Complex photosensitivity observed in germanosilica planar waveguides.
Photosensitive effects distinguished as type I and type IIA photosensitivity within optical fibers were observed in a much more pronounced form within germanosilica waveguides deposited by hollow-cathode plasma-enhanced chemical-vapor deposition. With increasing exposure to 193-nm UV light, positive index changes greater than 2 x 10(-3) were observed, followed by negative index changes greater than -5 x 10(-3) . These behaviors are attributed to an increase in macroscopic polarizability and a reduction in material density, respectively. The negative index change is more temperature resistant and is fully annealed only at 900 degrees C, whereas the positive one is annealed at 500 degrees C.
Bazylenko
M V
MV
Moss
D
D
Canning
J
J