Fluorescent two-photon nanolithography.
Improving the excitation conditions in two-photon fluorescent lithography reduces the size of the fabricated structures to nanometre scales. We demonstrate that a precise control of the illumination profile and the scanning speed of the laser beam is enough to decrease the photo-polymerization volume of resins by orders of magnitude. This work also shows experimental evidence of surface effects that yield a different polymerization intensity threshold compared with bulk. Such phenomenon enables to perform a non-linear optical nanolithography in a simple way, allowing fast-prototyping procedures. We present a detailed study of the polymer growth process using fluorescence and atomic force microscopy.
Kunik
D
D
Departamento de Física, FCEN, Universidad de Buenos Aires, Buenos Aires, Argentina. dkunik@df.uba.ar
Ludueña
S J
SJ
Costantino
S
S
Martínez
O E
OE