title: Honeycomblike large area LaB6 plasma source for Multi-Purpose Plasma facility.
abstract: A Multi-Purpose Plasma (MP(2)) facility has been renovated from Hanbit mirror device [Kwon et al., Nucl. Fusion 43, 686 (2003)] by adopting the same philosophy of diversified plasma simulator (DiPS) [Chung et al., Contrib. Plasma Phys. 46, 354 (2006)] by installing two plasma sources: LaB(6) (dc) and helicon (rf) plasma sources; and making three distinct simulators: divertor plasma simulator, space propulsion simulator, and astrophysics simulator. During the first renovation stage, a honeycomblike large area LaB(6) (HLA-LaB(6)) cathode was developed for the divertor plasma simulator to improve the resistance against the thermal shock fragility for large and high density plasma generation. A HLA-LaB(6) cathode is composed of the one inner cathode with 4 in. diameter and the six outer cathodes with 2 in. diameter along with separate graphite heaters. The first plasma is generated with Ar gas and its properties are measured by the electric probes with various discharge currents and magnetic field configurations. Plasma density at the middle of central cell reaches up to 2.6 x 10(12) cm(-3), while the electron temperature remains around 3-3.5 eV at the low discharge current of less than 45 A, and the magnetic field intensity of 870 G. Unique features of electric property of heaters, plasma density profiles, is explained comparing with those of single LaB(6) cathode with 4 in. diameter in DiPS.
authors.affiliation: electric Probe Applications Laboratory (ePAL), Hanyang University, Seoul 133-791, Korea.
authors.forename: Hyun-Jong
authors.initials: HJ
authors.lastname: Woo
authors.forename: Kyu-Sun
authors.initials: KS
authors.lastname: Chung
authors.forename: Hyun-Jong
authors.initials: HJ
authors.lastname: You
authors.forename: Myoung-Jae
authors.initials: MJ
authors.lastname: Lee
authors.forename: Taihyeop
authors.initials: T
authors.lastname: Lho
authors.forename: Kwon Kook
authors.initials: KK
authors.lastname: Choh
authors.forename: Jung-Sik
authors.initials: JS
authors.lastname: Yoon
authors.forename: Yong Ho
authors.initials: YH
authors.lastname: Jung
authors.forename: Bongju
authors.initials: B
authors.lastname: Lee
authors.forename: Suk Jae
authors.initials: SJ
authors.lastname: Yoo
authors.forename: Myeon
authors.initials: M
authors.lastname: Kwon
mesh_terms: D004563:Electrochemistry / Q000295:instrumentation* / Q000379:methods; D004566:Electrodes; D004867:Equipment Design; D019544:Equipment Failure Analysis; D005740:Gases / Q000737:chemistry*; D006361:Heating / Q000295:instrumentation* / Q000379:methods; D006358:Hot Temperature; D015203:Reproducibility of Results; D012680:Sensitivity and Specificity
chemical_list: D005740:Gases