title: Gas-liquid selective oxidations with oxygen under explosive conditions in a micro-structured reactor.
abstract: The gas-liquid oxidation of cyclohexane is performed at high temperature (>200 degrees C) and pressure (up to 25 bar) using pure oxygen in a Pyrex capped silicon etched microreactor which allows convenient screen reaction conditions well above the flammability limit.
authors.affiliation: LGPC, CNRS CPE Lyon, 69616, Villeurbanne, France.
authors.forename: Arnaud
authors.initials: A
authors.lastname: Leclerc
authors.forename: Mohamad
authors.initials: M
authors.lastname: Alamé
authors.forename: Daniel
authors.initials: D
authors.lastname: Schweich
authors.forename: Patrick
authors.initials: P
authors.lastname: Pouteau
authors.forename: Cyril
authors.initials: C
authors.lastname: Delattre
authors.forename: Claude
authors.initials: C
authors.lastname: de Bellefon
mesh_terms: D003510:Cyclohexanes / Q000737:chemistry*; D053834:Explosive Agents / Q000737:chemistry*; D005740:Gases / Q000737:chemistry; D008024:Ligands; D046210:Microfluidic Analytical Techniques / Q000295:instrumentation* / Q000379:methods*; D015394:Molecular Structure; D010084:Oxidation-Reduction; D010100:Oxygen / Q000737:chemistry*; D010316:Particle Size; D011312:Pressure; D012680:Sensitivity and Specificity; D012825:Silicon / Q000737:chemistry; D013696:Temperature
chemical_list: D003510:Cyclohexanes; D053834:Explosive Agents; D005740:Gases; D008024:Ligands; C506365:Cyclohexane; D010100:Oxygen; D012825:Silicon