title: Nitrogen-rich silicon nitride thin films for deep-ultraviolet Mirau interferometry.
abstract: We report experimental results on UV-transparent low-pressure chemical-vapor-deposition nitride thin films. We show that, by using nitrogen-rich rather than conventionally silicon-rich thin-film membranes, we are able to obtain more than 95% UV transparency below 250 nm, while keeping the stress of the membrane manageable and below standard nitride's giga-Pascal stress. Using these results, we were able to microfabricate a UV Mirau interferometer for correlation microscopy.
authors.forename: F C
authors.initials: FC
authors.lastname: Chang
authors.forename: G S
authors.initials: GS
authors.lastname: Kino