title: Excimer-laser-induced degradation of fused silica and calcium fluoride for 193-nm lithographic applications.
abstract: We report the initial results of a large-scale evaluation of production-grade fused silica and calcium fluoride to be used in 193-nm lithographic applications. The samples have been provided by many different suppliers of materials. A marathon irradiation chamber permits simultaneous exposure of as many as 36 samples at 800 Hz, at fluences from 0.2 to > or =4 (mJ/cm(2))/pulse and pulse counts in excess of 10(9) . The initial absorption and the laser-induced absorption are found to vary over a wide range. The compaction of each fused-silica sample follows a power law, but its parameters can differ widely from sample to sample.
authors: Lincoln Laboratory, Massachusetts Institute of Technology, 244 Wood Street, Lexington, Massachusetts 02420-9108,USA.
authors: V
authors: V
authors: Liberman
authors: M
authors: M
authors: Rothschild
authors: J H
authors: JH
authors: Sedlacek
authors: R S
authors: RS
authors: Uttaro
authors: A
authors: A
authors: Grenville
authors: A K
authors: AK
authors: Bates
authors: C
authors: C
authors: Van Peski