title: Laser damage resistance of hafnia thin films deposited by electron beam deposition, reactive low voltage ion plating, and dual ion beam sputtering.
abstract: A comparative study is made of the laser damage resistance of hafnia coatings deposited on fused silica substrates with different technologies: electron beam deposition (from Hf or HfO(2) starting material), reactive low voltage ion plating, and dual ion beam sputtering. The laser damage thresholds of these coatings are determined at 1064 and 355 nm using a nanosecond pulsed YAG laser and a one-on-one test procedure. The results are associated with a complete characterization of the samples: refractive index n measured by spectrophotometry, extinction coefficient k measured by photothermal deflection, and roughness measured by atomic force microscopy.
authors.affiliation: Institut Fresnel (UMR CNRS 6133), Université Paul Cezanne, Université de Provence -Ecole Centrale Marseille Domaine Universitaire de St Jérôme, 13397 Marseille Cedex 20, France. laurent.gallais@fresnel.fr
authors.forename: Laurent
authors.initials: L
authors.lastname: Gallais
authors.forename: Jérémie
authors.initials: J
authors.lastname: Capoulade
authors.forename: Jean-Yves
authors.initials: JY
authors.lastname: Natoli
authors.forename: Mireille
authors.initials: M
authors.lastname: Commandré
authors.forename: Michel
authors.initials: M
authors.lastname: Cathelinaud
authors.forename: Cian
authors.initials: C
authors.lastname: Koc
authors.forename: Michel
authors.initials: M
authors.lastname: Lequime