title: Nanoscale imaging of buried structures with elemental specificity using resonant x-ray diffraction microscopy.
abstract: We report the first demonstration of resonant x-ray diffraction microscopy for element specific imaging of buried structures with a pixel resolution of approximately 15 nm by exploiting the abrupt change in the scattering cross section near electronic resonances. We performed nondestructive and quantitative imaging of buried Bi structures inside a Si crystal by directly phasing coherent x-ray diffraction patterns acquired below and above the Bi M5 edge. We anticipate that resonant x-ray diffraction microscopy will be applied to element and chemical state specific imaging of a broad range of systems including magnetic materials, semiconductors, organic materials, biominerals, and biological specimens.
authors.affiliation: Department of Physics and Astronomy, University of California, Los Angeles, California 90095, USA.
authors.forename: Changyong
authors.initials: C
authors.lastname: Song
authors.forename: Raymond
authors.initials: R
authors.lastname: Bergstrom
authors.forename: Damien
authors.initials: D
authors.lastname: Ramunno-Johnson
authors.forename: Huaidong
authors.initials: H
authors.lastname: Jiang
authors.forename: David
authors.initials: D
authors.lastname: Paterson
authors.forename: Martin D
authors.initials: MD
authors.lastname: de Jonge
authors.forename: Ian
authors.initials: I
authors.lastname: McNulty
authors.forename: Jooyoung
authors.initials: J
authors.lastname: Lee
authors.forename: Kang L
authors.initials: KL
authors.lastname: Wang
authors.forename: Jianwei
authors.initials: J
authors.lastname: Miao
mesh_terms: D000465:Algorithms; D001729:Bismuth / Q000737:chemistry; D008853:Microscopy / Q000379:methods; D036103:Nanotechnology / Q000379:methods*; D012825:Silicon / Q000737:chemistry; D014961:X-Ray Diffraction / Q000379:methods*
chemical_list: D001729:Bismuth; D012825:Silicon