Facile approach to the fabrication of a micropattern possessing nanoscale substructure.
On the basis of the combined technologies of photolithography and reaction-induced phase separation (RIPS), a facile approach has been successfully developed for the fabrication of a micropattern possessing nanoscale substructure on the thin film surface. This approach involves three steps. In the first step, a thin film was prepared by spin coating from a solution of a commercial random copolymer, polystyrene-r-poly(methyl methacrylate) (PS-r-PMMA) and a commercial crosslinker, trimethylolpropane triacrylate (TMPTA). In the second step, photolithograph was performed with the thin film using a 250 W high-pressure mercury lamp to produce the micropattern. Finally, the resulting micropattern was annealed at 200 degrees C for a certain time, and reaction-induced phase separation occurred. After soaking in chloroform for 4 h, nanoscale substructure was obtained. The whole processes were traced by atomic force microscopy (AFM), X-ray photoelectron spectrometry (XPS), and Fourier transform infrared (FTIR) spectroscopy, and the results supported the proposed structure.
Ji
Qiang
Q
School of Chemistry & Chemical Technology, State Key Laboratory for Composite Materials, Shanghai Jiao Tong University, Shanghai, PR China.
Jiang
Xuesong
X
Yin
Jie
J
D000179:Acrylates / Q000737:chemistry* / Q000528:radiation effects; D020650:Combinatorial Chemistry Techniques / Q000379:methods*; D008567:Membranes, Artificial; D008689:Methacrylates / Q000737:chemistry* / Q000528:radiation effects; D015394:Molecular Structure; D049329:Nanostructures / Q000737:chemistry* / Q000528:radiation effects; D010316:Particle Size; D010777:Photochemistry; D011137:Polystyrenes / Q000737:chemistry* / Q000528:radiation effects; D013499:Surface Properties
D000179:Acrylates; D008567:Membranes, Artificial; D008689:Methacrylates; D011137:Polystyrenes; C522509:polystyrene-block-poly(methyl methacrylate); C027993:trimethylolpropane triacrylate