title: 157-nm coherent light source as an inspection tool for F(2) laser lithography.
abstract: We have developed a 157-nm coherent light source by two-photon resonant four-wave mixing in Xe, with two tunable single-mode 1-kHz Ti:sapphire laser systems at 768 and 681 nm. This light source has been developed to determine the instrumental function of a vacuum ultraviolet spectrometer and to evaluate optical designs for ultra-line-narrowed F(2) laser lithography. The spectral linewidth of the source was less than 0.008 pm (FWHM), with an average power of 0.6 mW.
authors.forename: T
authors.initials: T
authors.lastname: Suganuma
authors.forename: H
authors.initials: H
authors.lastname: Kubo
authors.forename: O
authors.initials: O
authors.lastname: Wakabayashi
authors.forename: H
authors.initials: H
authors.lastname: Mizoguchi
authors.forename: K
authors.initials: K
authors.lastname: Nakao
authors.forename: Y
authors.initials: Y
authors.lastname: Nabekawa
authors.forename: T
authors.initials: T
authors.lastname: Togashi
authors.forename: S
authors.initials: S
authors.lastname: Watanabe