title: Test of opticlean strip coating material for removing surface contamination.
abstract: The strip coating material, Opticlean, which has been reformulated, has been shown to remove 1-5-microm-diameter particles as well as contamination remaining from previous drag wipe cleaning on a used silicon wafer. In addition, no residue that produced scattering was found on a fresh silicon wafer when Opticlean was applied and then stripped off. The total integrated scattering technique used for the measurements could measure scattering levels of He-Ne laser light as low as a few ppm (parts in 10(6)), corresponding to a surface roughness of <1 A rms.
authors.affiliation: Physics Division, Michelson Laboratory, Naval Air Warfare Center, China Lake, California 93555, USA. jbennett@ridgenet.net
authors.forename: J M
authors.initials: JM
authors.lastname: Bennett
authors.forename: D
authors.initials: D
authors.lastname: Rönnow