title: CMOS-micromachined, two-dimenisional transistor arrays for neural recording and stimulation.
abstract: In-plane microelectrode arrays have proven to be useful tools for studying the connectivities and the functions of neural tissues. However, seldom microelectrode arrays are monolithically-integrated with signal-processing circuits, without which the maximum number of electrodes is limited by the compromise with routing complexity and interferences. This paper proposes a CMOS-compatible, two-dimensional array of oxide-semiconductor field-effect transistors(OSFETs), capable of both recording and stimulating neuronal activities. The fabrication of the OSFETs not only requires simply die-level, post-CMOS micromachining process, but also retains metal layers for monolithic integration with signal-processing circuits. A CMOS microsystem containing the OSFET arrays and gain-programmable recording circuits has been fabricated and tested. The preliminary testing results are presented and discussed.
authors.affiliation: Inst. of Electronics Engineering, the NTHU, No. 101, Sec. 2, Kuang-Fu Rd., Hsin-Chu, Taiwan 30013.
authors.forename: J S
authors.initials: JS
authors.lastname: Lin
authors.forename: S R
authors.initials: SR
authors.lastname: Chang
authors.forename: C H
authors.initials: CH
authors.lastname: Chang
authors.forename: S C
authors.initials: SC
authors.lastname: Lu
authors.forename: H
authors.initials: H
authors.lastname: Chen
mesh_terms: D000465:Algorithms; D000669:Amplifiers, Electronic; D004567:Electrodes, Implanted; D004867:Equipment Design; D006801:Humans; D007495:Iridium / Q000737:chemistry; D008422:Materials Testing; D008838:Microcomputers; D008839:Microelectrodes; D008962:Models, Theoretical; D009420:Nervous System / Q000473:pathology*; D009474:Neurons / Q000473:pathology; D010984:Platinum / Q000737:chemistry; D012825:Silicon / Q000737:chemistry; D014173:Transistors, Electronic
chemical_list: D007495:Iridium; D010984:Platinum; D012825:Silicon