title: Intense plasma discharge source at 13.5 nm for extreme-ultraviolet lithography.
abstract: We measured an emission of 6 mJ/pulse at 13.5 nm produced by the Li(2+) Lyman-? transition excited by a fast capillary discharge, using a lithium hydride capillary. 75% of the energy emanated from a spot size of 0.6 mm. The emission is narrow band and would thus be useful in extreme-ultraviolet lithography imaging systems that use Mo:Si multilayer mirrors. The output within the bandwidth of Mo:Si mirrors was comparable with that of a laser-produced plasma (LPP), and the wallplug efficiency of 0.1% was nearly an order of magnitude better than that of a LPP.
authors.forename: M A
authors.initials: MA
authors.lastname: Klosner
authors.forename: H A
authors.initials: HA
authors.lastname: Bender
authors.forename: W T
authors.initials: WT
authors.lastname: Silfvast
authors.forename: J J
authors.initials: JJ
authors.lastname: Rocca