Formation of phase gratings on the end of gradient-index lenses with ultraviolet ablation at 193 nm.
We present a simple, cost-effective method for creating diffractive optical elements on the surfaces of optical fibers and fiber-optic components by use of 193-nm ablation techniques. It is an outgrowth of a more fundamental investigation of the effects of intense UV radiation fields on SiO2- and Ge-SiO2-based structures (specifically optical fibers and preforms) and allows the inexpensive fabrication of structures such as the suggested evanescent-field-based sensing device.
Thompson
E J
EJ
Research Center for Optical Physics, Hampton University, Hampton, Virginia 23668, USA.
Brass
E D
ED
Samuel
K
K
Bullock
S R
SR
Lindesay
J
J
Lyons
D R
DR