Inorganic polymer photoresist for direct ceramic patterning by photolithography.
A novel negative, inorganic polymer photoresist was demonstrated to be suitable for simple and direct fabrication of tribological SiCN-based ceramic microstructures via UV photolithography and subsequent pyrolysis at 800 degrees C.
Pham
Tuan Anh
TA
Department of Fine Chemical Engineering and Chemistry, Chungnam National University, Daejeon 305-764, Korea.
Kim
Pilnam
P
Kwak
Moonkyoo
M
Suh
Kahp Y
KY
Kim
Dong-Pyo
DP