Application of an interferometric phase contrast method to fabricate arbitrary diffractive optical elements.
A novel approach for the fabrication of diffractive optical elements is described. This approach is based on an interferometric phase contrast method that transforms a complex object wavefront into an intensity pattern. The resulting intensity pattern is used to expose a photoresist layer on a substrate. After development, a diffractive phase object with an on-axis diffraction pattern is achieved. We show that the interferometric phase contrast method allows a precise control of the resulting intensity pattern. An array of blazed Fresnel lenses is realized in photoresist by using kinoform or detour-phase computer holograms for the interferometric phase contrast setup.
Teschke
Marcel
M
Department of Optical Engineering, Technische Universität Ilmenau, Ilmenau, Germany. marcel.teschke@tu-ilmenau.de
Heyer
Robert
R
Fritzsche
Marco
M
Stoebenau
Sebastian
S
Sinzinger
Stefan
S