title: Precise and simple optical alignment method for double-sided lithography.
abstract: A method for aligning a photolithographic mask at the top of a transparent wafer that has a pattern on its bottom side is presented. The method is based on optical self-imaging of special alignment marks and provides submicrometer accuracy. The method is simple and robust and can conveniently be implemented on laboratory mask aligners for contact or proximity printing.
authors: M
authors: M
authors: Gruber
authors: D
authors: D
authors: Hagedorn
authors: W
authors: W
authors: Eckert