title: Enhanced optical microlithography with a Fabry-Perot-based spatial filtering technique.
abstract: A coherent multiple imaging technique for use in optical microlithography was studied. The technique involves placing a thin Fabry-Perot etalon between the mask and the projection lens of an optical stepper. An optical lithographic computer simulation tool, Prolith/2, was used to evaluate the aerial image profile obtained for extended mask structures such as typical contact hole arrays and line-space patterns used in integrated circuit fabrication. Additionally, a set of experimental studies were performed to validate the simulation results. Enhancement of both resolution and depth of focus can be obtained simultaneously with appropriate etalon parameters.
authors.affiliation: Department of Electrical and Computer Engineering, Rice University, 6100 Main Street, Houston, Texas 77251, USA.
authors.forename: M
authors.initials: M
authors.lastname: Erdélyi
authors.forename: Z
authors.initials: Z
authors.lastname: Bor
authors.forename: W L
authors.initials: WL
authors.lastname: Wilson
authors.forename: M C
authors.initials: MC
authors.lastname: Smayling
authors.forename: F K
authors.initials: FK
authors.lastname: Tittel