Correction masks for thickness uniformity in large-area thin films.
Experimental results from the emission of vapor sources are considered in designing correcting diaphragms to achieve a uniform thickness distribution during evaporation of thin films mounted on large-area substrate holders, in different geometric configurations.
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Centro de Investigaciones en Optica, Apartado Postal 1-948, CP 37000, Leon Gto, Mexico. fvilla@foton.cio.mx
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