title: Low temperature deposition of indium tin oxide films by plasma ion-assisted evaporation.
abstract: Coatings of transparent conductive oxides, especially indium tin oxide (ITO), are important in different fields. So far, application of these materials has been limited to substrates with high thermal stability. We describe an improved coating process for ITO based on plasma ion-assisted evaporation at a substrate temperature below 100 degrees C, which is suitable for organic substrates. In characterizing the thin films, we used the classical Drude theory to calculate the resistivity from optical film properties and compared the data with linear four-point measurements. X-ray diffraction spectroscopy was used to determine the structural properties of the thin films.
authors.affiliation: Friedrich-Schiller-University, Institute of Applied Physics, Max-Wien-Platz 1, 07743 Jena, Germany. kevin.fuechsel@iof.fraunhofer.de
authors.forename: Kevin
authors.initials: K
authors.lastname: Füchsel
authors.forename: Ulrike
authors.initials: U
authors.lastname: Schulz
authors.forename: Norbert
authors.initials: N
authors.lastname: Kaiser
authors.forename: Andreas
authors.initials: A
authors.lastname: Tünnermann