Sputter deposition of silicon oxynitride gradient and multilayer coatings.
The optical properties of silicon oxynitride films deposited by reactive dc magnetron sputtered films have been investigated. In particular the absorption characteristics of silicon nitride thin films in the visible spectrum and their optical bandgap were analyzed with regard to their composition and deposition properties. It can be shown that there is a significant difference between the absorption in the visible spectrum and the optical bandgap for these layers. The influence of unipolar and bipolar pulse modes on the optical layer properties is presented. The extinction coefficient for silicon nitride single layers could be reduced to a value of 2 x 10(-4) at 500 nm without external heating. There is also the dependence of the absorption of silicon oxynitride layers on the discharge voltage. We present the resulting spectra of rugate and edge filters that consist of these layers and offer lower absorption than single layers.
Weber
Jörn
J
Fraunhofer Institut für Elektronenstrahl und Plasmatechnik (FEP), Winterbergstrasse 28, 01277 Dresden, Germany. joern.weber@fep.fraunhofer.de
Bartzsch
Hagen
H
Frach
Peter
P