Fault localization and analysis in semiconductor devices with optical-feedback infrared confocal microscopy.
We report on a cost-effective optical setup for characterizing light-emitting semiconductor devices with optical-feedback confocal infrared microscopy and optical beam-induced resistance change. We utilize the focused beam from an infrared laser diode to induce local thermal resistance changes across the surface of a biased integrated circuit (IC) sample. Variations in the multiple current paths are mapped by scanning the IC across the focused beam. The high-contrast current maps allow accurate differentiation of the functional and defective sites, or the isolation of the surface-emitting p-i-n devices in the IC. Optical beam-induced current (OBIC) is not generated since the incident beam energy is lower than the bandgap energy of the p-i-n device. Inhomogeneous current distributions in the IC become apparent without the strong OBIC background. They are located at a diffraction-limited resolution by referencing the current maps against the confocal reflectance image that is simultaneously acquired via optical-feedback detection. Our technique permits the accurate identification of metal and semiconductor sites as well as the classification of different metallic structures according to thickness, composition, or spatial inhomogeneity.
Sarmiento
Raymund
R
National Institute of Physics, University of the Philippines, Diliman, Quezon City 1101, Philippines.
Cemine
Vernon Julius
VJ
Tagaca
Imee Rose
IR
Salvador
Arnel
A
Mar Blanca
Carlo
C
Saloma
Caesar
C