title: Optimization of multilayer mirrors at 13.4 nm with more than two materials.
abstract: The design of multilayer mirrors with more than two materials is one of the key technologies for investigating lithography. We study a new procedure for optimizing multilayer mirrors of different combinations of materials at a wavelength of 13.4 nm. By adding Be and C layers in different orders to a Si/Mo stack, we have observed enhancement of the reflectivity and a reduction in the number of layers. The Luus-Jaakola optimization procedure has been implemented for the global optimization of the multilayer mirrors. With this algorithm it is not necessary to specify initially the number of layers present in a given design.
authors.affiliation: Department of Physics, University of Ottawa, Ontario, Canada. salma044@uottawa.ca
authors.forename: S M
authors.initials: SM
authors.lastname: Al-Marzoug
authors.forename: R J
authors.initials: RJ
authors.lastname: Hodgson