title: Ion-implanted Nd:YVO(4) planar waveguide: refractive-index characterization and propagation mode reduction.
abstract: We report for what is believed to be the first time planar waveguide formation and propagation mode reduction in Nd:YVO(4) crystal, which were achieved by 3.0-MeV silicon-ion implantation followed by annealing under specific conditions. After the implantation, an enhanced refractive-index region was formed with a width of ~2microm beneath the sample surface to act as a waveguide structure. We found that there were four propagation modes for the as-implanted Nd:YVO(4) waveguide, whereas after annealing at 240-360 degrees C for several hours the number of modes could be reduced to three, two, and one. After annealing at 400 degrees C for 1 h the monomode waveguide was destroyed completely, and no mode was observed in the sample.
authors.forename: Feng
authors.initials: F
authors.lastname: Chen
authors.forename: Xue-Lin
authors.initials: XL
authors.lastname: Wang
authors.forename: Ke-Ming
authors.initials: KM
authors.lastname: Wang
authors.forename: Qing-Ming
authors.initials: QM
authors.lastname: Lu
authors.forename: Ding-Yu
authors.initials: DY
authors.lastname: Shen