title: Stability and dynamics of Frenkel pairs in si.
abstract: Extensive experiments and calculation have shown that interstitials in p-Si diffuse athermally, leading to the conclusion that vacancy-interstitial pairs, or Frenkel pairs (FPs), either rapidly recombine or dissociate, even at cryogenic temperatures. More recent experiments, however, suggest that FPs persist to 150 K. Here we report first-principles calculations of FP properties and resolve the apparent conflict between experiments by showing that athermal interstitial diffusion is suppressed in proximal FPs due to vacancy-interstitial interactions.
authors.affiliation: Department of Physics and Astronomy, Vanderbilt University, Nashville, Tennessee 37235, USA. m.beck@vanderbilt.edu
authors.forename: M J
authors.initials: MJ
authors.lastname: Beck
authors.forename: L
authors.initials: L
authors.lastname: Tsetseris
authors.forename: S T
authors.initials: ST
authors.lastname: Pantelides