title: A magnetron sputtering system for the preparation of patterned thin films and in situ thin film electrical resistance measurements.
abstract: We describe a versatile three gun magnetron sputtering system with a custom made sample holder for in situ electrical resistance measurements, both during film growth and ambient changes on film electrical properties. The sample holder allows for the preparation of patterned thin film structures, using up to five different shadow masks without breaking vacuum. We show how the system is used to monitor the electrical resistance of thin metallic films during growth and to study the thermodynamics of hydrogen uptake in metallic thin films. Furthermore, we demonstrate the growth of thin film capacitors, where patterned films are created using shadow masks.
authors.affiliation: Matvice, Dunhaga 3, IS-107 Reykjavik, Iceland.
authors.forename: U B
authors.initials: UB
authors.lastname: Arnalds
authors.forename: J S
authors.initials: JS
authors.lastname: Agustsson
authors.forename: A S
authors.initials: AS
authors.lastname: Ingason
authors.forename: A K
authors.initials: AK
authors.lastname: Eriksson
authors.forename: K B
authors.initials: KB
authors.lastname: Gylfason
authors.forename: J T
authors.initials: JT
authors.lastname: Gudmundsson
authors.forename: S
authors.initials: S
authors.lastname: Olafsson
mesh_terms: D017097:Electric Impedance; D004563:Electrochemistry / Q000295:instrumentation* / Q000379:methods; D004867:Equipment Design; D019544:Equipment Failure Analysis; D008280:Magnetics / Q000295:instrumentation*; D008422:Materials Testing / Q000295:instrumentation* / Q000379:methods; D008567:Membranes, Artificial; D015203:Reproducibility of Results; D012680:Sensitivity and Specificity
chemical_list: D008567:Membranes, Artificial