Polar coordinate laser pattern generator for fabrication of diffractive optical elements with arbitrary structure.
A precision laser pattern generator for writing arbitrary diffractive elements was developed as an alternative to Cartesian coordinate laser/electron-beam writers. This system allows for the fabrication of concentric continuous-relief and arbitrary binary patterns with minimum feature sizes of less than 0.6 microm and position accuracy of 0.1 microm over 300-mm substrates. Two resistless technologies of writing on chromium and on amorphous silicon films were developed and implemented. We investigated limit characteristics by writing special test structures. A 58-mm f/1.1 zone plate written directly is demonstrated at a lambda/50 rms wave-front error corresponding to a 0.06-microm pattern accuracy. Several examples of fabricated diffractive elements are presented.
Poleshchuk
A G
AG
Laboratory of Laser Technologies, Institute of Automation and Electrometry, Russian Academy of Sciences, Koptuga Prospekt 1, 630090 Novosibirsk, Russia. alexp@okibox.iae.nsk.su
Churin
E G
EG
Koronkevich
V P
VP
Korolkov
V P
VP
Kharissov
A A
AA
Cherkashin
V V
VV
Kiryanov
V P
VP
Kiryanov
A V
AV
Kokarev
S A
SA
Verhoglyad
A G
AG