title: Ion-beam-assisted deposition of thin films.
abstract: Some effects on the properties of electron-beam evaporated thin films produced by ion bombardment of the growing film are reported. Substantial increases in the packing densities of SiO2 , TiO2 , and ZrO2 films have been produced as measured by the reduction in the adsorption of moisture when the films are exposed to a humid atmosphere. In a ZrO2-SiO2 multilayer interference filter, changes in the wavelength of the peak transmittance on exposure to the atmosphere have been reduced from 8 nm for films deposited without ion bombardment to <1 nm for ion-beam-assisted films.
authors.affiliation: CSIRO Division of Applied Physics, Sydney, Australia 2070.
authors.forename: P J
authors.initials: PJ
authors.lastname: Martin
authors.forename: H A
authors.initials: HA
authors.lastname: Macleod
authors.forename: R P
authors.initials: RP
authors.lastname: Netterfield
authors.forename: C G
authors.initials: CG
authors.lastname: Pacey
authors.forename: W G
authors.initials: WG
authors.lastname: Sainty