title: Investigation of rf power absorption in the plasma of helicon ion source.
abstract: The simulations of the spatial distribution of rf power absorbed in a helicon ion source reveal a correlation between the depth of penetration of rf power into the plasma and the tilt angle of lines of force of the outer magnetic field. The deeper field penetration and greater power absorption were observed at large tilt angles of the field line to the plasma surface. The evaluations as to the possibility of excitation of helicon waves in compact rf ion sources were performed.
authors.affiliation: Institute of Applied Physics, NAS Ukraine, Sumy, Ukraine. mordyk@ipflab.sumy.ua
authors.forename: S
authors.initials: S
authors.lastname: Mordyk
authors.forename: O
authors.initials: O
authors.lastname: Alexenko
authors.forename: V
authors.initials: V
authors.lastname: Miroshnichenko
authors.forename: V
authors.initials: V
authors.lastname: Storizhko
authors.forename: K
authors.initials: K
authors.lastname: Stepanov
authors.forename: V
authors.initials: V
authors.lastname: Olshansky