Optical and structural properties of LaF3 thin films.
LaF(3) thin films of different thicknesses were deposited on CaF(2) (111) and silicon substrates at a relatively low substrate temperature of 150 degrees C. Optical (transmittance, reflectance, refractive index, and extinction coefficient) and mechanical (morphology and crystalline structure) properties have been investigated and are discussed. It is shown that LaF(3) thin films deposited on CaF(2) (111) substrates are monocrystalline and have a bulklike dense structure. Furthermore, it is presented that low-loss LaF(3) thin films can be deposited not only by boat evaporation but also by electron beam evaporation.
Bischoff
Martin
M
Friedrich-Schiller-University, Institute of Applied Physics, Max-Wien-Platz 1, 07743 Jena, Germany. martin.bischoff@iof.fraunhofer.de
Gäbler
Dieter
D
Kaiser
Norbert
N
Chuvilin
Andrey
A
Kaiser
Ute
U
Tünnermann
Andreas
A