Photonic polymer replicas from distributed Bragg reflectors structured porous silicon.
Well defined 1-dimentional (1-D) photonic crystals of polymer replicas have been successfully obtained. DBR porous silicon containing nanometer-scale pores are prepared by an anodic electrochemical etch of p(++)-type silicon wafer. The resulting DBR porous silicon film removed from the substrate by applying an electropolishing current has been thermally oxidized in the furnace at 400 degrees C for 3 h. Oxidized DBR PSi/polystyrene composite films are prepared by casting of polymer solution onto a free-standing porous silicon photonic crystal layer. Flexible photonic polymer replicas have been prepared after the removal of oxidized DBR PSi matrix in HF/H2O mixture solution. Polymer replicas exhibit a sharp resonance in the reflectivity spectrum. Optical characteristics of photonic polymer replica indicate that the surface of polymer film has a negative structure of DBR PSi. This replica is stable in aqueous solutions for several days without any degradation.
Department of Chemistry, Chosun University, 375 Seosuk-dong, Dong-gu, Gwangju 501-759, Korea.
Jihoon
J
Kim
Youngdae
Y
Koh
Seunghyun
S
Jang
Young Chun
YC
Ko
Hee-Gweon
HG
Woo
Honglae
H
Sohn
D003460:Crystallization / Q000379:methods*; D050866:Liquid Crystals / Q000737:chemistry*; D046911:Macromolecular Substances / Q000737:chemistry; D008422:Materials Testing; D008968:Molecular Conformation; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D036103:Nanotechnology / Q000379:methods; D010316:Particle Size; D017785:Photons; D011108:Polymers / Q000737:chemistry*; D016062:Porosity; D012031:Refractometry / Q000379:methods*; D012825:Silicon / Q000737:chemistry*; D013499:Surface Properties
D046911:Macromolecular Substances; D011108:Polymers; D012825:Silicon