title: Electron deflector in UHV system: scattered electrons in ebeam evaporation.
abstract: The evaporating electron gun in UHV systems has a side-effect that it gives rise to large quantities of scattered and secondary electrons. These electrons may cause damage to sensitive samples and may yield lift-off problems of resist defined patterns. We designed an electron deflector to deflect the electrons and measured the current caused by the electrons during the evaporation of iron.
authors: Department of Physics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA. mvanveen@mit.edu
authors: Marc J
authors: MJ
authors: van Veenhuizen
authors: J
authors: J
authors: Moodera