We report on a general lithography method for high-resolution biomolecule patterning with a bilayer resist system. Biomolecules are first immobilized on the surface of a substrate and covered by a release-and-protection interlayer of water-soluble polymer. Patterns can then be obtained by lithography with a spin-coated resist layer in a conventional way and transferred onto the substrate by reactive ion etching. Afterward, the resist layer is removed by dissolution in water. To demonstrate a high-resolution patterning, soft UV nanoimprint lithography has been used to produce high-density dot arrays of poly-(L-lysine) molecules on a glass substrate. Both fluorescence images and cell proliferation behaviors on such a patterned substrate have shown evidence of improved stability of biomolecule immobilization comparing to that obtained by microcontact printing techniques.
Shi
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Ecole Normale Supérieure, 24 rue Lhomond, 75005 Paris, France.
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Chen
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D001672:Biocompatible Materials / Q000737:chemistry*; D002448:Cell Adhesion; D049109:Cell Proliferation; D002478:Cells, Cultured; D005898:Glass / Q000737:chemistry*; D006801:Humans; D008422:Materials Testing; D008856:Microscopy, Fluorescence; D036103:Nanotechnology / Q000295:instrumentation / Q000379:methods*; D011107:Polylysine / Q000737:chemistry*; D012995:Solubility; D013499:Surface Properties; D013997:Time Factors; D014867:Water / Q000737:chemistry*
D001672:Biocompatible Materials; D014867:Water; D011107:Polylysine