title: Fabrication of high-aspect-ratio Fresnel zone plates by e-beam lithography and electroplating.
abstract: The fabrication of gold Fresnel zone plates, by a combination of e-beam lithography and electrodeposition, with a 30 nm outermost zone width and a 450 nm-thick structure is described. The e-beam lithography process was implemented with a careful evaluation of applied dosage, tests of different bake-out temperatures and durations for the photoresist, and the use of a developer without methylisobutylketone. Electrodeposition with a pulsed current mode and with a specially designed apparatus produced the desired high-aspect-ratio nanostructures. The fabricated zone plates were examined by electron microscopy and their performances were assessed using a transmission X-ray microscope. The results specifically demonstrated an image resolution of 40 nm.
authors.affiliation: Institute of Physics, Academia Sinica, Taipei 115, Taiwan.
authors.forename: Y T
authors.initials: YT
authors.lastname: Chen
authors.forename: T N
authors.initials: TN
authors.lastname: Lo
authors.forename: C W
authors.initials: CW
authors.lastname: Chiu
authors.forename: J Y
authors.initials: JY
authors.lastname: Wang
authors.forename: C L
authors.initials: CL
authors.lastname: Wang
authors.forename: C J
authors.initials: CJ
authors.lastname: Liu
authors.forename: S R
authors.initials: SR
authors.lastname: Wu
authors.forename: S T
authors.initials: ST
authors.lastname: Jeng
authors.forename: C C
authors.initials: CC
authors.lastname: Yang
authors.forename: J
authors.initials: J
authors.lastname: Shiue
authors.forename: C H
authors.initials: CH
authors.lastname: Chen
authors.forename: Y
authors.initials: Y
authors.lastname: Hwu
authors.forename: G C
authors.initials: GC
authors.lastname: Yin
authors.forename: H M
authors.initials: HM
authors.lastname: Lin
authors.forename: J H
authors.initials: JH
authors.lastname: Je
authors.forename: G
authors.initials: G
authors.lastname: Margaritondo