Fabrication of controlled thermosensitive polymer nanopatterns with one-pot polymerization through chemical lithography.
He
Qiang
Q
International Joint Lab, Beijing National Laboratory for Molecular Sciences (BNLMS), Institute of Chemistry, Chinese Academy of Sciences, Beijing 100080, P.R. China. jbli@iccas.ac.cn
Kueller
Alexander
A
Schilp
Soeren
S
Leisten
Frank
F
Kolb
Hans-Albert
HA
Grunze
Michael
M
Li
Junbai
J
D000180:Acrylic Resins / Q000737:chemistry*; D003460:Crystallization / Q000379:methods*; D006358:Hot Temperature; D046911:Macromolecular Substances / Q000737:chemistry; D008422:Materials Testing; D008968:Molecular Conformation; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D036103:Nanotechnology / Q000379:methods*; D010316:Particle Size; D010777:Photochemistry / Q000379:methods; D011108:Polymers / Q000737:chemistry; D013499:Surface Properties; D013696:Temperature
D000180:Acrylic Resins; D046911:Macromolecular Substances; D011108:Polymers; C052970:poly-N-isopropylacrylamide