Second-generation maskless photolithography device for surface micropatterning and microfluidic channel fabrication.
We have previously reported on a maskless photolithography device for surface micropatterning and microfabrication by modifying a commercially available liquid crystal display projector. For the prototype, 10-microm resolution was achieved by downsizing the image on a 0.7-in. liquid crystal display panel to an area of 8 x 6 mm and projecting it on a fixed stage. Here, we report on a second-generation maskless photolithography device having two novel features. First, the sliding lens system with variable focal distances and exchangeable objective lenses achieves a variable resolution of 2-8 mum. Second, the synchronous control of displayed images generated by a personal computer and the movement of a XY-positioning stage allows for the fabrication of micropatterns over a larger area (over 50 x 50 mm). Here, we show examples fabricated with the two novel features.
Itoga
Kazuyoshi
K
Institute of Advanced Biomedical Engineering and Science, Tokyo Women's Medical University, 8-1 Kawada-cho, Shinjuku, Tokyo, Japan.
Kobayashi
Jun
J
Tsuda
Yukiko
Y
Yamato
Masayuki
M
Okano
Teruo
T
D000180:Acrylic Resins / Q000737:chemistry; D000818:Animals; D001709:Biotechnology / Q000295:instrumentation / Q000379:methods*; D002417:Cattle; D042783:Endothelial Cells / Q000648:ultrastructure; D004867:Equipment Design; D050866:Liquid Crystals / Q000737:chemistry*; D046210:Microfluidic Analytical Techniques / Q000295:instrumentation / Q000379:methods*; D008855:Microscopy, Electron, Scanning / Q000379:methods; D013194:Staining and Labeling; D013499:Surface Properties; D000099166:Polyacrylamides
D000180:Acrylic Resins; D000099166:Polyacrylamides