Mid-infrared wire-grid polarizer with silicides.
An infrared (IR) polarizer with tungsten silicide (WSi) wire grid was fabricated by two-beam interference exposure and reactive ion etching. To enhance TM transmittance, silicon monoxide was deposited between the WSi wire grid (400 nm period) and a Si substrate. The transmittance was over 80% in the 4-5 microm wavelength range. The ratio of TM and TE transmittances was over 100 (20 dB) in the 2.5-6 microm wavelength range. The fabricated polarizer has higher durability and better compatibility with microfabrication processes compared with conventional IR polarizers.
Yamada
Itsunari
I
Department of Electronics and Informatics, Ryukoku University, Seta, Otsu, Japan.
Kintaka
Kenji
K
Nishii
Junji
J
Akioka
Satoshi
S
Yamagishi
Yutaka
Y
Saito
Mitsunori
M