title: Influence of substrate treatment on self-organized pattern formation by langmuir-blodgett transfer.
abstract: Mesoscopic stripe patterns can be obtained by Langmuir-Blodgett (LB) transfer of l-alpha-dipalmitoylphosphatidylcholine (DPPC) onto solid substrates. In order to investigate the influence of substrates on the pattern formation, silicon slides treated by different cleaning processes were taken as model systems. A shift in the transfer pressure range for patterning was observed between plasma- and RCA-treated silicon. This can be explained with a model of equivalent states and taking into account the influence of microscale water films on the substrates.
authors.affiliation: Physikalisches Institut, Westfälische Wilhelms-Universität, Wilhelm-Klemm-Strasse 10, 48149 Münster, Germany.
authors.forename: Michael
authors.initials: M
authors.lastname: Hirtz
authors.forename: Harald
authors.initials: H
authors.lastname: Fuchs
authors.forename: Lifeng
authors.initials: L
authors.lastname: Chi
mesh_terms: D015060:1,2-Dipalmitoylphosphatidylcholine / Q000737:chemistry*; D018625:Microscopy, Atomic Force; D008956:Models, Chemical; D049329:Nanostructures / Q000737:chemistry*; D011312:Pressure; D012825:Silicon / Q000737:chemistry*; D013499:Surface Properties; D014867:Water / Q000737:chemistry
chemical_list: D014867:Water; D015060:1,2-Dipalmitoylphosphatidylcholine; D012825:Silicon