title: Xe capillary target for laser-plasma extreme ultraviolet source.
abstract: A cryogenic Xe jet system with an annular nozzle has been developed in order to continuously fast supply a Xe capillary target for generating a laser-plasma extreme ultraviolet (EUV) source. The cooling power of the system was evaluated to be 54 W, and the temperature stability was +/-0.5 K at a cooling temperature of about 180 K. We investigated experimentally the influence of pressure loss inside an annular nozzle on target formation by shortening the nozzle length. Spraying caused by cavitation was mostly suppressed by mitigating the pressure loss, and a focused jet was formed. Around a liquid-solid boundary, a solid-Xe capillary target (10070 microm phi) was formed with a velocity of < or =0.01 ms. Laser-plasma EUV generation was tested by focusing a Nd:YAG laser beam on the target. The results suggested that an even thinner-walled capillary target is required to realize the inertial confinement effect.
authors.affiliation: Laboratory of Advanced Science and Technology for Industry, University of Hyogo, 3-1-2 Kouto, Kamigori, Akou, Hyogo 678-1205, Japan. inoue@lasti.u-hyogo.ac.jp
authors.forename: Takahiro
authors.initials: T
authors.lastname: Inoue
authors.forename: Hideyasu
authors.initials: H
authors.lastname: Okino
authors.forename: Petru Edward
authors.initials: PE
authors.lastname: Nica
authors.forename: Sho
authors.initials: S
authors.lastname: Amano
authors.forename: Shuji
authors.initials: S
authors.lastname: Miyamoto
authors.forename: Takayasu
authors.initials: T
authors.lastname: Mochizuki
mesh_terms: D002197:Capillary Action; D005740:Gases / Q000737:chemistry; D007834:Lasers; D044085:Microfluidics / Q000295:instrumentation* / Q000379:methods; D012034:Refrigeration / Q000295:instrumentation* / Q000379:methods; D012542:Scattering, Radiation; D014466:Ultraviolet Rays; D014978:Xenon / Q000737:chemistry* / Q000528:radiation effects*
chemical_list: D005740:Gases; D014978:Xenon