Formation of aromatic siloxane self-assembled monolayers.
We describe reproducible protocols for the chemisorption of self-assembled monolayers (SAMs), useful as imaging layers for nanolithography applications, from p-chloromethylphenyltrichlorosilane (CMPS) and 1-(dimethylchlorosilyl)-2-(p,m-chloromethylphenyl)ethane on native oxide Si wafers. Film chemisorption was monitored and characterized using water contact angle, X-ray photoelectron spectroscopy, and ellipsometry measurements. Atomic force microscopy was used to monitor the onset of multilayer deposition for CMPS films, ultimately allowing film macroscopic properties to be correlated with their surface coverage and nanoscale morphologies. Although our results indicate the deposition of moderate coverage, disordered SAMs under our conditions, their quality is sufficient for the fabrication of sub-100-nm-resolution metal features. The significance of our observations on the design of future imaging layers capable of molecular scale resolution in nanolithography applications is briefly discussed.
Brandow
Susan L
SL
Naval Research Laboratory, Center for Bio/Molecular Science & Engineering, 4555 Overlook Avenue S.W., Washington, DC 20375, USA.
Chen
Mu-San
MS
Dulcey
Charles S
CS
Dressick
Walter J
WJ
D006843:Hydrocarbons, Chlorinated / Q000138:chemical synthesis* / Q000737:chemistry; D018625:Microscopy, Atomic Force; D008855:Microscopy, Electron, Scanning; D015394:Molecular Structure; D012821:Silanes / Q000138:chemical synthesis* / Q000737:chemistry; D012833:Siloxanes / Q000138:chemical synthesis* / Q000737:chemistry; D013499:Surface Properties
D006843:Hydrocarbons, Chlorinated; D012821:Silanes; D012833:Siloxanes; C528534:p-chloromethylphenyltrichlorosilane