title: The surface hydro-oxidation of LaNiO(3-delta) thin films.
abstract: The chemical structure and possible hydro-oxidation of LaNiO(3-delta) films were studied by means of tuneable high-energy X-ray photoelectron spectroscopy using synchrotron radiation. It was shown that the hydroxyl-containing phase, located near the film surface, may be attributed to the lanthanum and nickel hydroxide species. The thickness of a hydroxide-enriched layer was estimated from the oxide/hydroxide ratio measured at normal and grazing conditions. The hydroxide layer thickness was about 2 nm for step and/or exponential hydroxide spatial distribution.
authors.affiliation: Semiconductor Physics Institute, A. Gostauto 11, 01108 Vilnius, Lithuania. sigism@pfi.lt
authors.forename: S
authors.initials: S
authors.lastname: Mickevicius
authors.forename: S
authors.initials: S
authors.lastname: Grebinskij
authors.forename: V
authors.initials: V
authors.lastname: Bondarenka
authors.forename: V
authors.initials: V
authors.lastname: Lisauskas
authors.forename: K
authors.initials: K
authors.lastname: Sliuziene
authors.forename: H
authors.initials: H
authors.lastname: Tvardauskas
authors.forename: B
authors.initials: B
authors.lastname: Vengalis
authors.forename: B A
authors.initials: BA
authors.lastname: Orlowski
authors.forename: V
authors.initials: V
authors.lastname: Osinniy
authors.forename: W
authors.initials: W
authors.lastname: Drube