Monte Carlo simulation of electrodeposition of copper: a multistep free energy calculation.
Electrodeposition of copper (Cu) involves length scales of a micrometer or even less. Several theoretical techniques such as continuum Monte Carlo, kinetic Monte Carlo (KMC), and molecular dynamics have been used for simulating this problem. However the multiphenomena characteristics of the problem pose a challenge for an efficient simulation algorithm. Traditional KMC methods are slow, especially when modeling surface diffusion with large number of particles and frequent particle jumps. Parameter estimation involving thousands of KMC runs is very time-consuming. Thus a less time-consuming and novel multistep continuum Monte Carlo simulation is carried out to evaluate the step wise free energy change in the process of electrochemical copper deposition. The procedure involves separate Monte Carlo codes employing different random number criterion (using hydrated radii, bare radii, hydration number of the species, redox potentials, etc.) to obtain the number of species (CuCl(2) or CuSO(4) or Cu as the case may be) and in turn the free energy. The effect of concentration of electrolyte, influence of electric field and presence of chloride ions on the free energy change for the processes is studied. The rate determining step for the process of electrodeposition of copper from CuCl(2) and CuSO(4) is also determined.
Harinipriya
S
S
Department of Chemical Engineering, Tennessee Technological University, Cookeville, Tennessee 38505, USA.
Subramanian
Venkat R
VR
D003198:Computer Simulation; D003300:Copper / Q000737:chemistry*; D019327:Copper Sulfate / Q000737:chemistry; D004058:Diffusion; D004566:Electrodes; D004573:Electrolytes / Q000737:chemistry; D004583:Electrons; D004595:Electroplating; D009010:Monte Carlo Method; D013499:Surface Properties; D013816:Thermodynamics
D004573:Electrolytes; D003300:Copper; D019327:Copper Sulfate; C029892:cupric chloride