title: At-wavelength, system-level flare characterization of extreme-ultraviolet optical systems.
abstract: The extreme-ultraviolet (EUV) phase-shifting point-diffraction interferometer (PS/PDI) has recently been developed to provide high-accuracy wave-front characterization critical to the development of EUV lithography systems. Here we describe an enhanced implementation of the PS/PDI that significantly extends its measurement bandwidth. The enhanced PS/PDI is capable of simultaneously characterizing both wave front and flare. PS/PDI-based flare characterization of two recently fabricated EUV 10x-reduction lithographic optical systems is presented.
authors.affiliation: Center for X-Ray Optics, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA. pnaulleau@lbl.gov
authors.forename: P
authors.initials: P
authors.lastname: Naulleau
authors.forename: K A
authors.initials: KA
authors.lastname: Goldberg
authors.forename: E M
authors.initials: EM
authors.lastname: Gullikson
authors.forename: J
authors.initials: J
authors.lastname: Bokor