Fabrication and testing of chemically micromachined silicon echelle gratings.
We have fabricated large, coarsely ruled, echelle patterns on silicon wafers by using photolithography and chemical-etching techniques. The grating patterns consist of 142-microm-wide, V-shaped grooves with an opening angle of 70.6 degrees, blazed at 54.7 degrees. We present a detailed description of our grating-fabrication techniques and the results of extensive testing. We have measured peak diffraction efficiencies of 70% at lambda = 632.8 nm and conclude that the gratings produced by our method are of sufficient quality for use in high-resolution spectrographs in the visible and near IR (lambda approximately = 500-5000 nm).
Keller
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LD
Center for Radiophysics and Space Science, Cornell University, Ithaca, New York 14853, USA. keller@astro.as.utexas.edu
Jaffe
D T
DT
Ershov
O A
OA
Benedict
T
T
Graf
U U
UU