title: Quantitative molecular depth profiling of organic delta-layers by C60 ion sputtering and SIMS.
abstract: Alternating layers of two different organic materials, Irganox1010 and Irganox3114, have been created using vapor deposition. The layers of Irganox3114 were very thin ( approximately 2.5 nm) in comparison to the layers of Irganox1010 ( approximately 55 or approximately 90 nm) to create an organic equivalent of the inorganic 'delta-layers' commonly employed as reference materials in dynamic secondary ion mass spectrometry. Both materials have identical sputtering yields, and we show that organic delta layers may be used to determine some of the important metrological parameters for cluster ion beam depth profiling. We demonstrate, using a C(60) ion source, that the sputtering yield, S, diminishes with ion dose and that the depth resolution also degrades. By comparison with atomic force microscopy data for films of pure Irganox1010, we show that the degradation in depth resolution is caused by the development of topography. Secondary ion intensities are a well-behaved function of sputtering yield and may be employed to obtain useful analytical information. Fragments characteristic of highly damaged material have intensity proportional to S, and those fragments with minimal molecular rearrangment exhibit intensities proportional to S(2). We demonstrate quantitative analysis of the amount of substance in buried layers of a few nanometer thickness with an accuracy of approximately 10%. Organic delta layers are valuable reference materials for comparing the capabilities of different cluster ion sources and experimental arrangements for the depth profiling of organic materials.
authors.affiliation: National Physical Laboratory, Teddington, Middlesex, TW11 0LW, UK. alex.shard@npl.co.uk
authors.forename: Alexander G
authors.initials: AG
authors.lastname: Shard
authors.forename: Felicia M
authors.initials: FM
authors.lastname: Green
authors.forename: Paul J
authors.initials: PJ
authors.lastname: Brewer
authors.forename: Martin P
authors.initials: MP
authors.lastname: Seah
authors.forename: Ian S
authors.initials: IS
authors.lastname: Gilmore