title: Inorganic polymer photoresist for direct ceramic patterning by photolithography.
abstract: A novel negative, inorganic polymer photoresist was demonstrated to be suitable for simple and direct fabrication of tribological SiCN-based ceramic microstructures via UV photolithography and subsequent pyrolysis at 800 degrees C.
authors.affiliation: Department of Fine Chemical Engineering and Chemistry, Chungnam National University, Daejeon 305-764, Korea.
authors.forename: Tuan Anh
authors.initials: TA
authors.lastname: Pham
authors.forename: Pilnam
authors.initials: P
authors.lastname: Kim
authors.forename: Moonkyoo
authors.initials: M
authors.lastname: Kwak
authors.forename: Kahp Y
authors.initials: KY
authors.lastname: Suh
authors.forename: Dong-Pyo
authors.initials: DP
authors.lastname: Kim