title: Aerosol assisted chemical vapor deposition of In2O3 films from Me3In and donor functionalized alcohols.
abstract: The reaction of Me3In and ROH (R = CH2CH2NMe2, CH(CH3)CH2NMe2, C(CH3)2CH2OMe, CH2CH2OMe) in toluene under aerosol assisted chemical vapor deposition (AACVD) conditions leads to the production of indium oxide thin films on glass. The indium oxide films were deposited at 550 degrees C and analyzed by scanning electron microscopy (SEM), X-ray powder diffraction, wavelength dispersive analysis of X-rays (WDX), X-ray photoelectron spectroscopy (XPS), and Raman spectroscopy. This CVD technique offers a rapid, convenient route to In2O3, which presumably involves the in situ formation of dimethylindium alkoxides, of the type [Me2InOR]2. In order to identify compounds present in the aerosol mist, the solution-phase reaction between Me3In and ROH (R = CH2CH2NMe2, C(CH3)2CH2OMe, CH(CH3)CH2NMe2, CH(CH2NMe2)2) at room temperature in toluene was carried out. Dimeric indium alkoxides, of the type [Me2In(OR)]2, were isolated, and their structures were determined by X-ray crystallography.
authors.affiliation: Materials Chemistry Centre, Department of Chemistry, University College London, 20 Gordon Street, London, United Kingdom.
authors.forename: Siama
authors.initials: S
authors.lastname: Basharat
authors.forename: Claire J
authors.initials: CJ
authors.lastname: Carmalt
authors.forename: Sarah A
authors.initials: SA
authors.lastname: Barnett
authors.forename: Derek A
authors.initials: DA
authors.lastname: Tocher
authors.forename: Hywel O
authors.initials: HO
authors.lastname: Davies