title: Optical design of hybrid-type attenuated phase-shift masks for extreme-ultraviolet lithography by use of a Fabry-Perot interference filter.
abstract: We have designed what we believe to be new hybrid-type attenuated phase-shift masks for extreme-ultraviolet optical lithography by use of a Fabry-Perot interference filter. The designs for the attenuated phase-shift masks show a smaller step height for less geometric shadow effects than additive- and subtractive-type attenuated phase-shift masks, a contrast higher than 94% for both deep-ultraviolet and extreme-ultraviolet wavelength regimes, and a 180 degrees phase-shift in the extreme-ultraviolet wavelength regime.
authors.affiliation: Department of Physics, Inha University, Incheon 402-751, South Korea.
authors.forename: Hee Young
authors.initials: HY
authors.lastname: Kang
authors.forename: Chang Kwon
authors.initials: CK
authors.lastname: Hwangbo