title: Scalable interference lithography alignment for fabrication of three-dimensional photonic crystals.
abstract: Holographic lithography is an ideal technique for fabricating three-dimensional photonic crystals. However, a critical stage in the fabrication is the minute alignment of the layers with one another. We present a simple moirelike alignment technique with better than 20-nm translation resolution and 45-murad rotation resolution. This technique can easily be extended to other situations when low-cost, high-precision alignment is needed.
authors.forename: A
authors.initials: A
authors.lastname: Feigel
authors.forename: Z
authors.initials: Z
authors.lastname: Kotler
authors.forename: B
authors.initials: B
authors.lastname: Sfez