title: Enhancement of CsLiB(6)O(10) surface-damage resistance by improved crystallinity and ion-beam etching.
abstract: The surface laser-induced damage threshold (LIDT) of CsLiB(6)O(10) (CLBO) crystal was enhanced twofold with improved crystallinity and ion-beam etching. For crystals with high crystal quality (bulk LIDT, 15.0-19.0 GW/cm(2)), the surface LIDT was 1.4-fold higher than for those with conventional crystal quality (bulk LIDT, 9.0-12.0 GW/cm(2)). In addition, removal of residual surface-polishing compounds by means of ion-beam etching can further enhance the surface LIDT by another 1.5-fold. Thus, CLBO crystals with high crystal quality and ion-beam etching are now more reliable for high-power UV light generation.
authors.forename: T
authors.initials: T
authors.lastname: Kamimura
authors.forename: S
authors.initials: S
authors.lastname: Fukumoto
authors.forename: R
authors.initials: R
authors.lastname: Ono
authors.forename: Y K
authors.initials: YK
authors.lastname: Yap
authors.forename: M
authors.initials: M
authors.lastname: Yoshimura
authors.forename: Y
authors.initials: Y
authors.lastname: Mori
authors.forename: T
authors.initials: T
authors.lastname: Sasaki
authors.forename: K
authors.initials: K
authors.lastname: Yoshida