Fabrication of molecular nanotemplates in self-assembled monolayers by extreme-ultraviolet-induced chemical lithography.
Extreme-UV interference lithography (EUV-IL) is applied to create chemical nanopatterns in self-assembled monolayers (SAMs) of 4'-nitro-1,1'-biphenyl-4-thiol (NBPT) on gold. X-ray photoelectron spectroscopy shows that EUV irradiation induces both the conversion of the terminal nitro groups of NBPT into amino groups and the lateral crosslinking of the underlying aromatic cores. Large-area ( approximately 2 mm(2)) nitro/amino chemical patterns with periods ranging from 2000 nm to 60 nm can be generated. Regions of pristine NBPT on the exposed samples are exchanged with protein-resistant thiol SAMs of polyethyleneglycol, resulting in the formation of molecular nanotemplates, which can serve as the basis of complex biomimetic surfaces.
Turchanin
Andrey
A
Physics of Supramolecular Systems, University of Bielefeld, 33615 Bielefeld, Germany. turchanin@physik.uni-bielefeld.de
Schnietz
Mark
M
El-Desawy
Mohamed
M
Solak
Harun H
HH
David
Christian
C
Gölzhäuser
Armin
A
D002623:Chemistry Techniques, Analytical / Q000379:methods*; D018625:Microscopy, Atomic Force; D049329:Nanostructures / Q000528:radiation effects* / Q000648:ultrastructure; D009943:Organophosphorus Compounds / Q000737:chemistry; D013057:Spectrum Analysis; D013816:Thermodynamics; D014466:Ultraviolet Rays
C120049:N-(n-butyl) thiophosphoric triamide; D009943:Organophosphorus Compounds