Photorefractive multiple quantum wells at 1064 nm.
We have fabricated photorefractive InGaAs/GaAs multiple quantum wells that are sensitive at wavelengths near 1.06 mum for what is believed to be the first time. We have measured four-wave-mixing diffraction efficiency, using a Nd:YAG laser. A maximum diffraction efficiency of 7 x 10(-4) and a cutoff grating period of ~2 mum are obtained.
Iwamoto
S
S
Taketomi
S
S
Kageshima
H
H
Nishioka
M
M
Someya
T
T
Arakawa
Y
Y
Fukutani
K
K
Shimura
T
T
Kuroda
K
K