title: Mid-infrared wire-grid polarizer with silicides.
abstract: An infrared (IR) polarizer with tungsten silicide (WSi) wire grid was fabricated by two-beam interference exposure and reactive ion etching. To enhance TM transmittance, silicon monoxide was deposited between the WSi wire grid (400 nm period) and a Si substrate. The transmittance was over 80% in the 4-5 microm wavelength range. The ratio of TM and TE transmittances was over 100 (20 dB) in the 2.5-6 microm wavelength range. The fabricated polarizer has higher durability and better compatibility with microfabrication processes compared with conventional IR polarizers.
authors.affiliation: Department of Electronics and Informatics, Ryukoku University, Seta, Otsu, Japan.
authors.forename: Itsunari
authors.initials: I
authors.lastname: Yamada
authors.forename: Kenji
authors.initials: K
authors.lastname: Kintaka
authors.forename: Junji
authors.initials: J
authors.lastname: Nishii
authors.forename: Satoshi
authors.initials: S
authors.lastname: Akioka
authors.forename: Yutaka
authors.initials: Y
authors.lastname: Yamagishi
authors.forename: Mitsunori
authors.initials: M
authors.lastname: Saito