title: Correction masks for thickness uniformity in large-area thin films.
abstract: Experimental results from the emission of vapor sources are considered in designing correcting diaphragms to achieve a uniform thickness distribution during evaporation of thin films mounted on large-area substrate holders, in different geometric configurations.
authors.affiliation: Centro de Investigaciones en Optica, Apartado Postal 1-948, CP 37000, Leon Gto, Mexico. fvilla@foton.cio.mx
authors.forename: F
authors.initials: F
authors.lastname: Villa
authors.forename: A
authors.initials: A
authors.lastname: Martínez
authors.forename: L E
authors.initials: LE
authors.lastname: Regalado