Fabrication of complex multilevel microchannels in PDMS by using three-dimensional photoresist masters.
This paper demonstrates a new method of implementing complex microchannels in PDMS, which is simply constructed using three-dimensional photoresist structures as a master mold for the PDMS replica process. The process utilizes UV-insensitive LOR resist as a sacrificial layer to levitate the structural photoresist. In addition, the thickness of photoresist structures can be controlled by multi-step UV exposure. By using these techniques, various three-dimensional photoresist structures were successfully implemented, including the recessed cantilevers, suspended bridges, and the complex plates with micro-pits or micro-villi. We demonstrate that the three-dimensional photoresist structures are applicable to implementing complex multiple microchannels in PDMS by using the PDMS replica method.
Yun
Kwang-Seok
KS
Department of Electronic Engineering, Sogang University, 1 Shinsoo-dong, Mapo-gu, Seoul, Korea. ksyun@sogang.ac.kr
Yoon
Euisik
E