title: A generic approach for embedded catalyst-supported vertically aligned nanowire growth.
abstract: We demonstrate a general approach for growing vertically aligned, single-crystalline nanowires of any material on arbitrary substrates by using plasma-sputtered Au/Pd thin films as a catalyst through the vapor-liquid-solid process. The high-energy sputtered Au/Pd atoms form a reactive interface with the substrate forming nanoclusters which get embedded in the substrate, thus providing mechanical stability for vertically aligned nanowire growth. We demonstrate that our approach for vertically aligned nanowire growth is generic and can be extended to various complex substrates such as conducting indium tin oxide.
authors: Department of Materials Science and Engineering, University of Pennsylvania, Philadelphia, Pennsylvania 19104, USA.
authors: Hee-Suk
authors: HS
authors: Chung
authors: Yeonwoong
authors: Y
authors: Jung
authors: Tyler Jacob
authors: TJ
authors: Zimmerman
authors: Se-Ho
authors: SH
authors: Lee
authors: Ji Woo
authors: JW
authors: Kim
authors: Sang Hoon
authors: SH
authors: Lee
authors: Seul Cham
authors: SC
authors: Kim
authors: Kyu Hwan
authors: KH
authors: Oh
authors: Ritesh
authors: R
authors: Agarwal
mesh_terms: D002384:Catalysis; D003460:Crystallization / Q000379:methods*; D004559:Electric Wiring / Q000295:instrumentation; D006046:Gold / Q000737:chemistry*; D046911:Macromolecular Substances / Q000737:chemistry; D008422:Materials Testing; D008968:Molecular Conformation; D036103:Nanotechnology / Q000379:methods; D043942:Nanotubes / Q000737:chemistry* / Q000648:ultrastructure*; D010165:Palladium / Q000737:chemistry*; D010316:Particle Size; D013499:Surface Properties; D017971:Tin Compounds / Q000737:chemistry*
chemical_list: D046911:Macromolecular Substances; D017971:Tin Compounds; D010165:Palladium; D006046:Gold; C045358:stannic oxide