title: Image reversal for direct electron beam patterning of protein coated surfaces.
abstract: Electron beam lithography (EBL) is used to create surfaces with protein patterns, which are characterized by immunofluorescence and atomic force microscopies. Both negative and positive image processes are realized by electron beam irradiation of proteins absorbed on a silicon surface, where image reversal is achieved by selectively binding a second species of protein to the electron beam exposed areas on the first protein layer. Biofunctionality at the cellular level was established by culturing cortical cells on patterned lines of fibronectin adsorbed on a bovine serum albumin background for 7 days in culture.
authors.affiliation: Department of Applied Physics, Royal Institute of Technology, Stockholm, Sweden. devrim@kth.se
authors.forename: Devrim
authors.initials: D
authors.lastname: Pesen
authors.forename: Anna
authors.initials: A
authors.lastname: Erlandsson
authors.forename: Mats
authors.initials: M
authors.lastname: Ulfendahl
authors.forename: David B
authors.initials: DB
authors.lastname: Haviland
mesh_terms: D004583:Electrons; D011506:Proteins / Q000737:chemistry*; D013499:Surface Properties
chemical_list: D011506:Proteins