title: Refractive sapphire microlenses fabricated by chlorine-based inductively coupled plasma etching.
abstract: We have fabricated refractive sapphire microlenses and characterized their properties for what we believe to be the first time. We use thermally reflown photoresist lenslet patterns as a mask for chlorine-based dry etch of sapphire. Pattern transfer to the mechanically hard and chemically inert sapphire substrate is made possible by an inductively coupled plasma etch system that supplies a high-density plasma gas. Processed sapphire microlenses exhibit properties close to the ideal and operate nearly in the diffraction limit.
authors: S H
authors: SH
authors: Park
authors: H
authors: H
authors: Jeon
authors: Y J
authors: YJ
authors: Sung
authors: G Y
authors: GY
authors: Yeom