Electron deflector in UHV system: scattered electrons in ebeam evaporation.
The evaporating electron gun in UHV systems has a side-effect that it gives rise to large quantities of scattered and secondary electrons. These electrons may cause damage to sensitive samples and may yield lift-off problems of resist defined patterns. We designed an electron deflector to deflect the electrons and measured the current caused by the electrons during the evaporation of iron.
van Veenhuizen
Marc J
MJ
Department of Physics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA. mvanveen@mit.edu
Moodera
J
J