title: Multiplicative moiré two-beam phase-stepping and fourier-transform methods for the evaluation of multiple-beam fizeau patterns: a comparison.
abstract: A phase-evaluation method of multiple-beam Fizeau patterns that combines two-beam phase-stepping algorithms with the moiré effect was previously reported [Appl. Opt. 34, 3639-3643(1995)]. The method is based on a multiplicative moiréimage-formation process obtained by the direct superposition of high-frequency multiple-beam Fizeau carrier fringes upon a transmission grating (working as a phase modulator). We present a comparison between this multiplicative moiré two-beam phase-stepping method and the well-known Fourier-transform method for the topographic measurement of an undoped silicon wafer. The discrepancy between the two methods yields a rms phase-difference value of the order of(~2pi/90).
authors.forename: B V
authors.initials: BV
authors.lastname: Dorrío
authors.forename: C
authors.initials: C
authors.lastname: López
authors.forename: J M
authors.initials: JM
authors.lastname: Alén
authors.forename: J
authors.initials: J
authors.lastname: Bugarín
authors.forename: A
authors.initials: A
authors.lastname: Fernández
authors.forename: A F
authors.initials: AF
authors.lastname: Doval
authors.forename: J
authors.initials: J
authors.lastname: Blanco-García
authors.forename: M
authors.initials: M
authors.lastname: Pérez-Amor
authors.forename: J L
authors.initials: JL
authors.lastname: Fernández