Electron beam modification of polymer nanospheres.
Polystyrene spheres, 500 nm in diameter, self-assembled on the surface of silicon oxide are modified by exposure to an electron beam in a scanning electron microscope. Under electron beam exposure at room temperature, the diameter of the polystyrene spheres decreases by approximately 13% following a 9.9 mC/cm2 dose. The shrinkage of the spheres offers a new route for nanosphere lithography where the gaps between the spheres can be accurately tuned. Exposure to electrons also alters the surface chemistry of the spheres, making the spheres much more resistant to oxygen plasma processing.
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Nanoscale Physics Research Laboratory, School of Physics and Astronomy, University of Birmingham, Birmingham B15 2TT, United Kingdom.
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D003460:Crystallization / Q000379:methods*; D004307:Dose-Response Relationship, Radiation; D004583:Electrons; D046911:Macromolecular Substances / Q000737:chemistry; D008422:Materials Testing; D008968:Molecular Conformation; D054118:Nanospheres / Q000737:chemistry* / Q000528:radiation effects / Q000648:ultrastructure*; D036103:Nanotechnology / Q000379:methods*; D010316:Particle Size; D011829:Radiation Dosage; D012825:Silicon / Q000737:chemistry* / Q000528:radiation effects*; D013499:Surface Properties
D046911:Macromolecular Substances; D012825:Silicon