title: Application of an interferometric phase contrast method to fabricate arbitrary diffractive optical elements.
abstract: A novel approach for the fabrication of diffractive optical elements is described. This approach is based on an interferometric phase contrast method that transforms a complex object wavefront into an intensity pattern. The resulting intensity pattern is used to expose a photoresist layer on a substrate. After development, a diffractive phase object with an on-axis diffraction pattern is achieved. We show that the interferometric phase contrast method allows a precise control of the resulting intensity pattern. An array of blazed Fresnel lenses is realized in photoresist by using kinoform or detour-phase computer holograms for the interferometric phase contrast setup.
authors.affiliation: Department of Optical Engineering, Technische Universität Ilmenau, Ilmenau, Germany. marcel.teschke@tu-ilmenau.de
authors.forename: Marcel
authors.initials: M
authors.lastname: Teschke
authors.forename: Robert
authors.initials: R
authors.lastname: Heyer
authors.forename: Marco
authors.initials: M
authors.lastname: Fritzsche
authors.forename: Sebastian
authors.initials: S
authors.lastname: Stoebenau
authors.forename: Stefan
authors.initials: S
authors.lastname: Sinzinger