A generic approach for embedded catalyst-supported vertically aligned nanowire growth.
We demonstrate a general approach for growing vertically aligned, single-crystalline nanowires of any material on arbitrary substrates by using plasma-sputtered Au/Pd thin films as a catalyst through the vapor-liquid-solid process. The high-energy sputtered Au/Pd atoms form a reactive interface with the substrate forming nanoclusters which get embedded in the substrate, thus providing mechanical stability for vertically aligned nanowire growth. We demonstrate that our approach for vertically aligned nanowire growth is generic and can be extended to various complex substrates such as conducting indium tin oxide.
Chung
Hee-Suk
HS
Department of Materials Science and Engineering, University of Pennsylvania, Philadelphia, Pennsylvania 19104, USA.
Jung
Yeonwoong
Y
Zimmerman
Tyler Jacob
TJ
Lee
Se-Ho
SH
Kim
Ji Woo
JW
Lee
Sang Hoon
SH
Kim
Seul Cham
SC
Oh
Kyu Hwan
KH
Agarwal
Ritesh
R
D002384:Catalysis; D003460:Crystallization / Q000379:methods*; D004559:Electric Wiring / Q000295:instrumentation; D006046:Gold / Q000737:chemistry*; D046911:Macromolecular Substances / Q000737:chemistry; D008422:Materials Testing; D008968:Molecular Conformation; D036103:Nanotechnology / Q000379:methods; D043942:Nanotubes / Q000737:chemistry* / Q000648:ultrastructure*; D010165:Palladium / Q000737:chemistry*; D010316:Particle Size; D013499:Surface Properties; D017971:Tin Compounds / Q000737:chemistry*
D046911:Macromolecular Substances; D017971:Tin Compounds; D010165:Palladium; D006046:Gold; C045358:stannic oxide