title: Sputtered iridium oxide for stimulation electrode coatings.
abstract: This work deals with the reactive RF-powered sputter deposition of iridium oxide for use as the active stimulation layer in functional medical implants. The oxygen gettered by the growing films is determined by an approach based on generic curves. Films deposited at different stages of oxygen integration show strong differences in electrochemical behaviour, caused by different morphologies. The dependence of electrochemical activity on morphology is further illustrated by RF sputtering onto heated substrates, as well as DC sputtering onto cold substrates.
authors.affiliation: Institute of Materials in Electrical Engineering, I, RWTH Aachen University, Germany. mokwa@iwe1.rwth-aachen.de
authors.forename: Wilfried
authors.initials: W
authors.lastname: Mokwa
authors.forename: Boerge
authors.initials: B
authors.lastname: Wessling
authors.forename: Uwe
authors.initials: U
authors.lastname: Schnakenberg
mesh_terms: D020099:Coated Materials, Biocompatible / Q000737:chemistry*; D004553:Electric Conductivity; D004558:Electric Stimulation / Q000295:instrumentation*; D004566:Electrodes; D004867:Equipment Design; D019544:Equipment Failure Analysis; D006358:Hot Temperature; D007495:Iridium / Q000737:chemistry*; D008422:Materials Testing; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*
chemical_list: D020099:Coated Materials, Biocompatible; C044458:iridium oxide; D007495:Iridium