title: Three-dimensional nanofabrication with elastomeric phase masks.
abstract: This Feature Article reviews recent work on an optical technique for fabricating, in a single exposure step, three-dimensional (3D) nanostructures with diverse structural layouts. The approach, which we refer to as proximity field nanopatterning, uses conformable, elastomeric phase masks to pattern thick layers of transparent, photosensitive materials in a conformal contact mode geometry. Aspects of the optics, the materials, and the physical chemistry associated with this method are outlined. A range of 3D structures illustrate its capabilities, and several application examples demonstrate possible areas of use in technologies ranging from microfluidics to photonic materials to density gradient structures for chemical release and high-energy density science.
authors.affiliation: Department of Materials Science and Engineering and Seitz Materials Research Laboratory, University of Illinois, Urbana, Illinois 61801, USA.
authors.forename: Daniel J
authors.initials: DJ
authors.lastname: Shir
authors.forename: Seokwoo
authors.initials: S
authors.lastname: Jeon
authors.forename: Hongwei
authors.initials: H
authors.lastname: Liao
authors.forename: Matthew
authors.initials: M
authors.lastname: Highland
authors.forename: David G
authors.initials: DG
authors.lastname: Cahill
authors.forename: Mehmet F
authors.initials: MF
authors.lastname: Su
authors.forename: Ihab F
authors.initials: IF
authors.lastname: El-Kady
authors.forename: Christos G
authors.initials: CG
authors.lastname: Christodoulou
authors.forename: Gregory R
authors.initials: GR
authors.lastname: Bogart
authors.forename: Alex V
authors.initials: AV
authors.lastname: Hamza
authors.forename: John A
authors.initials: JA
authors.lastname: Rogers