title: Fluoride antireflection coatings deposited at 193 nm.
abstract: Antireflection coatings for 193 nm composed of low-index (MgF(2) and AlF(3)) and high-index (LaF(3) and GdF(3)) materials are deposited by the resistive heating boat method at a substrate temperature of 300 degrees C. The optical characteristics (reflectance and optical loss), microstructure (morphology and surface roughness), stress, and laser-induced damage threshold (LIDT) of the coatings are investigated and discussed. The related reflection at 193 nm of the four kinds of antireflection coatings is smaller than 0.2% and the optical loss is less than 0.15%. Of the fluoride antireflection coatings, AlF(3)/GdF(3) had the lowest stress value. Antireflection coatings with AlF(3) as the low-index material had higher LIDT values than when MgF(2) was used.
authors.affiliation: Thin Film Technology Center, Department of Optics and Photonics, National Central University, Chung-Li, Taiwan 32001. mjlio@ios.ncu.edu.tw
authors.forename: Ming-Chung
authors.initials: MC
authors.lastname: Liu
authors.forename: Cheng-Chung
authors.initials: CC
authors.lastname: Lee
authors.forename: Bo-Huei
authors.initials: BH
authors.lastname: Liao
authors.forename: Masaaki
authors.initials: M
authors.lastname: Kaneko
authors.forename: Kazuhide
authors.initials: K
authors.lastname: Nakahira
authors.forename: Yuuichi
authors.initials: Y
authors.lastname: Takano