High-efficiency multilayer-coated ion-beam-etched blazed grating in the extreme-ultraviolet wavelength region.
We describe a simple method to fabricate blazed gratings used in the extreme ultraviolet wavelength region. The method uses an argon and oxygen mixed-gas ion beam to directly etch the grating substrate through a rectangular profile photoresist grating mask. With this method the etched grating groove profile can be well controlled. An Mo/Si multilayer-coated specimen with a blaze angle of 1.9 degrees was fabricated and measured. At an incident angle of 10 degrees and a wavelength of 13.62 nm, the diffraction efficiency of the negative second order reaches 36.2%.
Lin
Hui
H
Department of Precision Instruments, State Key Laboratory of Precision Measurement Technology and Instruments, Tsinghua University, Beijing, China. hui_lin00@mails.tsinghua.edu.cn
Zhang
Lichao
L
Li
Lifeng
L
Jin
Chunshui
C
Zhou
Hongjun
H
Huo
Tonglin
T