title: Electron-beam-fabricated asymmetric transmission gratings for microspectroscopy.
abstract: Asymmetric transmission gratings operating in the resonance domain are designed by modeling of the dose-controlled electron-beam lithography process with Gaussian convolution. We aim to exceed some efficiency limit eta(s) over a specified spectral range and to maximize eta(s). The resultant continuous-profile gratings are fabricated by electron-beam lithography and proportional reactive-ion etching into SiO(2). We demonstrate gratings with good signal-to-noise ratio and a diffraction efficiency greater than 40% for wavelengths from 400 to 750 nm.
authors: Department of Physics, University of Joensuu, P.O. Box 111, FIN-80101 Joensuu, Finland.
authors: P
authors: P
authors: Laakkonen
authors: M
authors: M
authors: Kuittinen
authors: J
authors: J
authors: Simonen
authors: J
authors: J
authors: Turunen