Illumination system design for a three-aspherical-mirror projection camera for extreme-ultraviolet lithography.
A scanning critical illumination system is designed to couple a synchrotron radiation source to a three-aspherical-mirror imaging system for extreme ultraviolet lithography. A static illumination area of H x V = 8 mm x 3 mm (where H is horizontal and V is vertical) can be obtained. Uniform intensity distribution and a large ring field of H x V = 150 mm x 3 mm can be achieved by scanning of the mirror of the condenser. The coherence factor (sigma) of this illumination system is approximately 0.6, with the same beam divergence in both the horizontal and the vertical directions. We describe the performance of the imaging optics at sigma = 0.6 to confirm that the illumination optics can meet the requirements for three-aspherical-mirror imaging optics with a feature size of 0.06 microm.
Li
Y
Y
Laboratory of Advanced Science and Technology for Industry, Himeji Institute of Technology, 3-1-2, Kamigori-machi, Kouto, Ako-gun Hyougo prefecture, 678-1205, Japan.
Kinoshita
H
H
Watanabe
T
T
Irie
S
S
Shirayone
S
S
Okazaki
S
S